DE69305334D1 - Sichtbare photosensibilisatore für photopolymerisierbare zusammensetzungen - Google Patents

Sichtbare photosensibilisatore für photopolymerisierbare zusammensetzungen

Info

Publication number
DE69305334D1
DE69305334D1 DE69305334T DE69305334T DE69305334D1 DE 69305334 D1 DE69305334 D1 DE 69305334D1 DE 69305334 T DE69305334 T DE 69305334T DE 69305334 T DE69305334 T DE 69305334T DE 69305334 D1 DE69305334 D1 DE 69305334D1
Authority
DE
Germany
Prior art keywords
photosensibilizers
visible
photopolymerizable compositions
photopolymerizable
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69305334T
Other languages
English (en)
Other versions
DE69305334T2 (de
Inventor
William Smothers
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of DE69305334D1 publication Critical patent/DE69305334D1/de
Application granted granted Critical
Publication of DE69305334T2 publication Critical patent/DE69305334T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/0008—Methine or polymethine dyes, e.g. cyanine dyes substituted on the polymethine chain
    • C09B23/0025—Methine or polymethine dyes, e.g. cyanine dyes substituted on the polymethine chain the substituent being bound through an oxygen atom
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/0066—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain being part of a carbocyclic ring,(e.g. benzene, naphtalene, cyclohexene, cyclobutenene-quadratic acid)
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/02—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups
    • C09B23/08—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups more than three >CH- groups, e.g. polycarbocyanines
    • C09B23/086—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups more than three >CH- groups, e.g. polycarbocyanines more than five >CH- groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing
    • Y10S430/125—Carbonyl in heterocyclic compound
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Paints Or Removers (AREA)
  • Adhesives Or Adhesive Processes (AREA)
DE69305334T 1992-04-13 1993-04-12 Sichtbare photosensibilisatore für photopolymerisierbare zusammensetzungen Expired - Fee Related DE69305334T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/867,492 US5236808A (en) 1992-04-13 1992-04-13 Visible photosensitizers for photopolymerizable compositions
PCT/US1993/003434 WO1993021236A1 (en) 1992-04-13 1993-04-12 Visible photosensitizers for photopolymerizable compositions

Publications (2)

Publication Number Publication Date
DE69305334D1 true DE69305334D1 (de) 1996-11-14
DE69305334T2 DE69305334T2 (de) 1997-03-06

Family

ID=25349886

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69305334T Expired - Fee Related DE69305334T2 (de) 1992-04-13 1993-04-12 Sichtbare photosensibilisatore für photopolymerisierbare zusammensetzungen

Country Status (6)

