DE69709140D1 - Antireflexbeschichtung für photoresistzusammensetzungen - Google Patents

Antireflexbeschichtung für photoresistzusammensetzungen

Info

Publication number
DE69709140D1
DE69709140D1 DE69709140T DE69709140T DE69709140D1 DE 69709140 D1 DE69709140 D1 DE 69709140D1 DE 69709140 T DE69709140 T DE 69709140T DE 69709140 T DE69709140 T DE 69709140T DE 69709140 D1 DE69709140 D1 DE 69709140D1
Authority
DE
Germany
Prior art keywords
photoresist compositions
antireflex coating
antireflex
coating
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69709140T
Other languages
English (en)
Other versions
DE69709140T2 (de
Inventor
Iain Mcculloch
R Dammel
J Corso
Shuji Ding
L Durham
Ping-Hung Lu
Ming Kang
N Khanna
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EMD Performance Materials Corp
Original Assignee
Clariant Finance BVI Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clariant Finance BVI Ltd filed Critical Clariant Finance BVI Ltd
Publication of DE69709140D1 publication Critical patent/DE69709140D1/de
Application granted granted Critical
Publication of DE69709140T2 publication Critical patent/DE69709140T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/825—Photosensitive materials characterised by the base or auxiliary layers characterised by antireflection means or visible-light filtering means, e.g. antihalation
    • G03C1/835—Macromolecular substances therefor, e.g. mordants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE69709140T 1996-09-30 1997-09-26 Antireflexbeschichtung für photoresistzusammensetzungen Expired - Lifetime DE69709140T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/724,109 US5733714A (en) 1996-09-30 1996-09-30 Antireflective coating for photoresist compositions
PCT/EP1997/005281 WO1998014834A1 (en) 1996-09-30 1997-09-26 Antireflective coating for photoresist compositions

Publications (2)

Publication Number Publication Date
DE69709140D1 true DE69709140D1 (de) 2002-01-24
DE69709140T2 DE69709140T2 (de) 2002-07-11

Family

ID=24909045

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69709140T Expired - Lifetime DE69709140T2 (de) 1996-09-30 1997-09-26 Antireflexbeschichtung für photoresistzusammensetzungen

Country Status (8)

Country Link
US (1) US5733714A (de)
EP (1) EP0929844B1 (de)
JP (1) JP3835823B2 (de)
KR (1) KR100484046B1 (de)
CN (1) CN1111760C (de)
DE (1) DE69709140T2 (de)
TW (1) TW419618B (de)
WO (1) WO1998014834A1 (de)

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US20090042133A1 (en) * 2007-08-10 2009-02-12 Zhong Xiang Antireflective Coating Composition
US8141667B2 (en) * 2008-06-17 2012-03-27 The Board Of Trustees Of The University Of Alabama For And On Behalf Of Its Component Institution, The University Of Alabama Hybrid dinghy pusher
WO2010021030A1 (ja) * 2008-08-20 2010-02-25 富士通株式会社 レジスト増感膜形成用材料、半導体装置の製造方法、半導体装置、及び磁気ヘッド
JP2014074730A (ja) * 2011-02-04 2014-04-24 Nissan Chem Ind Ltd 非感光性レジスト下層膜形成組成物
US8623589B2 (en) 2011-06-06 2014-01-07 Az Electronic Materials Usa Corp. Bottom antireflective coating compositions and processes thereof
KR101466147B1 (ko) * 2011-12-05 2014-11-27 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한　컬러필터
KR101618689B1 (ko) 2012-12-24 2016-05-09 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한　컬러필터
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Also Published As

Publication number Publication date
TW419618B (en) 2001-01-21
US5733714A (en) 1998-03-31
JP2001502439A (ja) 2001-02-20
KR100484046B1 (ko) 2005-04-20
EP0929844B1 (de) 2001-12-12
EP0929844A1 (de) 1999-07-21
WO1998014834A1 (en) 1998-04-09
KR20000048649A (ko) 2000-07-25
JP3835823B2 (ja) 2006-10-18
CN1111760C (zh) 2003-06-18
CN1232552A (zh) 1999-10-20
DE69709140T2 (de) 2002-07-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: AZ ELECTRONIC MATERIALS USA CORP. (N.D.GES.D. STAA

8328 Change in the person/name/address of the agent

Representative=s name: PATENTANWAELTE ISENBRUCK BOESL HOERSCHLER WICHMANN HU