DE69333328D1 - Photopolymerisierbare Zusammensetungen - Google Patents

Photopolymerisierbare Zusammensetungen

Info

Publication number
DE69333328D1
DE69333328D1 DE69333328T DE69333328T DE69333328D1 DE 69333328 D1 DE69333328 D1 DE 69333328D1 DE 69333328 T DE69333328 T DE 69333328T DE 69333328 T DE69333328 T DE 69333328T DE 69333328 D1 DE69333328 D1 DE 69333328D1
Authority
DE
Germany
Prior art keywords
photopolymerizable compositions
photopolymerizable
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69333328T
Other languages
English (en)
Other versions
DE69333328T2 (de
Inventor
Tsuguo Yamaoka
Kenichi Koseki
Mitsuharu Obara
Ikuo Shimizu
Yukiyoshi Ito
Hitoshi Kawato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KH Neochem Co Ltd
Original Assignee
Kyowa Hakko Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyowa Hakko Kogyo Co Ltd filed Critical Kyowa Hakko Kogyo Co Ltd
Publication of DE69333328D1 publication Critical patent/DE69333328D1/de
Application granted granted Critical
Publication of DE69333328T2 publication Critical patent/DE69333328T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/103—Esters of polyhydric alcohols or polyhydric phenols of trialcohols, e.g. trimethylolpropane tri(meth)acrylate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Wood Science & Technology (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Indole Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Holo Graphy (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE69333328T 1992-07-13 1993-07-07 Photopolymerisierbare Zusammensetzungen Expired - Fee Related DE69333328T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP18522492 1992-07-13
JP18522492 1992-07-13

Publications (2)

Publication Number Publication Date
DE69333328D1 true DE69333328D1 (de) 2004-01-08
DE69333328T2 DE69333328T2 (de) 2004-09-30

Family

ID=16167053

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69332687T Expired - Fee Related DE69332687T2 (de) 1992-07-13 1993-07-07 Photopolymerisierbare zusammensetzung
DE69333328T Expired - Fee Related DE69333328T2 (de) 1992-07-13 1993-07-07 Photopolymerisierbare Zusammensetzungen

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE69332687T Expired - Fee Related DE69332687T2 (de) 1992-07-13 1993-07-07 Photopolymerisierbare zusammensetzung

Country Status (5)

Country Link
EP (2) EP1113335B1 (de)
JP (1) JP3202989B2 (de)
CA (1) CA2118604C (de)
DE (2) DE69332687T2 (de)
WO (1) WO1994001806A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69329130T2 (de) * 1992-04-24 2001-03-29 Ricoh Kk Squaryliumverbindungen und diese benutzende optische Informationsaufzeichnungsmittel
US6893797B2 (en) 2001-11-09 2005-05-17 Kodak Polychrome Graphics Llc High speed negative-working thermal printing plates
US7056639B2 (en) 2001-08-21 2006-06-06 Eastman Kodak Company Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid
KR20040097204A (ko) * 2002-04-08 2004-11-17 교와 핫꼬 케미카루 가부시키가이샤 광중합성 조성물
EP1614541A3 (de) 2004-07-08 2006-06-07 Agfa-Gevaert Verfahren zur Herstellung einer lithographischen Druckplatte
JPWO2006041155A1 (ja) * 2004-10-14 2008-05-22 協和発酵ケミカル株式会社 スクアリリウム化合物ならびにこれを用いた光電変換材料、光電変換素子および光電気化学電池
JP5646426B2 (ja) * 2011-09-30 2014-12-24 富士フイルム株式会社 着色感光性組成物、カラーフィルタ及びその製造方法、並びに液晶表示装置
JP6126851B2 (ja) * 2013-01-28 2017-05-10 カーリットホールディングス株式会社 紫外線硬化型樹脂組成物
JP6151033B2 (ja) * 2013-01-28 2017-06-21 カーリットホールディングス株式会社 紫外線硬化型樹脂組成物

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0269397A3 (de) * 1986-11-21 1988-12-07 EASTMAN KODAK COMPANY (a New Jersey corporation) Durch Farbe sensibilisiertes photographisches Bildaufzeichnungssystem
EP0379200A3 (de) * 1989-01-19 1991-11-13 Mitsubishi Kasei Corporation Photopolymerisierbare Zusammensetzung
JPH02306247A (ja) * 1989-01-19 1990-12-19 Mitsubishi Kasei Corp 光重合性組成物
JP2869454B2 (ja) * 1989-07-12 1999-03-10 株式会社リコー スクアリリウム系化合物及びそれを用いた光情報記録媒体
JP3015053B2 (ja) * 1989-10-12 2000-02-28 キヤノン株式会社 光学記録媒体
CA2033821A1 (en) * 1990-01-12 1991-07-13 Evan D. Laganis Photopolymerizable compositions sensitive to longer wavelength visible actinic radiation
JP2897369B2 (ja) * 1990-08-09 1999-05-31 三菱化学株式会社 光重合性組成物
JP2897375B2 (ja) * 1990-08-27 1999-05-31 三菱化学株式会社 光重合性組成物
JP2871181B2 (ja) * 1991-07-09 1999-03-17 ブラザー工業株式会社 光硬化型組成物
US5236808A (en) * 1992-04-13 1993-08-17 E. I. Du Pont De Nemours And Company Visible photosensitizers for photopolymerizable compositions
DE69320241T2 (de) * 1992-05-06 1999-04-29 Kyowa Hakko Kogyo Kk Chemisch amplifizierte Resistzusammensetzung

Also Published As

Publication number Publication date
EP0611997A1 (de) 1994-08-24
CA2118604C (en) 2004-07-06
WO1994001806A1 (en) 1994-01-20
EP0611997B1 (de) 2003-02-12
DE69332687T2 (de) 2004-01-15
DE69332687D1 (de) 2003-03-20
JP3202989B2 (ja) 2001-08-27
EP1113335A1 (de) 2001-07-04
CA2118604A1 (en) 1994-01-20
EP0611997A4 (de) 1995-06-07
DE69333328T2 (de) 2004-09-30
EP1113335B1 (de) 2003-11-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee