JP4130163B2 - 半導体発光素子 - Google Patents
半導体発光素子 Download PDFInfo
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- JP4130163B2 JP4130163B2 JP2003337701A JP2003337701A JP4130163B2 JP 4130163 B2 JP4130163 B2 JP 4130163B2 JP 2003337701 A JP2003337701 A JP 2003337701A JP 2003337701 A JP2003337701 A JP 2003337701A JP 4130163 B2 JP4130163 B2 JP 4130163B2
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- 239000004065 semiconductor Substances 0.000 title claims description 129
- 230000000737 periodic effect Effects 0.000 claims description 60
- 229910052751 metal Inorganic materials 0.000 claims description 40
- 239000002184 metal Substances 0.000 claims description 40
- 150000004767 nitrides Chemical class 0.000 claims description 28
- 239000000463 material Substances 0.000 claims description 9
- 229910052697 platinum Inorganic materials 0.000 claims description 8
- 229910052709 silver Inorganic materials 0.000 claims description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- 238000000605 extraction Methods 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910052763 palladium Inorganic materials 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 336
- 239000013078 crystal Substances 0.000 description 54
- 239000000758 substrate Substances 0.000 description 37
- 239000011241 protective layer Substances 0.000 description 33
- 238000005253 cladding Methods 0.000 description 32
- 238000000034 method Methods 0.000 description 32
- 230000000694 effects Effects 0.000 description 28
- 239000007789 gas Substances 0.000 description 26
- 230000004888 barrier function Effects 0.000 description 22
- 238000004519 manufacturing process Methods 0.000 description 21
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 20
- 239000012159 carrier gas Substances 0.000 description 17
- 239000002019 doping agent Substances 0.000 description 14
- 239000011701 zinc Substances 0.000 description 12
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 11
- 238000001771 vacuum deposition Methods 0.000 description 10
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 8
- 229910015363 Au—Sn Inorganic materials 0.000 description 7
- 229910052737 gold Inorganic materials 0.000 description 7
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 230000002238 attenuated effect Effects 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- RGGPNXQUMRMPRA-UHFFFAOYSA-N triethylgallium Chemical compound CC[Ga](CC)CC RGGPNXQUMRMPRA-UHFFFAOYSA-N 0.000 description 5
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 5
- 238000005530 etching Methods 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 229910002704 AlGaN Inorganic materials 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000009751 slip forming Methods 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000000171 gas-source molecular beam epitaxy Methods 0.000 description 1
- 238000002248 hydride vapour-phase epitaxy Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005424 photoluminescence Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- WGPCGCOKHWGKJJ-UHFFFAOYSA-N sulfanylidenezinc Chemical group [Zn]=S WGPCGCOKHWGKJJ-UHFFFAOYSA-N 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
- H01L33/387—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape with a plurality of electrode regions in direct contact with the semiconductor body and being electrically interconnected by another electrode layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1225—Basic optical elements, e.g. light-guiding paths comprising photonic band-gap structures or photonic lattices
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1226—Basic optical elements, e.g. light-guiding paths involving surface plasmon interaction
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04254—Electrodes, e.g. characterised by the structure characterised by the shape
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- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18319—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement comprising a periodical structure in lateral directions
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- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34333—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0083—Periodic patterns for optical field-shaping in or on the semiconductor body or semiconductor body package, e.g. photonic bandgap structures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/405—Reflective materials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2304/00—Special growth methods for semiconductor lasers
