AU2003282345A1 - Photocurable composition containing maleide derivatives - Google Patents

Photocurable composition containing maleide derivatives

Info

Publication number
AU2003282345A1
AU2003282345A1 AU2003282345A AU2003282345A AU2003282345A1 AU 2003282345 A1 AU2003282345 A1 AU 2003282345A1 AU 2003282345 A AU2003282345 A AU 2003282345A AU 2003282345 A AU2003282345 A AU 2003282345A AU 2003282345 A1 AU2003282345 A1 AU 2003282345A1
Authority
AU
Australia
Prior art keywords
maleide
derivatives
composition containing
photocurable composition
photocurable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003282345A
Other languages
English (en)
Inventor
Peter T. Elliott
Richard L. Severance
Caroline M. Ylitalo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of AU2003282345A1 publication Critical patent/AU2003282345A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36—Amides or imides
    • C08F222/40—Imides, e.g. cyclic imides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/36—Amides or imides
    • C08F22/40—Imides, e.g. cyclic imides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/04—Anhydrides, e.g. cyclic anhydrides
    • C08F222/06—Maleic anhydride
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
AU2003282345A 2002-08-08 2003-06-17 Photocurable composition containing maleide derivatives Abandoned AU2003282345A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/214,619 US20040029044A1 (en) 2002-08-08 2002-08-08 Photocurable composition
US10/214,619 2002-08-08
PCT/US2003/019136 WO2004014970A1 (en) 2002-08-08 2003-06-17 Photocurable composition containing maleide derivatives

Publications (1)

Publication Number Publication Date
AU2003282345A1 true AU2003282345A1 (en) 2004-02-25

Family

ID=31494683

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003282345A Abandoned AU2003282345A1 (en) 2002-08-08 2003-06-17 Photocurable composition containing maleide derivatives

Country Status (8)

Country Link
US (1) US20040029044A1 (https=)
JP (1) JP4272156B2 (https=)
KR (1) KR101009124B1 (https=)
CN (1) CN1307221C (https=)
AU (1) AU2003282345A1 (https=)
DE (1) DE10393025T5 (https=)
GB (1) GB2406572B (https=)
WO (1) WO2004014970A1 (https=)

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JP2010214636A (ja) * 2009-03-13 2010-09-30 E I Du Pont De Nemours & Co 光学的読み取り情報を備える印刷物
US20130025495A1 (en) * 2010-01-11 2013-01-31 Isp Investments Inc. Compositions comprising a reactive monomer and uses thereof
US8628679B2 (en) * 2010-01-20 2014-01-14 Phoenix Inks And Coatings, Llc High-definition demetalization process
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US9062082B2 (en) * 2010-06-30 2015-06-23 Dsm Ip Assets B.V. D1479 stable liquid BAP photoinitiator and its use in radiation curable compositions
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JP5398760B2 (ja) * 2011-02-23 2014-01-29 富士フイルム株式会社 インク組成物、画像形成方法及び印画物
JP5920346B2 (ja) * 2011-06-17 2016-05-18 コニカミノルタ株式会社 光硬化性インクジェットインク
JP5857710B2 (ja) * 2011-12-14 2016-02-10 コニカミノルタ株式会社 活性エネルギー線硬化型インクジェットインク、およびそれを用いるインクジェット記録方法
JP5825089B2 (ja) * 2011-12-21 2015-12-02 コニカミノルタ株式会社 紫外線硬化型非水系インクジェットインク
EP2945755B1 (en) 2013-02-06 2019-09-11 Sun Chemical Corporation Digital printing inks
US10414953B2 (en) 2016-02-19 2019-09-17 Avery Dennison Corporation Two stage methods for processing adhesives and related compositions
WO2018011674A1 (en) * 2016-07-11 2018-01-18 Soreq Nuclear Research Center Bismaleimide-based solution for inkjet ink for three dimensional printing
CN110099939B (zh) 2016-10-25 2022-09-06 艾利丹尼森公司 在主链中具有光引发剂基团的嵌段聚合物及其用于粘合剂组合物中的用途
JP7054459B2 (ja) * 2017-05-15 2022-04-14 三菱瓦斯化学株式会社 リソグラフィー用膜形成材料、リソグラフィー用膜形成用組成物、リソグラフィー用下層膜及びパターン形成方法
GB2562747B (en) 2017-05-23 2019-06-26 Henkel IP & Holding GmbH Low-viscosity photocurable adhesive compositions
AU2018392478B2 (en) 2017-12-19 2023-03-16 Avery Dennison Corporation Post-polymerization functionalization of pendant functional groups
KR20210045357A (ko) * 2018-08-20 2021-04-26 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 리소그래피용 막형성재료, 리소그래피용 막형성용 조성물, 리소그래피용 하층막 및 패턴 형성방법
JP7212301B2 (ja) * 2018-08-30 2023-01-25 三菱瓦斯化学株式会社 樹脂組成物、樹脂シート、多層プリント配線板及び半導体装置
KR102192274B1 (ko) * 2018-08-30 2020-12-17 미츠비시 가스 가가쿠 가부시키가이샤 수지 조성물, 수지 시트, 다층 프린트 배선판, 및 반도체 장치
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Also Published As

Publication number Publication date
JP2005535745A (ja) 2005-11-24
GB2406572B (en) 2005-12-14
CN1307221C (zh) 2007-03-28
DE10393025T5 (de) 2005-08-25
GB2406572A (en) 2005-04-06
JP4272156B2 (ja) 2009-06-03
US20040029044A1 (en) 2004-02-12
WO2004014970A1 (en) 2004-02-19
KR20050095578A (ko) 2005-09-29
CN1675270A (zh) 2005-09-28
KR101009124B1 (ko) 2011-01-18
GB0500794D0 (en) 2005-02-23

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase