KR101009124B1 - 말레이미드 유도체를 함유하는 광경화성 조성물 - Google Patents

말레이미드 유도체를 함유하는 광경화성 조성물 Download PDF

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Publication number
KR101009124B1
KR101009124B1 KR1020057002239A KR20057002239A KR101009124B1 KR 101009124 B1 KR101009124 B1 KR 101009124B1 KR 1020057002239 A KR1020057002239 A KR 1020057002239A KR 20057002239 A KR20057002239 A KR 20057002239A KR 101009124 B1 KR101009124 B1 KR 101009124B1
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South Korea
Prior art keywords
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maleimide
photocurable composition
acrylate
photocurable
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Expired - Fee Related
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KR1020057002239A
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English (en)
Korean (ko)
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KR20050095578A (ko
Inventor
리차드 엘. 세버랜스
캐롤라인 엠. 일리탈로
피터 티. 엘리어트
Original Assignee
쓰리엠 이노베이티브 프로퍼티즈 컴파니
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Publication of KR20050095578A publication Critical patent/KR20050095578A/ko
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/36—Amides or imides
    • C08F22/40—Imides, e.g. cyclic imides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36—Amides or imides
    • C08F222/40—Imides, e.g. cyclic imides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/04—Anhydrides, e.g. cyclic anhydrides
    • C08F222/06—Maleic anhydride
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
KR1020057002239A 2002-08-08 2003-06-17 말레이미드 유도체를 함유하는 광경화성 조성물 Expired - Fee Related KR101009124B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/214,619 US20040029044A1 (en) 2002-08-08 2002-08-08 Photocurable composition
US10/214,619 2002-08-08

Publications (2)

Publication Number Publication Date
KR20050095578A KR20050095578A (ko) 2005-09-29
KR101009124B1 true KR101009124B1 (ko) 2011-01-18

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KR1020057002239A Expired - Fee Related KR101009124B1 (ko) 2002-08-08 2003-06-17 말레이미드 유도체를 함유하는 광경화성 조성물

Country Status (8)

