JP5667350B2 - コンタクトプローブピン - Google Patents
コンタクトプローブピン Download PDFInfo
- Publication number
- JP5667350B2 JP5667350B2 JP2009185271A JP2009185271A JP5667350B2 JP 5667350 B2 JP5667350 B2 JP 5667350B2 JP 2009185271 A JP2009185271 A JP 2009185271A JP 2009185271 A JP2009185271 A JP 2009185271A JP 5667350 B2 JP5667350 B2 JP 5667350B2
- Authority
- JP
- Japan
- Prior art keywords
- carbon film
- probe pin
- contact probe
- tip
- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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- 239000000523 sample Substances 0.000 title claims description 67
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 85
- 229910052799 carbon Inorganic materials 0.000 claims description 83
- 229910052751 metal Inorganic materials 0.000 claims description 54
- 239000002184 metal Substances 0.000 claims description 54
- 239000011651 chromium Substances 0.000 claims description 9
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 7
- 229910052721 tungsten Inorganic materials 0.000 claims description 7
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 6
- 239000010937 tungsten Substances 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- 230000007423 decrease Effects 0.000 claims description 4
- 239000010955 niobium Substances 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 238000009751 slip forming Methods 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 7
- 239000010931 gold Substances 0.000 claims 7
- 229910052737 gold Inorganic materials 0.000 claims 7
- 239000010408 film Substances 0.000 description 76
- 239000000463 material Substances 0.000 description 20
- 238000007689 inspection Methods 0.000 description 14
- 230000000694 effects Effects 0.000 description 13
- 239000000758 substrate Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 238000009826 distribution Methods 0.000 description 9
- 238000004458 analytical method Methods 0.000 description 8
- 239000007772 electrode material Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000004453 electron probe microanalysis Methods 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 229910001315 Tool steel Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- DMFGNRRURHSENX-UHFFFAOYSA-N beryllium copper Chemical compound [Be].[Cu] DMFGNRRURHSENX-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000011162 core material Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/22—Contacts for co-operating by abutting
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
- G01R1/06733—Geometry aspects
- G01R1/06738—Geometry aspects related to tip portion
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/03—Contact members characterised by the material, e.g. plating, or coating materials
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
- G01R1/06755—Material aspects
- G01R1/06761—Material aspects related to layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
Landscapes
- Physics & Mathematics (AREA)
