JP3884887B2 - 描画用探針及びその製作方法 - Google Patents

描画用探針及びその製作方法 Download PDF

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Publication number
JP3884887B2
JP3884887B2 JP24133099A JP24133099A JP3884887B2 JP 3884887 B2 JP3884887 B2 JP 3884887B2 JP 24133099 A JP24133099 A JP 24133099A JP 24133099 A JP24133099 A JP 24133099A JP 3884887 B2 JP3884887 B2 JP 3884887B2
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JP
Japan
Prior art keywords
probe
conductive
layer
tip
insulating
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Expired - Fee Related
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JP24133099A
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English (en)
Japanese (ja)
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JP2001062791A5 (https=
JP2001062791A (ja
Inventor
雅義 石橋
富博 橋詰
博司 梶山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Technology Corp
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Renesas Technology Corp
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Publication date
Application filed by Renesas Technology Corp filed Critical Renesas Technology Corp
Priority to JP24133099A priority Critical patent/JP3884887B2/ja
Priority to US09/616,076 priority patent/US7115863B1/en
Publication of JP2001062791A publication Critical patent/JP2001062791A/ja
Publication of JP2001062791A5 publication Critical patent/JP2001062791A5/ja
Application granted granted Critical
Publication of JP3884887B2 publication Critical patent/JP3884887B2/ja
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Expired - Fee Related legal-status Critical Current

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2049Exposure; Apparatus therefor using a cantilever
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q80/00Applications, other than SPM, of scanning-probe techniques
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30Electron or ion beam tubes for processing objects
    • H01J2237/317Processing objects on a microscale
    • H01J2237/3175Lithography
    • H01J2237/31752Lithography using particular beams or near-field effects, e.g. STM-like techniques
    • H01J2237/31759Lithography using particular beams or near-field effects, e.g. STM-like techniques using near-field effects, e.g. STM

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Micromachines (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Measuring Leads Or Probes (AREA)
JP24133099A 1999-08-27 1999-08-27 描画用探針及びその製作方法 Expired - Fee Related JP3884887B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP24133099A JP3884887B2 (ja) 1999-08-27 1999-08-27 描画用探針及びその製作方法
US09/616,076 US7115863B1 (en) 1999-08-27 2000-07-13 Probe for scanning probe lithography and making method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24133099A JP3884887B2 (ja) 1999-08-27 1999-08-27 描画用探針及びその製作方法

Publications (3)

Publication Number Publication Date
JP2001062791A JP2001062791A (ja) 2001-03-13
JP2001062791A5 JP2001062791A5 (https=) 2004-11-11
JP3884887B2 true JP3884887B2 (ja) 2007-02-21

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Family Applications (1)

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JP24133099A Expired - Fee Related JP3884887B2 (ja) 1999-08-27 1999-08-27 描画用探針及びその製作方法

Country Status (2)