Country Link
US (1) US20040029044A1 (https=)
JP (1) JP4272156B2 (https=)
KR (1) KR101009124B1 (https=)
CN (1) CN1307221C (https=)
AU (1) AU2003282345A1 (https=)
DE (1) DE10393025T5 (https=)
GB (1) GB2406572B (https=)
WO (1) WO2004014970A1 (https=)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9138383B1 (en) * 2004-04-28 2015-09-22 The Regents Of The University Of Colorado, A Body Corporate Nanogel materials and methods of use thereof
JP4559892B2 (ja) * 2005-03-28 2010-10-13 太陽インキ製造株式会社 着色感光性樹脂組成物及びその硬化物
US20080233307A1 (en) * 2007-02-09 2008-09-25 Chisso Corporation Photocurable inkjet ink
CN101652419B (zh) * 2007-04-12 2013-04-24 Lg化学株式会社 用于制备固化树脂的组合物、由该组合物制备的固化树脂和包含该树脂的墨水组合物
US7547105B2 (en) * 2007-07-16 2009-06-16 3M Innovative Properties Company Prismatic retroreflective article with cross-linked image layer and method of making same
US20100055423A1 (en) * 2008-09-04 2010-03-04 Xerox Corporation Machine Readable Code Comprising Ultra-Violet Curable Gellant Inks
CN102272638B (zh) * 2008-12-08 2014-04-30 3M创新有限公司 具有图形的防护覆盖物以及包括该覆盖物的逆向反射制品
KR101610427B1 (ko) * 2008-12-08 2016-04-07 쓰리엠 이노베이티브 프로퍼티즈 컴파니 그래픽을 갖는 프리즘형 재귀반사성 물품 및 이를 제조하는 방법
JP2010214636A (ja) * 2009-03-13 2010-09-30 E I Du Pont De Nemours & Co 光学的読み取り情報を備える印刷物
US20130025495A1 (en) * 2010-01-11 2013-01-31 Isp Investments Inc. Compositions comprising a reactive monomer and uses thereof
US8628679B2 (en) * 2010-01-20 2014-01-14 Phoenix Inks And Coatings, Llc High-definition demetalization process
JP5615600B2 (ja) * 2010-06-09 2014-10-29 富士フイルム株式会社 インクジェット記録用インク組成物、インクジェット記録方法及びインクジェット印画物
US9062082B2 (en) * 2010-06-30 2015-06-23 Dsm Ip Assets B.V. D1479 stable liquid BAP photoinitiator and its use in radiation curable compositions
US9309341B2 (en) 2010-12-20 2016-04-12 Agfa Graphics Nv Curable jettable fluid for making a flexographic printing master
ES2550469T3 (es) * 2010-12-20 2015-11-10 Agfa Graphics N.V. Método para fabricar una matriz de impresión flexográfica
JP5821225B2 (ja) * 2011-03-15 2015-11-24 コニカミノルタ株式会社 活性エネルギー線硬化型インクジェットインク組成物、及びインクジェット記録方法
JP5398760B2 (ja) * 2011-02-23 2014-01-29 富士フイルム株式会社 インク組成物、画像形成方法及び印画物
JP5920346B2 (ja) * 2011-06-17 2016-05-18 コニカミノルタ株式会社 光硬化性インクジェットインク
JP5857710B2 (ja) * 2011-12-14 2016-02-10 コニカミノルタ株式会社 活性エネルギー線硬化型インクジェットインク、およびそれを用いるインクジェット記録方法
JP5825089B2 (ja) * 2011-12-21 2015-12-02 コニカミノルタ株式会社 紫外線硬化型非水系インクジェットインク
EP2945755B1 (en) 2013-02-06 2019-09-11 Sun Chemical Corporation Digital printing inks
US10414953B2 (en) 2016-02-19 2019-09-17 Avery Dennison Corporation Two stage methods for processing adhesives and related compositions
WO2018011674A1 (en) * 2016-07-11 2018-01-18 Soreq Nuclear Research Center Bismaleimide-based solution for inkjet ink for three dimensional printing
CN110099939B (zh) 2016-10-25 2022-09-06 艾利丹尼森公司 在主链中具有光引发剂基团的嵌段聚合物及其用于粘合剂组合物中的用途
JP7054459B2 (ja) * 2017-05-15 2022-04-14 三菱瓦斯化学株式会社 リソグラフィー用膜形成材料、リソグラフィー用膜形成用組成物、リソグラフィー用下層膜及びパターン形成方法
GB2562747B (en) 2017-05-23 2019-06-26 Henkel IP & Holding GmbH Low-viscosity photocurable adhesive compositions
AU2018392478B2 (en) 2017-12-19 2023-03-16 Avery Dennison Corporation Post-polymerization functionalization of pendant functional groups
KR20210045357A (ko) * 2018-08-20 2021-04-26 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 리소그래피용 막형성재료, 리소그래피용 막형성용 조성물, 리소그래피용 하층막 및 패턴 형성방법
JP7212301B2 (ja) * 2018-08-30 2023-01-25 三菱瓦斯化学株式会社 樹脂組成物、樹脂シート、多層プリント配線板及び半導体装置
KR102192274B1 (ko) * 2018-08-30 2020-12-17 미츠비시 가스 가가쿠 가부시키가이샤 수지 조성물, 수지 시트, 다층 프린트 배선판, 및 반도체 장치
EP3632941B1 (en) * 2018-10-01 2023-08-23 Cubicure GmbH Resin composition
US11345772B2 (en) * 2019-09-06 2022-05-31 Canon Kabushiki Kaisha Curable composition
JP7676107B2 (ja) * 2019-11-19 2025-05-14 スリーエム イノベイティブ プロパティズ カンパニー 放射線硬化型インクジェットインク、装飾シート及び装飾シートの製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000020517A2 (en) * 1999-01-19 2000-04-13 Dsm N.V. Radiation-curable compositions comprising maleimide compounds and method for producing a substrate with a cured layer

