JP4325648B2 - 触媒担体及び排ガス浄化用触媒 - Google Patents
触媒担体及び排ガス浄化用触媒 Download PDFInfo
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- JP4325648B2 JP4325648B2 JP2006194548A JP2006194548A JP4325648B2 JP 4325648 B2 JP4325648 B2 JP 4325648B2 JP 2006194548 A JP2006194548 A JP 2006194548A JP 2006194548 A JP2006194548 A JP 2006194548A JP 4325648 B2 JP4325648 B2 JP 4325648B2
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- noble metal
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- 238000000746 purification Methods 0.000 title claims description 24
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- 239000002245 particle Substances 0.000 claims description 79
- 229910000510 noble metal Inorganic materials 0.000 claims description 70
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 67
- 229910052746 lanthanum Inorganic materials 0.000 claims description 57
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 57
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 44
- 229910052779 Neodymium Inorganic materials 0.000 claims description 41
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 claims description 41
- 229910052697 platinum Inorganic materials 0.000 claims description 32
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 30
- 229910052710 silicon Inorganic materials 0.000 claims description 30
- 239000010703 silicon Substances 0.000 claims description 30
- 229910052763 palladium Inorganic materials 0.000 claims description 21
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- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
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- 229910052784 alkaline earth metal Inorganic materials 0.000 description 3
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- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910017625 MgSiO Inorganic materials 0.000 description 2
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- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- ZRHOFLXFAAEXEE-UHFFFAOYSA-J butanoate;titanium(4+) Chemical compound [Ti+4].CCCC([O-])=O.CCCC([O-])=O.CCCC([O-])=O.CCCC([O-])=O ZRHOFLXFAAEXEE-UHFFFAOYSA-J 0.000 description 2
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- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
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- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Chemical compound [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 description 2
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- 239000001763 2-hydroxyethyl(trimethyl)azanium Substances 0.000 description 1
- NGDQQLAVJWUYSF-UHFFFAOYSA-N 4-methyl-2-phenyl-1,3-thiazole-5-sulfonyl chloride Chemical compound S1C(S(Cl)(=O)=O)=C(C)N=C1C1=CC=CC=C1 NGDQQLAVJWUYSF-UHFFFAOYSA-N 0.000 description 1
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- 235000019743 Choline chloride Nutrition 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
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- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 description 1
- RLGQACBPNDBWTB-UHFFFAOYSA-N cetyltrimethylammonium ion Chemical compound CCCCCCCCCCCCCCCC[N+](C)(C)C RLGQACBPNDBWTB-UHFFFAOYSA-N 0.000 description 1
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- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 1
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- UJVRJBAUJYZFIX-UHFFFAOYSA-N nitric acid;oxozirconium Chemical compound [Zr]=O.O[N+]([O-])=O.O[N+]([O-])=O UJVRJBAUJYZFIX-UHFFFAOYSA-N 0.000 description 1
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- DGMKFQYCZXERLX-UHFFFAOYSA-N proglumide Chemical compound CCCN(CCC)C(=O)C(CCC(O)=O)NC(=O)C1=CC=CC=C1 DGMKFQYCZXERLX-UHFFFAOYSA-N 0.000 description 1
