JP2005235890A5 - - Google Patents

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Publication number
JP2005235890A5
JP2005235890A5 JP2004040977A JP2004040977A JP2005235890A5 JP 2005235890 A5 JP2005235890 A5 JP 2005235890A5 JP 2004040977 A JP2004040977 A JP 2004040977A JP 2004040977 A JP2004040977 A JP 2004040977A JP 2005235890 A5 JP2005235890 A5 JP 2005235890A5
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JP
Japan
Prior art keywords
original
contact surface
exposure apparatus
holding
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004040977A
Other languages
English (en)
Japanese (ja)
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JP2005235890A (ja
JP4411100B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004040977A priority Critical patent/JP4411100B2/ja
Priority claimed from JP2004040977A external-priority patent/JP4411100B2/ja
Priority to US11/059,331 priority patent/US7307698B2/en
Publication of JP2005235890A publication Critical patent/JP2005235890A/ja
Publication of JP2005235890A5 publication Critical patent/JP2005235890A5/ja
Application granted granted Critical
Publication of JP4411100B2 publication Critical patent/JP4411100B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004040977A 2004-02-18 2004-02-18 露光装置 Expired - Fee Related JP4411100B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004040977A JP4411100B2 (ja) 2004-02-18 2004-02-18 露光装置
US11/059,331 US7307698B2 (en) 2004-02-18 2005-02-17 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004040977A JP4411100B2 (ja) 2004-02-18 2004-02-18 露光装置

Publications (3)

Publication Number Publication Date
JP2005235890A JP2005235890A (ja) 2005-09-02
JP2005235890A5 true JP2005235890A5 (enExample) 2008-11-20
JP4411100B2 JP4411100B2 (ja) 2010-02-10

Family

ID=34857908

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004040977A Expired - Fee Related JP4411100B2 (ja) 2004-02-18 2004-02-18 露光装置

Country Status (2)

Country Link
US (1) US7307698B2 (enExample)
JP (1) JP4411100B2 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4666908B2 (ja) 2003-12-12 2011-04-06 キヤノン株式会社 露光装置、計測方法及びデバイス製造方法
JP2006120798A (ja) * 2004-10-20 2006-05-11 Canon Inc 露光装置
JP2006261156A (ja) * 2005-03-15 2006-09-28 Canon Inc 原版保持装置およびそれを用いた露光装置
US7352438B2 (en) * 2006-02-14 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20070268476A1 (en) * 2006-05-19 2007-11-22 Nikon Corporation Kinematic chucks for reticles and other planar bodies
KR20090026139A (ko) * 2006-05-24 2009-03-11 가부시키가이샤 니콘 유지 장치 및 노광 장치
US7869003B2 (en) 2006-07-12 2011-01-11 Asml Holding Nv Lithographic apparatus and device manufacturing method with reticle gripper
JP5013941B2 (ja) * 2007-04-19 2012-08-29 キヤノン株式会社 ステージ装置、露光装置、及びデバイス製造方法
JP2011023425A (ja) * 2009-07-13 2011-02-03 Canon Inc ステージ装置、露光装置及びデバイス製造方法
DE102009037939A1 (de) * 2009-08-19 2011-06-30 ERS electronic GmbH, 82110 Verfahren und Vorrichtung zur Bestimmung der Durchbiegung eines scheibenförmigen Werkstücks
NL2006190A (en) * 2010-03-11 2011-09-13 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US20130250271A1 (en) * 2012-02-17 2013-09-26 Nikon Corporation Stage assembly with secure device holder
JP6788125B2 (ja) * 2017-02-10 2020-11-18 エーエスエムエル ホールディング エヌ．ブイ． レチクルクランプデバイス
US11289355B2 (en) 2017-06-02 2022-03-29 Lam Research Corporation Electrostatic chuck for use in semiconductor processing
US11469084B2 (en) 2017-09-05 2022-10-11 Lam Research Corporation High temperature RF connection with integral thermal choke
KR102595728B1 (ko) * 2017-12-28 2023-10-27 온투 이노베이션 아이엔씨. 순응형 스테이지
US11183368B2 (en) 2018-08-02 2021-11-23 Lam Research Corporation RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucks
WO2021255807A1 (ja) * 2020-06-15 2021-12-23 株式会社ニコン ステージ装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62100753A (ja) * 1985-10-29 1987-05-11 Canon Inc 多点支持レチクルチヤツク
JP2750554B2 (ja) * 1992-03-31 1998-05-13 日本電信電話株式会社 真空吸着装置
JPH07136885A (ja) * 1993-06-30 1995-05-30 Toshiba Corp 真空チャック
JPH07326566A (ja) 1994-05-31 1995-12-12 Nikon Corp マスク支持台
JP3372127B2 (ja) * 1994-11-18 2003-01-27 日本電信電話株式会社 真空吸着装置
JPH08167553A (ja) 1994-12-14 1996-06-25 Toshiba Mach Co Ltd 被処理材の固定装置
JP3708984B2 (ja) 1995-04-17 2005-10-19 東芝機械株式会社 被処理材の固定装置
JP3483452B2 (ja) 1998-02-04 2004-01-06 キヤノン株式会社 ステージ装置および露光装置、ならびにデバイス製造方法
JP3810039B2 (ja) 1998-05-06 2006-08-16 キヤノン株式会社 ステージ装置
US6196532B1 (en) * 1999-08-27 2001-03-06 Applied Materials, Inc. 3 point vacuum chuck with non-resilient support members
JP2001332480A (ja) * 2000-05-24 2001-11-30 Canon Inc 原版チャック、該原版チャックを備えた露光装置および半導体デバイス製造方法
CN1507649A (zh) * 2001-02-13 2004-06-23 ������������ʽ���� 保持装置、保持方法、曝光装置以及器件制造方法
US6801301B2 (en) 2001-10-12 2004-10-05 Canon Kabushiki Kaisha Exposure apparatus
TW200303593A (en) * 2002-02-19 2003-09-01 Olympus Optical Co Substrate sucking apparatus
JP3826118B2 (ja) 2003-07-08 2006-09-27 キヤノン株式会社 露光装置
US7119884B2 (en) * 2003-12-24 2006-10-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

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