Country Link
US (1) US7115863B1 (https=)
JP (1) JP3884887B2 (https=)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1599939B (zh) * 2002-01-15 2010-08-11 国际商业机器公司 形成微观结构的方法
US6975124B2 (en) * 2003-09-22 2005-12-13 International Business Machines Corp. Multipoint nanoprobe
FR2862156B1 (fr) * 2003-11-06 2007-01-05 Commissariat Energie Atomique Dispositif d'enregistrement de donnees a micro-pointes conductrices et procede de fabrication d'un tel dispositif
KR100612595B1 (ko) 2004-01-05 2006-08-17 한국기계연구원 나노 압입 시험 기능을 갖는 afm 캔틸레버
CN100389344C (zh) * 2004-03-27 2008-05-21 鸿富锦精密工业(深圳)有限公司 导光板模仁制造方法
JP4326016B2 (ja) * 2004-08-27 2009-09-02 パイオニア株式会社 プローブ、該プローブの製造方法、並びに記録装置及び再生装置
JP2007114033A (ja) * 2005-10-20 2007-05-10 Seiko Instruments Inc プローブ及び走査型プローブ顕微鏡並びにプローブの製造方法
US20070291623A1 (en) * 2006-06-15 2007-12-20 Nanochip, Inc. Cantilever with control of vertical and lateral position of contact probe tip
US20070290282A1 (en) * 2006-06-15 2007-12-20 Nanochip, Inc. Bonded chip assembly with a micro-mover for microelectromechanical systems
JP4680868B2 (ja) * 2006-11-20 2011-05-11 日本電信電話株式会社 走査型プローブ顕微鏡用探針
KR100869046B1 (ko) 2007-02-09 2008-11-18 한국기계연구원 Afm 프로브
JP4798454B2 (ja) * 2007-02-19 2011-10-19 オリンパス株式会社 細胞内及び細胞間の微小空間計測用カンチレバーシステム
EP2077249A1 (en) * 2008-01-06 2009-07-08 Universiteit Twente A method for making a 3D nanostructure having a nanosubstructure, and an insulating pyramid having a metallic tip, a pyramid having a nano-apertures and horizontal and/or vertical nanowires obtainable by this method
JP5548914B2 (ja) * 2008-09-03 2014-07-16 株式会社リコー 加工用カンチレバー
JP5667350B2 (ja) * 2009-08-07 2015-02-12 株式会社神戸製鋼所 コンタクトプローブピン
JP5007383B2 (ja) * 2010-01-29 2012-08-22 株式会社東芝 Memsメモリ用マイクロプローブ
EP2754176A4 (en) * 2011-09-08 2015-04-15 Univ California SENSOR FOR DETECTING LOW NOISE IN LIQUIDS
CN102785209B (zh) * 2012-08-17 2015-07-08 上海齐迈五金有限公司 一种棘轮手柄
EP2835654A1 (en) * 2013-08-09 2015-02-11 Université de Genève Insulator coated conductive probe and method of production thereof
JP6448594B2 (ja) * 2016-09-13 2019-01-09 株式会社東芝 導電性プローブ、電気特性評価システム、走査型プローブ顕微鏡、導電性プローブ製造方法、及び、電気特性測定方法
WO2020240179A1 (en) * 2019-05-27 2020-12-03 Oxford University Innovation Limited Scanning probe lithography

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3010318B2 (ja) * 1991-02-26 2000-02-21 キヤノン株式会社 微小プローブ、その製造方法、該プローブを用いた表面観察装置及び情報処理装置
DE69114492T2 (de) * 1991-09-05 1996-06-20 International Business Machines Corp., Armonk, N.Y. Einheit mit mehreren Spitzen für ein Rastertunnelmikroskop, Verfahren für deren Herstellung und Anwendung derselben in einer Speichereinheit mit direktem Zugriff.
US5537863A (en) * 1993-07-15 1996-07-23 Nikon Corporation Scanning probe microscope having a cantilever used therein
JPH0854403A (ja) 1994-08-09 1996-02-27 Nissin Electric Co Ltd 複合顕微鏡の導電性カンチレバ−構造
JPH08129875A (ja) 1994-10-28 1996-05-21 Hewlett Packard Co <Hp> 導電性針の位置ずれを低減したプローブ装置
US5936237A (en) * 1995-07-05 1999-08-10 Van Der Weide; Daniel Warren Combined topography and electromagnetic field scanning probe microscope
WO1997034122A1 (en) * 1996-03-13 1997-09-18 International Business Machines Corporation Cantilever structures
JPH09251947A (ja) 1996-03-18 1997-09-22 Nikon Corp 微細加工装置
US6088320A (en) * 1997-02-19 2000-07-11 International Business Machines Corporation Micro-mechanically fabricated read/write head with a strengthening shell on the tip shaft
US5886922A (en) * 1997-05-07 1999-03-23 Hewlett-Packard Company Probe device for memory device having multiple cantilever probes
JP3643480B2 (ja) 1997-06-10 2005-04-27 株式会社日立製作所 描画装置
JPH1194863A (ja) 1997-09-12 1999-04-09 Nikon Corp カンチレバー及びその製造方法
US6014032A (en) * 1997-09-30 2000-01-11 International Business Machines Corporation Micro probe ring assembly and method of fabrication

Also Published As

Publication number Publication date
US7115863B1 (en) 2006-10-03
JP2001062791A (ja) 2001-03-13

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