Country Link
US (1) US5236808A (de)
EP (1) EP0636148B1 (de)
JP (1) JP3299274B2 (de)
KR (1) KR100251881B1 (de)
DE (1) DE69305334T2 (de)
WO (1) WO1993021236A1 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69333328T2 (de) * 1992-07-13 2004-09-30 Kyowa Hakko Kogyo Co., Ltd. Photopolymerisierbare Zusammensetzungen
US5846682A (en) * 1993-03-02 1998-12-08 Showa Denko K.K. Light decolorizable recording material, ink and toner
JPH08206489A (ja) * 1995-02-09 1996-08-13 Brother Ind Ltd 光硬化型組成物及び感光性カプセル
US8198096B2 (en) * 1998-05-05 2012-06-12 Massachusetts Institute Of Technology Emissive polymers and devices incorporating these polymers
US20050147534A1 (en) * 1998-05-05 2005-07-07 Massachusetts Institute Of Technology Emissive sensors and devices incorporating these sensors
EP1080162B1 (de) * 1998-05-05 2004-03-10 Massachusetts Institute Of Technology Lichtemittierende polymere und vorrichtungen, die diese enthalten
US6843952B1 (en) * 1999-03-25 2005-01-18 3M Innovative Properties Company Method of producing substrate for plasma display panel and mold used in the method
JP2004506791A (ja) 2000-08-21 2004-03-04 マサチューセッツ・インスティチュート・オブ・テクノロジー 高い内部自由体積を有するポリマー
US7462325B2 (en) * 2001-11-30 2008-12-09 Nomadics, Inc. Luminescent polymer particles
AU2003269913A1 (en) * 2002-07-15 2004-02-02 Massachusetts Institute Of Technology Emissive, high charge transport polymers
US20040121337A1 (en) * 2002-12-19 2004-06-24 Nomadics, Inc. Luminescent polymers and methods of use thereof
US6870651B2 (en) * 2003-05-30 2005-03-22 Eastman Kodak Company Apparatus and method for generating a dynamic image
US7144676B2 (en) * 2004-02-06 2006-12-05 Rohm And Haas Electronic Materials Llc Imaging compositions and methods
KR101125678B1 (ko) * 2004-02-06 2012-03-28 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨. 개선된 이미지화 조성물 및 방법
US7977026B2 (en) * 2004-02-06 2011-07-12 Rohm And Haas Electronic Materials Llc Imaging methods
US7270932B2 (en) * 2004-02-06 2007-09-18 Rohm And Haas Electronic Materials Llc Imaging composition and method
US20050175941A1 (en) * 2004-02-06 2005-08-11 Rohm And Hass Electronic Materials, L.L.C. Imaging composition and method
US8071260B1 (en) * 2004-06-15 2011-12-06 Inphase Technologies, Inc. Thermoplastic holographic media
WO2006034081A2 (en) * 2004-09-17 2006-03-30 Massachusetts Institute Of Technology Polymers for analyte detection
JP4721682B2 (ja) 2004-09-27 2011-07-13 株式会社Ａｄｅｋａ 複素環化合物及び光学記録材料
US20070117042A1 (en) * 2005-11-23 2007-05-24 Rohm And Haas Electronic Materials Llc Imaging methods
US8158437B2 (en) * 2006-08-04 2012-04-17 Massachusetts Institute Of Technology Luminescent detection of hydrazine and hydrazine derivatives
US8283423B2 (en) 2006-09-29 2012-10-09 Massachusetts Institute Of Technology Polymer synthetic technique
US8802447B2 (en) * 2006-10-05 2014-08-12 Massachusetts Institute Of Technology Emissive compositions with internal standard and related techniques
US20090215189A1 (en) 2006-10-27 2009-08-27 Massachusetts Institute Of Technology Sensor of species including toxins and chemical warfare agents
JP6112120B2 (ja) * 2012-11-22 2017-04-12 王子ホールディングス株式会社 粘着剤組成物、粘着シートおよび積層体
WO2017014105A1 (ja) * 2015-07-23 2017-01-26 コニカミノルタ株式会社 ホログラフィック光学素子およびその製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4415621A (en) * 1980-02-25 1983-11-15 Eastman Kodak Company Use of α,α-bis(dialkylaminobenzylidene) ketone dyes in optical recording elements
US4755450A (en) * 1986-04-22 1988-07-05 Minnesota Mining And Manufacturing Company Spectral sensitizing dyes in photopolymerizable systems
JP2536594B2 (ja) * 1987-06-08 1996-09-18 日立化成工業株式会社 光重合開始剤及びこれを用いた光重合性組成物
JP2538992B2 (ja) * 1987-07-21 1996-10-02 三菱化学株式会社 光重合性組成物
US4859572A (en) * 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
EP0352774B1 (de) * 1988-07-28 1994-06-22 E.I. Du Pont De Nemours And Company Bei längeren Wellenlängen wirksamer Photopolymerisations- sensibilisator
US4987230A (en) * 1988-07-28 1991-01-22 E. I. Du Pont De Nemours And Company Photopolymerization sensitizers active at longer wavelengths
US4917977A (en) * 1988-12-23 1990-04-17 E. I. Du Pont De Nemours And Company Visible sensitizers for photopolymerizable compositions
US5055372A (en) * 1990-04-23 1991-10-08 The Mead Corporation Photohardenable composition containing borate salts and ketone initiators

Also Published As

Publication number Publication date
KR950700940A (ko) 1995-02-20
JPH07505911A (ja) 1995-06-29
JP3299274B2 (ja) 2002-07-08
US5236808A (en) 1993-08-17
EP0636148A1 (de) 1995-02-01
KR100251881B1 (ko) 2000-04-15
EP0636148B1 (de) 1996-10-09
WO1993021236A1 (en) 1993-10-28
DE69305334T2 (de) 1997-03-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee