JP3835823B2 - フォトレジスト組成物のための反射防止膜 - Google Patents

フォトレジスト組成物のための反射防止膜 Download PDF

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Publication number
JP3835823B2
JP3835823B2 JP51621098A JP51621098A JP3835823B2 JP 3835823 B2 JP3835823 B2 JP 3835823B2 JP 51621098 A JP51621098 A JP 51621098A JP 51621098 A JP51621098 A JP 51621098A JP 3835823 B2 JP3835823 B2 JP 3835823B2
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JP
Japan
Prior art keywords
alkyl
polymer
antireflection film
composition according
film composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP51621098A
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English (en)
Japanese (ja)
Other versions
JP2001502439A5 (enExample
JP2001502439A (ja
Inventor
マカロック・イアン
ダメル・ラルフ・アール
コルソー・アンソニー・ジェイ
ディング・シュージ
ダラム・デイナ・エル
ルー・ピン―ハン
カン・ミン
カンナ・ディネッシュ・エヌ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AZ Electronic Materials Japan Co Ltd
Original Assignee
AZ Electronic Materials Japan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AZ Electronic Materials Japan Co Ltd filed Critical AZ Electronic Materials Japan Co Ltd
Publication of JP2001502439A publication Critical patent/JP2001502439A/ja
Publication of JP2001502439A5 publication Critical patent/JP2001502439A5/ja
Application granted granted Critical
Publication of JP3835823B2 publication Critical patent/JP3835823B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/825—Photosensitive materials characterised by the base or auxiliary layers characterised by antireflection means or visible-light filtering means, e.g. antihalation
    • G03C1/835—Macromolecular substances therefor, e.g. mordants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP51621098A 1996-09-30 1997-09-26 フォトレジスト組成物のための反射防止膜 Expired - Fee Related JP3835823B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/724,109 US5733714A (en) 1996-09-30 1996-09-30 Antireflective coating for photoresist compositions
US08/724,109 1996-09-30
PCT/EP1997/005281 WO1998014834A1 (en) 1996-09-30 1997-09-26 Antireflective coating for photoresist compositions

Publications (3)

Publication Number Publication Date
JP2001502439A JP2001502439A (ja) 2001-02-20
JP2001502439A5 JP2001502439A5 (enExample) 2005-05-12
JP3835823B2 true JP3835823B2 (ja) 2006-10-18

Family

ID=24909045

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51621098A Expired - Fee Related JP3835823B2 (ja) 1996-09-30 1997-09-26 フォトレジスト組成物のための反射防止膜

Country Status (8)

Country Link
US (1) US5733714A (enExample)
EP (1) EP0929844B1 (enExample)
JP (1) JP3835823B2 (enExample)
KR (1) KR100484046B1 (enExample)
CN (1) CN1111760C (enExample)
DE (1) DE69709140T2 (enExample)
TW (1) TW419618B (enExample)
WO (1) WO1998014834A1 (enExample)

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Also Published As

Publication number Publication date
US5733714A (en) 1998-03-31
CN1232552A (zh) 1999-10-20
KR100484046B1 (ko) 2005-04-20
DE69709140D1 (de) 2002-01-24
TW419618B (en) 2001-01-21
WO1998014834A1 (en) 1998-04-09
CN1111760C (zh) 2003-06-18
KR20000048649A (ko) 2000-07-25
EP0929844A1 (en) 1999-07-21
DE69709140T2 (de) 2002-07-11
EP0929844B1 (en) 2001-12-12
JP2001502439A (ja) 2001-02-20

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