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Description
本発明の触媒担体を製造する本発明の方法は、疎水性溶媒相中に水性相が分散している分散液を提供すること;分散液中に分散している水性相中において、電子受容性元素の塩及び他の元素の塩を加水分解して、金属酸化物前駆体を析出させ、この金属酸化物前駆体を凝集させること;並びに凝集させた金属酸化物前駆体を乾燥及び焼成することを含む。
{1.90(ケイ素の電気陰性度)×1+3.44(酸素の電気陰性度)×2}/3
≒2.93
電子受容性元素は、他の元素と共に複合酸化物を構成している。この電子受容性元素は、他の元素と組み合わせて複合酸化物としたときに、貴金属触媒粒子が接近若しくは接触することによりその貴金属元素から電子を受容する電子受容性があり且つ酸化還元反応で原子価の変化がない元素として選択できる。
電子受容性元素は単独で用いずに、他の元素、特に他の金属元素との複合酸化物として用いられる。これは、耐熱性を向上させることに加えて、電子受容性元素の塩基性を弱めて、複合酸化物が全体として中性若しくは中性に近くなるようにするためである。従って、当該他の元素は、従来、排ガス用触媒の担体若しくは基材として用いられている金属元素で良く、具体的には、ケイ素(Si)、アルミニウム(Al)、ジルコニウム(Zr)、チタン(Ti)及びそれらの組み合わせからなる群より選択できる。
本発明の触媒担体を構成している複合酸化物は、電気陰性度が、好ましくは2.55〜2.80、より好ましくは2.60〜2.73である。この電気陰性度によれば、適度な酸塩基性によって、触媒活性を良好な状態に維持することができる。
ネオジム、ランタン等の元素をジルコニウム等の他の元素の酸化物に添加する場合、ネオジム等の元素と他の元素との合計に対する電子受容性元素のモル比が0.01〜0.3程度のときには、一般に、ネオジム等の元素によって他の元素の酸化物が安定化され、触媒担体としての耐熱性が向上することが知られている。
本発明の触媒担体では、電子受容性元素と他の金属との複合酸化物を、粒子状に形成して用いることができる。
上記の担体に貴金属触媒を担持することにより、本発明の排ガス浄化用触媒が得られる。この貴金属触媒は、具体的には白金(Pt)、ロジウム(ロジウム)、パラジウム(Pd)及びそれらの組み合わせからなる群より選択される貴金属を挙げることができ、特に排ガス浄化触媒としての使用の間に比較的シンタリングする傾向が大きい白金粒子、パラジウム及びそれらの組合せからなる群より選択される貴金属を挙げることができる。貴金属の担持のためには、従来知られている含浸法(スラリー法)、浸漬法等を用いることができる。
本発明の触媒担体を製造する本発明の方法は、疎水性溶媒相中に水性相が分散している分散液を提供すること;分散液中に分散している水性相中において、電子受容性元素の塩及び他の元素の塩を加水分解して、金属酸化物前駆体を析出させ、この金属酸化物前駆体を凝集させること;並びに凝集させた金属酸化物前駆体を乾燥及び焼成することを含む。
下記に様にしてマイクロエマルション法によって、La10Si6O27の組成の酸化ランタン−シリカ複合酸化物触媒担体を合成した。
下記に様にしてマイクロエマルション法によって、NdZrO3.5の組成の酸化ネオジウム−ジルコニア複合酸化物触媒担体を合成した。
下記に様にしてマイクロエマルション法によって、Y10Si6O27の組成の酸化イットリウム−シリカ複合酸化物触媒担体20gを合成した。
下記に様にしてマイクロエマルション法によって、MgSiO3の組成の酸化マグネシウム−シリカ複合酸化物触媒担体30gを合成した。
下記に様にしてマイクロエマルション法によって、LaTiO3.5の組成のパイロクロア構造酸化ランタン−チタニア複合酸化物触媒担体30gを合成した。
上記と同様にしてマイクロエマルション法によって、本発明の酸化ネオジウム−シリカ複合酸化物(Nd10Si6O27)触媒担体、酸化ランタン−アルミナ複合酸化物(LaAlO3)触媒担体、酸化ネオジウム−アルミナ複合酸化物(NdAlO3)触媒担体、酸化ランタン−ジルコニア複合酸化物(LaZrO3.5)触媒担体、酸化マグネシウム−アルミナ複合酸化物(MgAlO2.5)触媒担体、酸化イットリウム−ジルコニア複合酸化物(YZrO3.5)触媒担体、酸化ネオジム−チタニア複合酸化物(NdTiO3.5)触媒担体、及び酸化イットリウム−チタニア複合酸化物(YTiO3.5)触媒担体を合成した。
従来技術の触媒担体として、La2O3、Al2O3、ZrO2、TiO2、SiO2を得た。
本発明及び従来技術の触媒担体について電気陰性度を求めた。またこれらの触媒担体に1wt%の白金粒子を定法に従って担持し、空気中において800℃で2時間にわたって焼成した後の白金粒子の粒径を測定した。これらの測定結果を、下記の表3に示す。
1/Spr n=1/So n+kt …(1)
(Sprは貴金属粒子の表面積、Soは初期の貴金属粒子表面積、k及びnは任意の定数、tは時間である)。
1/Spr 2=1/So 2+kt …(2)
1/Spr∝d …(3)
∴1/Spr 2∝d2 …(4)
(dは貴金属粒子の粒子径、Sprは貴金属粒子の表面積)。
t=tr/Ssup 1/2 …(5)
t∝1/Ssup 1/2 …(6)
d2=k’/Ssup 1/2+Q …(7)
(dは貴金属粒子の粒子径、Ssupは担体表面積、k’及びQは定数)
2 酸化ランタン−シリカ複合酸化物
Claims (7)
- 貴金属触媒粒子の貴金属元素が接近若しくは接触することによりその貴金属元素から電子を受容する電子受容性があり且つ酸化還元反応で原子価の変化がない電子受容性元素、及び他の元素、の複合酸化物から構成されており、
前記電子受容性元素が、ランタン、ネオジム、イットリウム及びそれらの組み合わせからなる群より選択され、
前記他の元素が、ケイ素であり、且つ
前記電子受容性元素と前記他の元素との合計に対する前記電子受容性元素のモル比が、0.5〜0.7である、
触媒担体。 - 前記電子受容性元素がランタンであり、前記他の元素がケイ素であり、且つランタンとケイ素との合計に対するランタンのモル比(La/(La+Si))が、0.5〜0.7である、請求項1に記載の触媒担体。
- 前記電子受容性元素がネオジムであり、前記他の元素がケイ素であり、且つネオジムとケイ素との合計に対するネオジムのモル比(Nd/(Nd+Si))が、0.5〜0.7である、請求項1に記載の触媒担体。
- 前記電子受容性元素がイットリウムであり、前記他の元素がケイ素であり、且つイットリウムとケイ素との合計に対するイットリウムのモル比(Y/(Y+Si))が、0.5〜0.7である、請求項1に記載の触媒担体。
- 前記複合酸化物の電気陰性度が、2.55〜2.80である、請求項1〜4のいずれかに記載の触媒担体。
- 請求項1〜5のいずれかに記載の触媒担体に、貴金属触媒粒子が担持されてなる、排ガス浄化用触媒。
- 前記貴金属触媒粒子が、白金、パラジウム及びそれらの組み合わせからなる群より選択される、請求項6に記載の排ガス浄化用触媒。
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EP06832403A EP1946836B1 (en) | 2005-10-24 | 2006-10-24 | Catalyst support and catalyst for exhaust-gas purification |
PCT/JP2006/321589 WO2007049778A1 (ja) | 2005-10-24 | 2006-10-24 | 触媒担体及び排ガス浄化用触媒 |
CN2006800394261A CN101291731B (zh) | 2005-10-24 | 2006-10-24 | 催化剂载体和排气净化用催化剂 |
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- 2006-10-24 WO PCT/JP2006/321589 patent/WO2007049778A1/ja active Application Filing
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WO2007049778A1 (ja) | 2007-05-03 |
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