DE69703283T2 - Licht-absorbierende antireflektionsschichten mit verbesserter leistung durch brechungsindex-optimierung - Google Patents
Licht-absorbierende antireflektionsschichten mit verbesserter leistung durch brechungsindex-optimierungInfo
- Publication number
- DE69703283T2 DE69703283T2 DE69703283T DE69703283T DE69703283T2 DE 69703283 T2 DE69703283 T2 DE 69703283T2 DE 69703283 T DE69703283 T DE 69703283T DE 69703283 T DE69703283 T DE 69703283T DE 69703283 T2 DE69703283 T2 DE 69703283T2
- Authority
- DE
- Germany
- Prior art keywords
- light
- improved performance
- reflection layers
- absorbing anti
- index optimization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US1300796P | 1996-03-07 | 1996-03-07 | |
PCT/US1997/003754 WO1997033200A1 (en) | 1996-03-07 | 1997-03-06 | Light-absorbing antireflective layers with improved performance due to refractive index optimization |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69703283D1 DE69703283D1 (de) | 2000-11-16 |
DE69703283T2 true DE69703283T2 (de) | 2001-05-17 |
Family
ID=21757832
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69703283T Expired - Lifetime DE69703283T2 (de) | 1996-03-07 | 1997-03-06 | Licht-absorbierende antireflektionsschichten mit verbesserter leistung durch brechungsindex-optimierung |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP0885406B1 (de) |
JP (2) | JP2000506287A (de) |
KR (1) | KR100458685B1 (de) |
CN (1) | CN1091264C (de) |
DE (1) | DE69703283T2 (de) |
TW (1) | TW357395B (de) |
WO (1) | WO1997033200A1 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69706288T2 (de) * | 1996-03-07 | 2002-05-16 | Clariant Finance Bvi Ltd | Antireflexions-unterbeschichtungen durch brechungsindexmodifikation mit anomaler dispersion |
US5733714A (en) * | 1996-09-30 | 1998-03-31 | Clariant Finance (Bvi) Limited | Antireflective coating for photoresist compositions |
US5981145A (en) * | 1997-04-30 | 1999-11-09 | Clariant Finance (Bvi) Limited | Light absorbing polymers |
US5994430A (en) * | 1997-04-30 | 1999-11-30 | Clariant Finance Bvi) Limited | Antireflective coating compositions for photoresist compositions and use thereof |
US20030054117A1 (en) * | 2001-02-02 | 2003-03-20 | Brewer Science, Inc. | Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition |
US7544750B2 (en) * | 2005-10-13 | 2009-06-09 | International Business Machines Corporation | Top antireflective coating composition with low refractive index at 193nm radiation wavelength |
FR2894346B1 (fr) * | 2005-12-02 | 2012-03-30 | Commissariat Energie Atomique | Masque de photolithographie en extreme ultra-violet, a cavites absorbantes |
JP2015172606A (ja) * | 2012-07-25 | 2015-10-01 | 日産化学工業株式会社 | リソグラフィー用レジスト上層膜形成組成物及びそれを用いた半導体装置の製造方法 |
FR3012132B1 (fr) * | 2013-10-18 | 2016-08-05 | Centre Nat Rech Scient | Procede de fabrication de supports amplificateurs de contraste |
CN103941548A (zh) * | 2014-04-28 | 2014-07-23 | 吴钟达 | 具有吸光层的感光层结构与使用感光层结构的光刻工艺 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63110725A (ja) * | 1986-10-29 | 1988-05-16 | Nec Corp | 半導体装置の製造方法 |
JP2897569B2 (ja) * | 1991-12-30 | 1999-05-31 | ソニー株式会社 | レジストパターン形成時に用いる反射防止膜の条件決定方法と、レジストパターン形成方法 |
JP2829555B2 (ja) * | 1992-08-20 | 1998-11-25 | 三菱電機株式会社 | 微細レジストパターンの形成方法 |
JP3334304B2 (ja) * | 1993-11-30 | 2002-10-15 | ソニー株式会社 | 半導体装置の製造方法 |
JP3248353B2 (ja) * | 1994-06-29 | 2002-01-21 | ソニー株式会社 | 反射防止膜の設計方法 |
-
1997
- 1997-03-06 DE DE69703283T patent/DE69703283T2/de not_active Expired - Lifetime
- 1997-03-06 EP EP97914962A patent/EP0885406B1/de not_active Expired - Lifetime
- 1997-03-06 KR KR10-1998-0706908A patent/KR100458685B1/ko not_active IP Right Cessation
- 1997-03-06 WO PCT/US1997/003754 patent/WO1997033200A1/en active IP Right Grant
- 1997-03-06 CN CN97192776A patent/CN1091264C/zh not_active Expired - Lifetime
- 1997-03-06 TW TW086102745A patent/TW357395B/zh not_active IP Right Cessation
- 1997-03-06 JP JP9532003A patent/JP2000506287A/ja active Pending
-
2009
- 2009-12-18 JP JP2009288151A patent/JP5097960B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR19990087480A (ko) | 1999-12-27 |
CN1212767A (zh) | 1999-03-31 |
EP0885406B1 (de) | 2000-10-11 |
KR100458685B1 (ko) | 2005-06-02 |
JP5097960B2 (ja) | 2012-12-12 |
DE69703283D1 (de) | 2000-11-16 |
CN1091264C (zh) | 2002-09-18 |
JP2000506287A (ja) | 2000-05-23 |
EP0885406A1 (de) | 1998-12-23 |
WO1997033200A1 (en) | 1997-09-12 |
JP2010107996A (ja) | 2010-05-13 |
TW357395B (en) | 1999-05-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: AZ ELECTRONIC MATERIALS USA CORP. (N.D.GES.D. STAA |
|
8328 | Change in the person/name/address of the agent |
Representative=s name: PATENTANWAELTE ISENBRUCK BOESL HOERSCHLER WICHMANN HU |