TW357395B - Light-absorbing antireflective layers with improved performance due to refractive index optimization - Google Patents
Light-absorbing antireflective layers with improved performance due to refractive index optimizationInfo
- Publication number
- TW357395B TW357395B TW086102745A TW86102745A TW357395B TW 357395 B TW357395 B TW 357395B TW 086102745 A TW086102745 A TW 086102745A TW 86102745 A TW86102745 A TW 86102745A TW 357395 B TW357395 B TW 357395B
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- refractive index
- improved performance
- performance due
- antireflective layers
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Optics & Photonics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
- Laminated Bodies (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US1300796P | 1996-03-07 | 1996-03-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW357395B true TW357395B (en) | 1999-05-01 |
Family
ID=21757832
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086102745A TW357395B (en) | 1996-03-07 | 1997-03-06 | Light-absorbing antireflective layers with improved performance due to refractive index optimization |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP0885406B1 (zh) |
JP (2) | JP2000506287A (zh) |
KR (1) | KR100458685B1 (zh) |
CN (1) | CN1091264C (zh) |
DE (1) | DE69703283T2 (zh) |
TW (1) | TW357395B (zh) |
WO (1) | WO1997033200A1 (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0885407B1 (en) * | 1996-03-07 | 2001-08-22 | Clariant Finance (BVI) Limited | Bottom antireflective coatings through refractive index modification by anomalous dispersion |
US5733714A (en) * | 1996-09-30 | 1998-03-31 | Clariant Finance (Bvi) Limited | Antireflective coating for photoresist compositions |
US5994430A (en) * | 1997-04-30 | 1999-11-30 | Clariant Finance Bvi) Limited | Antireflective coating compositions for photoresist compositions and use thereof |
US5981145A (en) * | 1997-04-30 | 1999-11-09 | Clariant Finance (Bvi) Limited | Light absorbing polymers |
US20030054117A1 (en) * | 2001-02-02 | 2003-03-20 | Brewer Science, Inc. | Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition |
US7544750B2 (en) * | 2005-10-13 | 2009-06-09 | International Business Machines Corporation | Top antireflective coating composition with low refractive index at 193nm radiation wavelength |
FR2894346B1 (fr) * | 2005-12-02 | 2012-03-30 | Commissariat Energie Atomique | Masque de photolithographie en extreme ultra-violet, a cavites absorbantes |
JP2015172606A (ja) * | 2012-07-25 | 2015-10-01 | 日産化学工業株式会社 | リソグラフィー用レジスト上層膜形成組成物及びそれを用いた半導体装置の製造方法 |
FR3012132B1 (fr) * | 2013-10-18 | 2016-08-05 | Centre Nat Rech Scient | Procede de fabrication de supports amplificateurs de contraste |
CN103941548A (zh) * | 2014-04-28 | 2014-07-23 | 吴钟达 | 具有吸光层的感光层结构与使用感光层结构的光刻工艺 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63110725A (ja) * | 1986-10-29 | 1988-05-16 | Nec Corp | 半導体装置の製造方法 |
JP2897569B2 (ja) * | 1991-12-30 | 1999-05-31 | ソニー株式会社 | レジストパターン形成時に用いる反射防止膜の条件決定方法と、レジストパターン形成方法 |
JP2829555B2 (ja) * | 1992-08-20 | 1998-11-25 | 三菱電機株式会社 | 微細レジストパターンの形成方法 |
JP3334304B2 (ja) * | 1993-11-30 | 2002-10-15 | ソニー株式会社 | 半導体装置の製造方法 |
JP3248353B2 (ja) * | 1994-06-29 | 2002-01-21 | ソニー株式会社 | 反射防止膜の設計方法 |
-
1997
- 1997-03-06 WO PCT/US1997/003754 patent/WO1997033200A1/en active IP Right Grant
- 1997-03-06 KR KR10-1998-0706908A patent/KR100458685B1/ko not_active IP Right Cessation
- 1997-03-06 TW TW086102745A patent/TW357395B/zh not_active IP Right Cessation
- 1997-03-06 EP EP97914962A patent/EP0885406B1/en not_active Expired - Lifetime
- 1997-03-06 JP JP9532003A patent/JP2000506287A/ja active Pending
- 1997-03-06 DE DE69703283T patent/DE69703283T2/de not_active Expired - Lifetime
- 1997-03-06 CN CN97192776A patent/CN1091264C/zh not_active Expired - Lifetime
-
2009
- 2009-12-18 JP JP2009288151A patent/JP5097960B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2000506287A (ja) | 2000-05-23 |
CN1091264C (zh) | 2002-09-18 |
JP2010107996A (ja) | 2010-05-13 |
EP0885406B1 (en) | 2000-10-11 |
EP0885406A1 (en) | 1998-12-23 |
DE69703283T2 (de) | 2001-05-17 |
DE69703283D1 (de) | 2000-11-16 |
KR19990087480A (ko) | 1999-12-27 |
WO1997033200A1 (en) | 1997-09-12 |
KR100458685B1 (ko) | 2005-06-02 |
JP5097960B2 (ja) | 2012-12-12 |
CN1212767A (zh) | 1999-03-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW357395B (en) | Light-absorbing antireflective layers with improved performance due to refractive index optimization | |
EP0069977A3 (en) | An optical radiator | |
ATE19309T1 (de) | Beleuchtungsvorrichtung mit einem buendellichtleiter. | |
TW347369B (en) | Organic substrate provided with a light absorptive antireflection film and process for production | |
DE3375326D1 (en) | Vapor-permeable retroreflective sheeting | |
ES2181699T3 (es) | Pantalla direccional para cuerpo de iluminacion y procedimiento para su fabricacion. | |
US4671612A (en) | Optical fiber array plate | |
JPS57100404A (en) | Stripe filter | |
CN208832370U (zh) | 光导花纹结构 | |
CN112366109B (zh) | 一种键盘光模组 | |
TW350934B (en) | Photo recording device | |
JPS57165830A (en) | Lenticular lens for screen | |
ATE147844T1 (de) | Verteilt beleuchtungsvorrichtung | |
RU2691976C2 (ru) | Лампа | |
JPS647027A (en) | Reflection type screen | |
GB2002581A (en) | Silicon solar cell and filter | |
JPS56106211A (en) | Thick-film lens with optical filter | |
CN216772020U (zh) | 一种免丝印多层结构复合pc导光板 | |
JPS5317351A (en) | Optical filter | |
JPS53110541A (en) | Half mirror | |
JPS578407A (en) | Reflector | |
CN2139290Y (zh) | 折光照明标牌 | |
CN212276762U (zh) | 一种具有高反差消防设备的引导灯具 | |
JPS5718376A (en) | Condensing device for semiconductor light emitting element | |
CN2195681Y (zh) | 防杂光干扰的光电探头 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK4A | Expiration of patent term of an invention patent |