- Geometry (AREA)
- General Physics & Mathematics (AREA)
- Measuring Leads Or Probes (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
コンタクトプローブピンには、前記図1、2に示したものと同様に、先端部が4分割されたスプリング内蔵のものを用いた。炭素皮膜に金属をドープし、更にその濃度分布を制御するために、次のような方法を採用した。
[EPMA測定条件]
加速電圧:10kV
照射電流:0.1μA
分析方法:定量分析(指定元素C,Ar,W)
分析範囲:φ0.2μm
バイアス電圧を−100Vにした以外は、実施例1と同条件で、炭素皮膜を形成し、同様に各位置における組成分析(原子%)を行なった。その結果を、下記に示す。
[組成分析結果]
先端部/C:73.0、Ar:4.1、W:22.9
側面部(10μm位置:外周面)/C:76.1、Ar:4.1、W:19.8
側面部(10μm位置:内周面)/C:78.78、Ar:3.57、W:17.65
側面部(20μm位置:外周面)/C:77.4、Ar:3.7、W:18.9
基材の軸心方向がターゲット面と平行となるように配置する以外は、上記と同様にしてスパッタリングを行ない、コンタクトプローブピンの基材(株式会社ヨコオ製)表面に炭素皮膜を形成した(それ以外の条件は、上記と同じ)。上記のようにして炭素皮膜を形成したコンタクトプローブピンを、実施例と同様にして各位置における組成分析を行なった。
炭素皮膜中のW含有量と電気抵抗(比抵抗)の関係について調査した。このとき、試験片としてW含有量(含有量はEPMAによる測定)を様々に変化させた炭素皮膜(膜厚:0.5μm)を絶縁性基板上に形成し、各炭素皮膜の比抵抗を下記の方法で測定した。
薄膜の抵抗測定において一般的に用いられる四探針法により、市販の測定器(日置電気 3226 mΩテスター+共和理研製 四探針測定器)を用いて薄膜のシート抵抗を測定し、これに膜厚を乗じることにより比抵抗を算出した。
摺動試験装置により、銅製のピンの先に鉛フリーハンダ(Sn+3原子%Cu+0.5原子%Ag)を固定し、先端の大きさがφ2mm(フラット)としたものを、Wを含有した炭素皮膜(DLC膜)上で、荷重:1kgf(9.8N)、摺動速度:100mm/minにて100回摺動を実施した後の、ハンダと炭素皮膜との摩擦係数を測定した。
11 先端部
12 電極
13 電極材料
Claims (6)
- 先端部から側面部に亘って表面に、金属またはその炭化物を含有する炭素皮膜が連続的に形成されており、炭素皮膜中の金属またはその炭化物の含有量は、前記先端部から側面部になるにつれて連続的または断続的に減少するように構成されたものであることを特徴とするコンタクトプローブピン。
- 前記先端部の炭素皮膜中の金属またはその炭化物の含有量をA(原子%)、被検体と接触しない側面部における炭素皮膜中の金属またはその炭化物の最大含有量をB(原子%)としたとき、これらの比(B/A)が0.9以下である請求項1に記載のコンタクトプローブピン。
- 前記先端部の炭素皮膜中の金属またはその炭化物の含有量をA(原子%)、前記先端部から根元側10μm位置における側面部の炭素皮膜中の金属またはその炭化物の含有量をB’(原子%)としたとき、これらの比(B’/A)が0.9以下である請求項1に記載のコンタクトプローブピン。
- 前記先端部の炭素皮膜中の金属またはその炭化物の含有量は、5〜30原子%である請求項1〜3のいずれかに記載のコンタクトプローブピン。
- 前記金属は、タングステン、タンタル、モリブデン、ニオブ、チタンおよびクロムよりなる群から選択される1種以上である請求項1〜4のいずれかに記載のコンタクトプローブピン。
- コンタクトプローブピンによって検査される被検体は、スズまたはスズを含有する合金からなるものである請求項1〜5のいずれかに記載のコンタクトプローブピン。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009185271A JP5667350B2 (ja) | 2009-08-07 | 2009-08-07 | コンタクトプローブピン |
US12/850,206 US7934962B2 (en) | 2009-08-07 | 2010-08-04 | Contact probe pin |
CN2010102473834A CN101995496B (zh) | 2009-08-07 | 2010-08-05 | 接触探针 |
TW099126282A TWI444624B (zh) | 2009-08-07 | 2010-08-06 | 接觸探針銷 |
KR1020100075764A KR101161510B1 (ko) | 2009-08-07 | 2010-08-06 | 콘택트 프로브 핀 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009185271A JP5667350B2 (ja) | 2009-08-07 | 2009-08-07 | コンタクトプローブピン |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011038859A JP2011038859A (ja) | 2011-02-24 |
JP5667350B2 true JP5667350B2 (ja) | 2015-02-12 |
Family
ID=43535158
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009185271A Active JP5667350B2 (ja) | 2009-08-07 | 2009-08-07 | コンタクトプローブピン |
Country Status (5)
Country | Link |
---|---|
US (1) | US7934962B2 (ja) |
JP (1) | JP5667350B2 (ja) |
KR (1) | KR101161510B1 (ja) |
CN (1) | CN101995496B (ja) |
TW (1) | TWI444624B (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8487201B2 (en) * | 2007-12-20 | 2013-07-16 | Abb Research Ltd. | Contact element and a contact arrangement |
CN102033144B (zh) * | 2009-09-30 | 2013-10-23 | 株式会社神户制钢所 | 电接点构件 |
