KR100484046B1 - 포토레지스트 조성물용 반사 방지 코팅 - Google Patents

포토레지스트 조성물용 반사 방지 코팅 Download PDF

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Publication number
KR100484046B1
KR100484046B1 KR10-1999-7002592A KR19997002592A KR100484046B1 KR 100484046 B1 KR100484046 B1 KR 100484046B1 KR 19997002592 A KR19997002592 A KR 19997002592A KR 100484046 B1 KR100484046 B1 KR 100484046B1
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KR
South Korea
Prior art keywords
alkyl
antireflective coating
coating composition
polymer
mol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR10-1999-7002592A
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English (en)
Korean (ko)
Other versions
KR20000048649A (ko
Inventor
맥쿨로쉬이아인
담멜랄프에르
코소안토니제이
딩수지
더램다나엘
루핑훙
캉밍
칸나다인쉬엔
Original Assignee
클라리언트 인터내셔널 리미티드
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Publication of KR20000048649A publication Critical patent/KR20000048649A/ko
Application granted granted Critical
Publication of KR100484046B1 publication Critical patent/KR100484046B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/825—Photosensitive materials characterised by the base or auxiliary layers characterised by antireflection means or visible-light filtering means, e.g. antihalation
    • G03C1/835—Macromolecular substances therefor, e.g. mordants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR10-1999-7002592A 1996-09-30 1997-09-26 포토레지스트 조성물용 반사 방지 코팅 Expired - Fee Related KR100484046B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/724,109 US5733714A (en) 1996-09-30 1996-09-30 Antireflective coating for photoresist compositions
US08/724,109 1996-09-30
US8/724,109 1996-09-30

Publications (2)

Publication Number Publication Date
KR20000048649A KR20000048649A (ko) 2000-07-25
KR100484046B1 true KR100484046B1 (ko) 2005-04-20

Family

ID=24909045

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-1999-7002592A Expired - Fee Related KR100484046B1 (ko) 1996-09-30 1997-09-26 포토레지스트 조성물용 반사 방지 코팅

Country Status (8)

Country Link
US (1) US5733714A (enExample)
EP (1) EP0929844B1 (enExample)
JP (1) JP3835823B2 (enExample)
KR (1) KR100484046B1 (enExample)
CN (1) CN1111760C (enExample)
DE (1) DE69709140T2 (enExample)
TW (1) TW419618B (enExample)
WO (1) WO1998014834A1 (enExample)

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JP4842785B2 (ja) * 2006-12-04 2011-12-21 富士通テン株式会社 車載用電子システム及び車載電子装置
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US8141667B2 (en) * 2008-06-17 2012-03-27 The Board Of Trustees Of The University Of Alabama For And On Behalf Of Its Component Institution, The University Of Alabama Hybrid dinghy pusher
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JP2014074730A (ja) * 2011-02-04 2014-04-24 Nissan Chem Ind Ltd 非感光性レジスト下層膜形成組成物
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KR101466147B1 (ko) 2011-12-05 2014-11-27 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한　컬러필터
KR101618689B1 (ko) 2012-12-24 2016-05-09 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한　컬러필터
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Also Published As

Publication number Publication date
US5733714A (en) 1998-03-31
CN1232552A (zh) 1999-10-20
JP3835823B2 (ja) 2006-10-18
DE69709140D1 (de) 2002-01-24
TW419618B (en) 2001-01-21
WO1998014834A1 (en) 1998-04-09
CN1111760C (zh) 2003-06-18
KR20000048649A (ko) 2000-07-25
EP0929844A1 (en) 1999-07-21
DE69709140T2 (de) 2002-07-11
EP0929844B1 (en) 2001-12-12
JP2001502439A (ja) 2001-02-20

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