- H01S2304/04—MOCVD or MOVPE
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04252—Electrodes, e.g. characterised by the structure characterised by the material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1046—Comprising interactions between photons and plasmons, e.g. by a corrugated surface
Description
"Coupling of InGaN quantum−well photoluminescence to silver surface plasmons",Phys.Rev.PRB60,11564−11567,15 October 1999
図1は、本発明の第1実施形態による窒化物系半導体発光ダイオード素子(LED)の構造を示した断面図である。図2は、図1に示した第1実施形態による窒化物系半導体発光ダイオード素子の電極の周期的な構造を説明するための平面図である。図3は、図2の電極の周期的構造に対する逆格子を示した平面図である。図1〜図3を参照して、まず、周期的に形成した電極側を光の取り出し面とする第1実施形態による窒化物系半導体発光ダイオード素子の構造について説明する。
図4は、本発明の第2実施形態による窒化物系半導体発光ダイオード素子の構造を示した断面図である。図4を参照して、この第2実施形態では、上記した第1実施形態と異なり、プラズマ周波数の高い金属からなる電極のみを周期構造を有する構造に形成し、周期構造を有する電極側を光の取り出し面とする発光ダイオード素子について説明する。
図5は、本発明の第3実施形態による窒化物系半導体発光ダイオード素子(LED)の構造を示した断面図である。図5を参照して、この第3実施形態では、p型コンタクト層の表面に周期的な凹凸形状を形成し、凹凸形状を形成した側を光の取り出し面とする発光ダイオード素子について説明する。
図6は、本発明の第4実施形態による半導体発光素子(半導体発光ダイオード素子(LED)または面発光型半導体レーザ素子)の構造を示した断面図である。図6を参照して、次に、第4実施形態による半導体発光素子の構造について説明する。
図7は、本発明の第1参考形態による導波路構造を有する窒化物系半導体レーザ素子の構造を示した断面図であり、図8は、図7の200−200線に沿った断面図である。図7および図8を参照して、この第1参考形態では、本発明を、導波路構造を有する窒化物系半導体レーザ素子に適用した場合の例について説明する。
図9は、本発明の第2参考形態による半導体発光素子の構造を示した断面図である。図9を参照して、この第2参考形態では、表面プラズモン効果を得るために表面に周期的に形成した電極とは反対側を光の取り出し面とする半導体発光ダイオード素子(LED)や垂直共振器型半導体レーザなどの半導体発光素子について説明する。
図12は、本発明の第3参考形態による半導体発光素子を示した断面図である。図12を参照して、この第3参考形態では、上記第2参考形態と異なり、オーミック電極99がコンタクト層48上の全面に形成されているとともに、そのオーミック電極99上に、周期的な構造を有するプラズマ周波数の高い金属からなる電極100が形成された構造について説明する。なお、第3参考形態のその他の構造は、第2参考形態と同様である。
図14は、本発明の第4参考形態による半導体発光素子の構造を示した断面図である。図14を参照して、この第4参考形態では、上記した第2参考形態と異なり、コンタクト層108の上面が周期的な凹凸形状を有する半導体発光素子について説明する。なお、第4参考形態のその他の構造は、第2参考形態と同様である。
図16は、本発明の第5実施形態による半導体発光ダイオード素子を示した断面図である。図16を参照して、この第5実施形態の構造は、図1に示した第1実施形態の構造を、ZnO系の材料を用いた構造に適用した場合について説明する。
7、37、66、127 p型コンタクト層(半導体層)
8、18、38、49、68、89、99、109 オーミック電極(第1電極層)
9、19、39、50、69、90、100、110 電極(第2電極層)
47 SQW発光層(発光層)
48、108 コンタクト層(半導体層)
Claims (6)
- 発光層上に形成された半導体層と、
前記半導体層上に形成された第1電極層と、
前記第1電極層上に形成され、周期的な構造を有する第2電極層とを備え、
前記第1電極層は、前記第2電極層よりも前記半導体層に対するオーミック接触が良好であり、
前記第2電極層は、前記第1電極層よりもプラズマ周波数の高い金属を含み、
前記第2電極層側を光の取り出し面とする、半導体発光素子。 - 前記半導体層は、p型の窒化物系半導体層であり、
前記第1電極層は、前記p型の窒化物系半導体層に接触するように形成されている、請求項1に記載の半導体発光素子。 - 前記第2電極層の周期的な構造は、前記第2電極層が形成されていない部分を周期的に並べた構造を有している、請求項1または2に記載の半導体発光素子。
- 前記第1電極層は、前記第1電極層が形成されていない部分を周期的に並べた構造を有している、請求項1〜3のいずれか1項に記載の半導体発光素子。
- 前記第1電極層は、前記第2電極層よりも小さい厚みを有する、請求項1〜4のいずれか1項に記載の半導体発光素子。
- 前記第1電極層は、Ni、PdおよびPtのうちの少なくとも1つの材料からなり、
前記第2電極層は、AlおよびAgのうちの少なくとも1つの材料からなる、請求項1〜5のいずれか1項に記載の半導体発光素子。
Priority Applications (3)
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JP2003337701A JP4130163B2 (ja) | 2003-09-29 | 2003-09-29 | 半導体発光素子 |
US10/951,816 US6998649B2 (en) | 2003-09-29 | 2004-09-29 | Semiconductor light-emitting device |
CNB200410080671XA CN100358195C (zh) | 2003-09-29 | 2004-09-29 | 半导体发光元件 |
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JP2003337701A JP4130163B2 (ja) | 2003-09-29 | 2003-09-29 | 半導体発光素子 |
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JP2005108982A JP2005108982A (ja) | 2005-04-21 |
JP4130163B2 true JP4130163B2 (ja) | 2008-08-06 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2011024615A1 (ja) | 2009-08-31 | 2011-03-03 | 国立大学法人京都大学 | 紫外線照射装置 |
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Publication number | Priority date | Publication date | Assignee | Title |
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US20030198301A1 (en) * | 2002-01-30 | 2003-10-23 | Kazutaka Terashima | Method of epitaxial lateral overgrowth |
JP4463569B2 (ja) * | 2004-01-14 | 2010-05-19 | パナソニック株式会社 | レーザ装置 |
US7161188B2 (en) * | 2004-06-28 | 2007-01-09 | Matsushita Electric Industrial Co., Ltd. | Semiconductor light emitting element, semiconductor light emitting device, and method for fabricating semiconductor light emitting element |
JP4224041B2 (ja) * | 2004-08-26 | 2009-02-12 | シャープ株式会社 | 半導体レーザ素子、半導体レーザ素子の製造方法、光ディスク装置および光伝送システム |
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US6998649B2 (en) | 2006-02-14 |
CN100358195C (zh) | 2007-12-26 |
US20050067625A1 (en) | 2005-03-31 |
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