JP4362999B2 - 露光装置及び露光方法、並びにデバイス製造方法 - Google Patents

露光装置及び露光方法、並びにデバイス製造方法 Download PDF

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Publication number
JP4362999B2
JP4362999B2 JP2001346697A JP2001346697A JP4362999B2 JP 4362999 B2 JP4362999 B2 JP 4362999B2 JP 2001346697 A JP2001346697 A JP 2001346697A JP 2001346697 A JP2001346697 A JP 2001346697A JP 4362999 B2 JP4362999 B2 JP 4362999B2
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Japan
Prior art keywords
exposure
light
mask
scanning
pattern
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JP2001346697A
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Japanese (ja)
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JP2003151880A (ja
Inventor
章仁 白戸
正紀 加藤
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Nikon Corp
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Nikon Corp
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Priority to JP2001346697A priority Critical patent/JP4362999B2/ja
Priority to TW091122805A priority patent/TW561523B/zh
Priority to KR1020020067721A priority patent/KR100938191B1/ko
Priority to CNB021492751A priority patent/CN1303649C/zh
Publication of JP2003151880A publication Critical patent/JP2003151880A/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2001346697A 2001-11-12 2001-11-12 露光装置及び露光方法、並びにデバイス製造方法 Expired - Fee Related JP4362999B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2001346697A JP4362999B2 (ja) 2001-11-12 2001-11-12 露光装置及び露光方法、並びにデバイス製造方法
TW091122805A TW561523B (en) 2001-11-12 2002-10-03 Exposure device, exposure method, and manufacturing method of devices
KR1020020067721A KR100938191B1 (ko) 2001-11-12 2002-11-04 노광 장치 및 노광 방법, 및 디바이스 제조 방법
CNB021492751A CN1303649C (zh) 2001-11-12 2002-11-08 曝光装置、曝光方法以及元件制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001346697A JP4362999B2 (ja) 2001-11-12 2001-11-12 露光装置及び露光方法、並びにデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2003151880A JP2003151880A (ja) 2003-05-23
JP4362999B2 true JP4362999B2 (ja) 2009-11-11

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JP2001346697A Expired - Fee Related JP4362999B2 (ja) 2001-11-12 2001-11-12 露光装置及び露光方法、並びにデバイス製造方法

