JP4272156B2 - マレイド誘導体を含有する光硬化性組成物 - Google Patents

マレイド誘導体を含有する光硬化性組成物 Download PDF

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Publication number
JP4272156B2
JP4272156B2 JP2004527574A JP2004527574A JP4272156B2 JP 4272156 B2 JP4272156 B2 JP 4272156B2 JP 2004527574 A JP2004527574 A JP 2004527574A JP 2004527574 A JP2004527574 A JP 2004527574A JP 4272156 B2 JP4272156 B2 JP 4272156B2
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Japan
Prior art keywords
photocurable composition
maleimide
acrylate
meth
acylphosphine oxide
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Expired - Fee Related
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JP2004527574A
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English (en)
Japanese (ja)
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JP2005535745A (ja
JP2005535745A5 (https=
Inventor
エル. セベランス,リチャード
エム. イリタロ,キャロライン
ティー. エリオット,ピーター
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of JP2005535745A5 publication Critical patent/JP2005535745A5/ja
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/36Amides or imides
    • C08F22/40Imides, e.g. cyclic imides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36Amides or imides
    • C08F222/40Imides, e.g. cyclic imides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/04Anhydrides, e.g. cyclic anhydrides
    • C08F222/06Maleic anhydride
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06Polymers provided for in subclass C08G
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
JP2004527574A 2002-08-08 2003-06-17 マレイド誘導体を含有する光硬化性組成物 Expired - Fee Related JP4272156B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/214,619 US20040029044A1 (en) 2002-08-08 2002-08-08 Photocurable composition
PCT/US2003/019136 WO2004014970A1 (en) 2002-08-08 2003-06-17 Photocurable composition containing maleide derivatives

Publications (3)

Publication Number Publication Date
JP2005535745A JP2005535745A (ja) 2005-11-24
JP2005535745A5 JP2005535745A5 (https=) 2006-07-20
JP4272156B2 true JP4272156B2 (ja) 2009-06-03

Family

ID=31494683

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004527574A Expired - Fee Related JP4272156B2 (ja) 2002-08-08 2003-06-17 マレイド誘導体を含有する光硬化性組成物

Country Status (8)

Country Link
US (1) US20040029044A1 (https=)
JP (1) JP4272156B2 (https=)
KR (1) KR101009124B1 (https=)
CN (1) CN1307221C (https=)
AU (1) AU2003282345A1 (https=)
DE (1) DE10393025T5 (https=)
GB (1) GB2406572B (https=)
WO (1) WO2004014970A1 (https=)

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JP5920346B2 (ja) * 2011-06-17 2016-05-18 コニカミノルタ株式会社 光硬化性インクジェットインク
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US10414953B2 (en) 2016-02-19 2019-09-17 Avery Dennison Corporation Two stage methods for processing adhesives and related compositions
WO2018011674A1 (en) * 2016-07-11 2018-01-18 Soreq Nuclear Research Center Bismaleimide-based solution for inkjet ink for three dimensional printing
CN110099939B (zh) 2016-10-25 2022-09-06 艾利丹尼森公司 在主链中具有光引发剂基团的嵌段聚合物及其用于粘合剂组合物中的用途
JP7054459B2 (ja) * 2017-05-15 2022-04-14 三菱瓦斯化学株式会社 リソグラフィー用膜形成材料、リソグラフィー用膜形成用組成物、リソグラフィー用下層膜及びパターン形成方法
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AU2018392478B2 (en) 2017-12-19 2023-03-16 Avery Dennison Corporation Post-polymerization functionalization of pendant functional groups
KR20210045357A (ko) * 2018-08-20 2021-04-26 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 리소그래피용 막형성재료, 리소그래피용 막형성용 조성물, 리소그래피용 하층막 및 패턴 형성방법
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Also Published As

Publication number Publication date
JP2005535745A (ja) 2005-11-24
GB2406572B (en) 2005-12-14
CN1307221C (zh) 2007-03-28
AU2003282345A1 (en) 2004-02-25
DE10393025T5 (de) 2005-08-25
GB2406572A (en) 2005-04-06
US20040029044A1 (en) 2004-02-12
WO2004014970A1 (en) 2004-02-19
KR20050095578A (ko) 2005-09-29
CN1675270A (zh) 2005-09-28
KR101009124B1 (ko) 2011-01-18
GB0500794D0 (en) 2005-02-23

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