CN1307221C - 含有马来酰亚胺衍生物的可光固化组合物 - Google Patents

含有马来酰亚胺衍生物的可光固化组合物 Download PDF

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Publication number
CN1307221C
CN1307221C CNB038189046A CN03818904A CN1307221C CN 1307221 C CN1307221 C CN 1307221C CN B038189046 A CNB038189046 A CN B038189046A CN 03818904 A CN03818904 A CN 03818904A CN 1307221 C CN1307221 C CN 1307221C
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CN
China
Prior art keywords
curable composition
photo curable
base material
maleimide
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB038189046A
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English (en)
Chinese (zh)
Other versions
CN1675270A (zh
Inventor
R·L·赛弗伦斯
C·M·依利塔罗
P·T·埃利奥特
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of CN1675270A publication Critical patent/CN1675270A/zh
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Publication of CN1307221C publication Critical patent/CN1307221C/zh
Anticipated expiration legal-status Critical
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36—Amides or imides
    • C08F222/40—Imides, e.g. cyclic imides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/36—Amides or imides
    • C08F22/40—Imides, e.g. cyclic imides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/04—Anhydrides, e.g. cyclic anhydrides
    • C08F222/06—Maleic anhydride
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Materials For Photolithography (AREA)
CNB038189046A 2002-08-08 2003-06-17 含有马来酰亚胺衍生物的可光固化组合物 Expired - Fee Related CN1307221C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/214,619 2002-08-08
US10/214,619 US20040029044A1 (en) 2002-08-08 2002-08-08 Photocurable composition

Publications (2)

Publication Number Publication Date
CN1675270A CN1675270A (zh) 2005-09-28
CN1307221C true CN1307221C (zh) 2007-03-28

Family

ID=31494683

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB038189046A Expired - Fee Related CN1307221C (zh) 2002-08-08 2003-06-17 含有马来酰亚胺衍生物的可光固化组合物

Country Status (8)

Country Link
US (1) US20040029044A1 (https=)
JP (1) JP4272156B2 (https=)
KR (1) KR101009124B1 (https=)
CN (1) CN1307221C (https=)
AU (1) AU2003282345A1 (https=)
DE (1) DE10393025T5 (https=)
GB (1) GB2406572B (https=)
WO (1) WO2004014970A1 (https=)

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JP5857710B2 (ja) * 2011-12-14 2016-02-10 コニカミノルタ株式会社 活性エネルギー線硬化型インクジェットインク、およびそれを用いるインクジェット記録方法
JP5825089B2 (ja) * 2011-12-21 2015-12-02 コニカミノルタ株式会社 紫外線硬化型非水系インクジェットインク
US9587127B2 (en) 2013-02-06 2017-03-07 Sun Chemical Corporation Digital printing inks
BR112018016868B1 (pt) 2016-02-19 2022-09-13 Avery Dennison Corporation Composições de adesivos e artigo compreendendo as mesmas
WO2018011674A1 (en) * 2016-07-11 2018-01-18 Soreq Nuclear Research Center Bismaleimide-based solution for inkjet ink for three dimensional printing
US10640595B2 (en) 2016-10-25 2020-05-05 Avery Dennison Corporation Controlled architecture polymerization with photoinitiator groups in backbone
GB2562747B (en) 2017-05-23 2019-06-26 Henkel IP & Holding GmbH Low-viscosity photocurable adhesive compositions
US12163069B2 (en) 2017-12-19 2024-12-10 Avery Dennison Corporation Post-polymerization functionalization of pendant functional groups
JP7256482B2 (ja) * 2018-08-20 2023-04-12 三菱瓦斯化学株式会社 リソグラフィー用膜形成材料、リソグラフィー用膜形成用組成物、リソグラフィー用下層膜及びパターン形成方法
JP7212301B2 (ja) * 2018-08-30 2023-01-25 三菱瓦斯化学株式会社 樹脂組成物、樹脂シート、多層プリント配線板及び半導体装置
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Publication number Priority date Publication date Assignee Title
TWI761512B (zh) * 2017-05-15 2022-04-21 日商三菱瓦斯化學股份有限公司 微影用膜形成材料、微影用膜形成用組成物、微影用下層膜及圖型形成方法

Also Published As

Publication number Publication date
KR101009124B1 (ko) 2011-01-18
JP2005535745A (ja) 2005-11-24
CN1675270A (zh) 2005-09-28
WO2004014970A1 (en) 2004-02-19
JP4272156B2 (ja) 2009-06-03
GB2406572B (en) 2005-12-14
DE10393025T5 (de) 2005-08-25
KR20050095578A (ko) 2005-09-29
US20040029044A1 (en) 2004-02-12
AU2003282345A1 (en) 2004-02-25
GB2406572A (en) 2005-04-06
GB0500794D0 (en) 2005-02-23

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