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JP (1) JP4362999B2 (zh)
KR (1) KR100938191B1 (zh)
CN (1) CN1303649C (zh)
TW (1) TW561523B (zh)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4735258B2 (ja) 2003-04-09 2011-07-27 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
JP4120502B2 (ja) * 2003-07-14 2008-07-16 株式会社ニコン 集光光学系、光源ユニット、照明光学装置および露光装置
KR101006435B1 (ko) * 2003-09-01 2011-01-06 삼성전자주식회사 노광 마스크, 이를 포함하는 노광 장치 및 이를 이용한표시 장치용 표시판의 제조 방법
TW201834020A (zh) 2003-10-28 2018-09-16 日商尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TW201809801A (zh) 2003-11-20 2018-03-16 日商尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
TW201809727A (zh) 2004-02-06 2018-03-16 日商尼康股份有限公司 偏光變換元件
JP2006039512A (ja) * 2004-06-21 2006-02-09 Nikon Corp 露光装置及びマイクロデバイスの製造方法
JP4646575B2 (ja) 2004-08-31 2011-03-09 キヤノン株式会社 半導体装置の製造方法
KR101504765B1 (ko) 2005-05-12 2015-03-30 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
JP2007179778A (ja) * 2005-12-27 2007-07-12 Matsushita Electric Ind Co Ltd プラズマディスプレイパネル
JP4984810B2 (ja) * 2006-02-16 2012-07-25 株式会社ニコン 露光方法、露光装置及びフォトマスク
JP4957278B2 (ja) * 2007-02-08 2012-06-20 株式会社ニコン 照明装置、露光装置、露光装置の調整方法、及びデバイスの製造方法
JP5057370B2 (ja) * 2007-06-15 2012-10-24 Ｎｓｋテクノロジー株式会社 近接スキャン露光装置及びその照度制御方法
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US8917378B2 (en) * 2007-12-20 2014-12-23 Nikon Corporation Exposure method, exposure apparatus, and method for producing device with plurality of projection optical systems and pattern having first partial pattern area and second partial area having overlaid area with first partial pattern area
JP2009163133A (ja) * 2008-01-09 2009-07-23 Nikon Corp 露光方法及び露光装置
US8467032B2 (en) 2008-04-09 2013-06-18 Nikon Corporation Exposure apparatus and electronic device manufacturing method
JPWO2009128488A1 (ja) * 2008-04-17 2011-08-04 株式会社ニコン 照明装置、露光装置及びデバイス製造方法
JP5493403B2 (ja) * 2008-06-19 2014-05-14 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
JP2013238670A (ja) * 2012-05-11 2013-11-28 Canon Inc 露光装置、露光方法、デバイスの製造方法及び開口板
US8722286B2 (en) 2012-05-31 2014-05-13 Taiwan Semiconductor Manufacturing Company, Ltd. Devices and methods for improved reflective electron beam lithography
JP6261207B2 (ja) * 2013-07-02 2018-01-17 キヤノン株式会社 露光装置、露光方法、それらを用いたデバイスの製造方法
JP6380728B2 (ja) * 2013-11-25 2018-08-29 株式会社ニコン 投影走査露光方法及びデバイス製造方法
KR102387648B1 (ko) * 2014-04-01 2022-04-18 가부시키가이샤 니콘 노광 장치
CN104102094B (zh) * 2014-06-27 2015-12-02 京东方科技集团股份有限公司 掩模挡板及其制造方法
JP6519109B2 (ja) * 2014-07-17 2019-05-29 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
CN104391432B (zh) * 2014-12-18 2016-06-29 中国电子科技集团公司第四十七研究所 扫描式光刻方法
WO2017150388A1 (ja) * 2016-02-29 2017-09-08 株式会社ニコン 露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、遮光装置、及び露光方法
KR102567319B1 (ko) 2016-04-28 2023-08-16 엘지디스플레이 주식회사 분할노광 장치 및 이를 이용한 액정표시장치의 제조방법
CN107450271B (zh) * 2016-05-31 2019-10-25 上海微电子装备（集团）股份有限公司 光刻机刀口组、大视场光刻机和曝光方法
JP7240166B2 (ja) * 2018-12-18 2023-03-15 キヤノン株式会社 決定方法、露光方法、露光装置、および物品製造方法
JP2019117403A (ja) * 2019-03-22 2019-07-18 株式会社ニコン 露光装置、並びにディスプレイ及びデバイスの製造方法
JP6734573B2 (ja) * 2019-03-22 2020-08-05 株式会社ニコン 露光装置、並びにディスプレイ及びデバイスの製造方法
CN112612178A (zh) * 2020-12-21 2021-04-06 上海华力微电子有限公司 一种监控光刻机遮光片开口精度的标记及其使用方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08264431A (ja) * 1995-03-28 1996-10-11 Canon Inc 走査投影露光装置
JP2674577B2 (ja) * 1995-08-29 1997-11-12 株式会社ニコン 投影露光装置及び露光方法
JP2674578B2 (ja) * 1995-08-29 1997-11-12 株式会社ニコン 走査露光装置及び露光方法
JPH09283433A (ja) * 1996-04-16 1997-10-31 Canon Inc 走査露光装置及びそれを用いたデバイス製造方法
JP2000058422A (ja) * 1998-08-11 2000-02-25 Nikon Corp 露光装置
JP4649717B2 (ja) * 1999-10-01 2011-03-16 株式会社ニコン 露光方法及び露光装置、デバイス製造方法
JP2001297975A (ja) * 2000-04-17 2001-10-26 Nikon Corp 露光装置及び露光方法

Also Published As

Publication number Publication date
KR100938191B1 (ko) 2010-01-21
CN1303649C (zh) 2007-03-07
JP2003151880A (ja) 2003-05-23
TW561523B (en) 2003-11-11
KR20030040052A (ko) 2003-05-22
CN1419266A (zh) 2003-05-21

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