JP5036892B2 (ja) * | 2010-05-10 | 2012-09-26 | 株式会社神戸製鋼所 | コンタクトプローブ |
JP5798315B2 (ja) | 2010-11-19 | 2015-10-21 | 株式会社神戸製鋼所 | コンタクトプローブピン |
JP5535131B2 (ja) * | 2011-05-27 | 2014-07-02 | 株式会社神戸製鋼所 | 半導体検査装置用プローブピン及びその製造方法 |
WO2012173243A1 (ja) | 2011-06-15 | 2012-12-20 | 株式会社神戸製鋼所 | 電気的接点部材 |
JP5640942B2 (ja) * | 2011-10-06 | 2014-12-17 | トヨタ自動車株式会社 | 摺動部材およびその製造方法 |
US9880198B2 (en) * | 2013-02-11 | 2018-01-30 | Lenovo Enterprise Solutions (Singapore) Pte. Ltd. | High bandwidth signal probe tip |
US20150093923A1 (en) * | 2013-09-27 | 2015-04-02 | Lotes Co., Ltd | Terminal |
CN106338623A (zh) * | 2015-07-10 | 2017-01-18 | 渭南高新区木王科技有限公司 | 一种新型探针和减少误判的方法 |
TWI774150B (zh) * | 2020-12-08 | 2022-08-11 | 財團法人金屬工業研究發展中心 | 電性測試用探針 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4767591A (en) * | 1983-02-23 | 1988-08-30 | The United States Of America As Represented By The Department Of Energy | Resistance probe for energetic particle dosimetry |
CN2129925Y (zh) * | 1992-06-04 | 1993-04-14 | 天津大学 | 高阻导线温度探针 |
JP3884887B2 (ja) * | 1999-08-27 | 2007-02-21 | 株式会社ルネサステクノロジ | 描画用探針及びその製作方法 |
JP2001289874A (ja) * | 2000-04-07 | 2001-10-19 | Japan Electronic Materials Corp | プローブおよびこのプローブを用いたプローブカード |
JP2002318247A (ja) * | 2001-04-20 | 2002-10-31 | Kobe Steel Ltd | 接続装置 |
JP4045084B2 (ja) * | 2001-08-17 | 2008-02-13 | 株式会社神戸製鋼所 | 電気的接続検査装置 |
JP2003231203A (ja) * | 2001-08-21 | 2003-08-19 | Toshiba Corp | 炭素膜被覆部材 |
JP2004156057A (ja) * | 2002-09-10 | 2004-06-03 | Ulvac Japan Ltd | 炭素薄膜の形成方法および得られた炭素薄膜 |
JP2008509395A (ja) * | 2004-08-05 | 2008-03-27 | エス・ブイ・プローブ・プライベート・リミテッド | プローブ要素を処理する方法、プローブ要素の先端部分にコーティングを施すためのコーティングシステム、およびプローブカードアセンブリ |
JP2006177759A (ja) * | 2004-12-22 | 2006-07-06 | Namiki Precision Jewel Co Ltd | カーボンナノチューブの先端加工 |
KR100682916B1 (ko) * | 2005-01-15 | 2007-02-15 | 삼성전자주식회사 | 저항성 팁을 구비한 반도체 탐침 및 그 제조방법 |
JP2007024613A (ja) | 2005-07-14 | 2007-02-01 | Genesis Technology Inc | 接触端子およびこれを用いた半導体デバイスの検査用接続装置 |
EP1934995B1 (en) * | 2005-07-15 | 2014-04-02 | Impact Coatings AB (Publ.) | A contact element and a contact arrangement |
TWI275801B (en) * | 2005-12-02 | 2007-03-11 | Chih-Chung Wang | Treating method for probes positioned on a test card |
-
2009
- 2009-08-07 JP JP2009185271A patent/JP5667350B2/ja active Active
-
2010
- 2010-08-04 US US12/850,206 patent/US7934962B2/en active Active
- 2010-08-05 CN CN2010102473834A patent/CN101995496B/zh active Active
- 2010-08-06 KR KR1020100075764A patent/KR101161510B1/ko active IP Right Grant
- 2010-08-06 TW TW099126282A patent/TWI444624B/zh active
Also Published As
Publication number | Publication date |
---|---|
US20110034093A1 (en) | 2011-02-10 |
CN101995496B (zh) | 2013-04-10 |
CN101995496A (zh) | 2011-03-30 |
US7934962B2 (en) | 2011-05-03 |
TW201122496A (en) | 2011-07-01 |
JP2011038859A (ja) | 2011-02-24 |
KR20110015393A (ko) | 2011-02-15 |
TWI444624B (zh) | 2014-07-11 |
KR101161510B1 (ko) | 2012-07-02 |
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