JP4136067B2 - 検出装置及びそれを用いた露光装置 - Google Patents

検出装置及びそれを用いた露光装置 Download PDF

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Publication number
JP4136067B2
JP4136067B2 JP13113298A JP13113298A JP4136067B2 JP 4136067 B2 JP4136067 B2 JP 4136067B2 JP 13113298 A JP13113298 A JP 13113298A JP 13113298 A JP13113298 A JP 13113298A JP 4136067 B2 JP4136067 B2 JP 4136067B2
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JP
Japan
Prior art keywords
pattern
wafer
light
exposure apparatus
dmd
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP13113298A
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English (en)
Japanese (ja)
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JPH1123225A (ja
JPH1123225A5 (enExample
Inventor
雅宣 長谷川
美紀 大嵜
実 吉井
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP13113298A priority Critical patent/JP4136067B2/ja
Priority to US09/070,741 priority patent/US6040909A/en
Publication of JPH1123225A publication Critical patent/JPH1123225A/ja
Publication of JPH1123225A5 publication Critical patent/JPH1123225A5/ja
Application granted granted Critical
Publication of JP4136067B2 publication Critical patent/JP4136067B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP13113298A 1997-05-02 1998-04-25 検出装置及びそれを用いた露光装置 Expired - Fee Related JP4136067B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP13113298A JP4136067B2 (ja) 1997-05-02 1998-04-25 検出装置及びそれを用いた露光装置
US09/070,741 US6040909A (en) 1997-05-02 1998-05-01 Surface position detecting system and device manufacturing method using the same

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP9-130484 1997-05-02
JP13048497 1997-05-02
JP13113298A JP4136067B2 (ja) 1997-05-02 1998-04-25 検出装置及びそれを用いた露光装置

Publications (3)

Publication Number Publication Date
JPH1123225A JPH1123225A (ja) 1999-01-29
JPH1123225A5 JPH1123225A5 (enExample) 2005-04-14
JP4136067B2 true JP4136067B2 (ja) 2008-08-20

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JP13113298A Expired - Fee Related JP4136067B2 (ja) 1997-05-02 1998-04-25 検出装置及びそれを用いた露光装置

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US (1) US6040909A (enExample)
JP (1) JP4136067B2 (enExample)

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US6618123B2 (en) 2000-10-20 2003-09-09 Matsushita Electric Industrial Co., Ltd. Range-finder, three-dimensional measuring method and light source apparatus
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US6946655B2 (en) 2001-11-07 2005-09-20 Applied Materials, Inc. Spot grid array electron imaging system
JP2004046146A (ja) * 2002-05-23 2004-02-12 Fuji Photo Film Co Ltd 露光ヘッド
US20040120577A1 (en) * 2002-10-06 2004-06-24 Igor Touzov Digital video based array detector for parallel process control and radiation driver for micro-scale devices
JP4227402B2 (ja) * 2002-12-06 2009-02-18 キヤノン株式会社 走査型露光装置
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JP2005159213A (ja) * 2003-11-28 2005-06-16 Canon Inc シアリング干渉を利用した測定方法及び装置、それを利用した露光方法及び装置、並びに、デバイス製造方法
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US7423765B2 (en) * 2004-07-31 2008-09-09 Carl Zeiss Smt Ag Optical system of a microlithographic projection exposure apparatus
JP4690754B2 (ja) * 2005-03-24 2011-06-01 株式会社ナノシステムソリューションズ 大面積マスクレス露光方法及び露光装置
JP2007114087A (ja) * 2005-10-21 2007-05-10 Nano System Solutions:Kk 表面検査方法
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KR20130079603A (ko) * 2006-07-06 2013-07-10 가부시키가이샤 니콘 광학 디바이스, 노광 장치, 및 디바이스 제조 방법
JP2008042036A (ja) * 2006-08-08 2008-02-21 Canon Inc 露光装置及びデバイス製造方法
JP5090803B2 (ja) * 2007-06-29 2012-12-05 株式会社オーク製作所 描画装置
JP2009036631A (ja) * 2007-08-01 2009-02-19 Omron Corp 三次元形状計測装置、および当該三次元形状計測装置の製造方法
JP5039578B2 (ja) * 2008-01-16 2012-10-03 キヤノン株式会社 計測装置及び光強度分布計測方法、露光装置
US8345242B2 (en) * 2008-10-28 2013-01-01 Molecular Imprints, Inc. Optical system for use in stage control
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CN101813474B (zh) * 2010-04-13 2012-06-13 中国科学院长春光学精密机械与物理研究所 一种标定光轴上的点在ccd上成像位置的方法
US8860695B2 (en) * 2011-08-05 2014-10-14 Pixart Imaging Inc. Optical touch system and electronic apparatus including the same
JP2014056352A (ja) * 2012-09-11 2014-03-27 Canon Inc 位置決め装置及び計測装置
CN103196889A (zh) * 2013-04-16 2013-07-10 许春 基于微机电系统光谱分析的便携式拉曼光谱仪
CN103245654A (zh) * 2013-05-15 2013-08-14 苏州大学 基于数字微镜阵列的便携式拉曼检测仪以及检测方法
JP2016071010A (ja) * 2014-09-29 2016-05-09 株式会社ミツトヨ オートフォーカス装置、オートフォーカス方法、及びプログラム
CN104458696A (zh) * 2014-12-02 2015-03-25 天津大学 基于数字微镜元件的微型固化拉曼光谱仪
JP6513980B2 (ja) * 2015-03-16 2019-05-15 株式会社東芝 撮像装置及び撮像方法
CN111183502B (zh) * 2017-09-28 2022-11-15 Asml荷兰有限公司 光学高度检测系统
US10209636B1 (en) * 2018-03-07 2019-02-19 Sandisk Technologies Llc Exposure focus leveling method using region-differentiated focus scan patterns
DE102018208417A1 (de) * 2018-05-28 2019-11-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Projektionsvorrichtung und Projektionsverfahren
CN111352304B (zh) * 2018-12-24 2021-11-19 上海微电子装备（集团）股份有限公司 调焦调平装置、光刻设备及调焦调平方法
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Publication number Priority date Publication date Assignee Title
JPH0717058U (ja) * 1993-09-07 1995-03-28 晴彦 草川 魚釣り用くるくる集魚板

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JPH1123225A (ja) 1999-01-29
US6040909A (en) 2000-03-21

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