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2909994A1 (de) * 1979-03-14 1980-10-02 Basf Ag Acylphosphinoxidverbindungen, ihre herstellung und verwendung
US5275646A (en) * 1990-06-27 1994-01-04 Domino Printing Sciences Plc Ink composition
GB2264118B (en) * 1992-02-07 1996-01-10 Sericol Ltd Radiation-curable compositions
US5450235A (en) * 1993-10-20 1995-09-12 Minnesota Mining And Manufacturing Company Flexible cube-corner retroreflective sheeting
JP2718007B2 (ja) * 1995-06-06 1998-02-25 太陽インキ製造株式会社 アルカリ現像可能な一液型フォトソルダーレジスト組成物及びそれを用いたプリント配線板の製造方法
GB9516108D0 (en) * 1995-08-05 1995-10-04 Tioxide Specialties Ltd Printing inks
GB9603667D0 (en) * 1996-02-21 1996-04-17 Coates Brothers Plc Ink composition
US5721086A (en) * 1996-07-25 1998-02-24 Minnesota Mining And Manufacturing Company Image receptor medium
JPH10153701A (ja) * 1996-11-19 1998-06-09 Minnesota Mining & Mfg Co <3M> 再帰性反射シート
DE19650562A1 (de) * 1996-12-05 1998-06-10 Basf Ag Photoinitiatorgemische, enthaltend Acylphosphinoxide und Benzophenonderivate
US5844020A (en) * 1997-03-31 1998-12-01 Xerox Corporation Phase change ink compositions
JP3599160B2 (ja) * 1997-05-16 2004-12-08 大日本インキ化学工業株式会社 マレイミド誘導体を含有する活性エネルギー線硬化性組成物及び該活性エネルギー線硬化性組成物の硬化方法
DE19727767A1 (de) * 1997-06-30 1999-01-07 Basf Ag Als Ink-Jet-Tinten geeignete Pigmentzubereitungen mit strahlungshärtbarem Bindemittel
NL1006621C2 (nl) * 1997-07-18 1999-01-19 Dsm Nv Stralingsuithardbare coatingsamenstelling.
US6030703A (en) * 1997-08-13 2000-02-29 Sartomer Company, Inc. Radiation curable compositions comprising an unsaturated polyester and a compound having two to six-propenyl ether groups
JP4014803B2 (ja) * 1997-08-05 2007-11-28 セリコル、リミテッド インクジェットインク
ATE333114T1 (de) * 1998-01-30 2006-08-15 Albemarle Corp Maleimide enthaltende fotopolymerisierbare zusammensetzungen und verfahren zu deren verwendung
US6180228B1 (en) * 1998-03-02 2001-01-30 3M Innovative Properties Company Outdoor advertising system
US6312123B1 (en) * 1998-05-01 2001-11-06 L&P Property Management Company Method and apparatus for UV ink jet printing on fabric and combination printing and quilting thereby
US6200647B1 (en) * 1998-07-02 2001-03-13 3M Innovative Properties Company Image receptor medium
CA2353685A1 (en) * 1998-09-28 2000-04-06 Kimberly-Clark Worldwide, Inc. Chelates comprising chinoid groups as photoinitiators
US6139920A (en) * 1998-12-21 2000-10-31 Xerox Corporation Photoresist compositions
US6726317B2 (en) * 1999-09-03 2004-04-27 L&P Property Management Company Method and apparatus for ink jet printing
JP2002121221A (ja) * 2000-08-09 2002-04-23 Dainippon Ink & Chem Inc 光硬化性着色組成物
JP2002161106A (ja) * 2000-09-13 2002-06-04 Dainippon Ink & Chem Inc 光硬化性着色組成物
WO2002038688A2 (en) * 2000-11-09 2002-05-16 3M Innovative Properties Company Weather resistant, ink jettable, radiation curable, fluid compositions particularly suitable for outdoor applications
US6595615B2 (en) * 2001-01-02 2003-07-22 3M Innovative Properties Company Method and apparatus for selection of inkjet printing parameters

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000020517A2 (en) * 1999-01-19 2000-04-13 Dsm N.V. Radiation-curable compositions comprising maleimide compounds and method for producing a substrate with a cured layer

Also Published As

Publication number Publication date
JP2005535745A (ja) 2005-11-24
GB2406572B (en) 2005-12-14
CN1307221C (zh) 2007-03-28
AU2003282345A1 (en) 2004-02-25
DE10393025T5 (de) 2005-08-25
GB2406572A (en) 2005-04-06
JP4272156B2 (ja) 2009-06-03
US20040029044A1 (en) 2004-02-12
WO2004014970A1 (en) 2004-02-19
KR20050095578A (ko) 2005-09-29
CN1675270A (zh) 2005-09-28
GB0500794D0 (en) 2005-02-23

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