DE69322989D1 - Lichtempfindliche Zusammensetzung - Google Patents

Lichtempfindliche Zusammensetzung

Info

Publication number
DE69322989D1
DE69322989D1 DE69322989T DE69322989T DE69322989D1 DE 69322989 D1 DE69322989 D1 DE 69322989D1 DE 69322989 T DE69322989 T DE 69322989T DE 69322989 T DE69322989 T DE 69322989T DE 69322989 D1 DE69322989 D1 DE 69322989D1
Authority
DE
Germany
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69322989T
Other languages
English (en)
Other versions
DE69322989T2 (de
Inventor
Toshiyuki Sekiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69322989D1 publication Critical patent/DE69322989D1/de
Publication of DE69322989T2 publication Critical patent/DE69322989T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/65—Low-molecular-weight compounds having active hydrogen with high-molecular-weight compounds having active hydrogen
    • C08G18/66—Compounds of groups C08G18/42, C08G18/48, or C08G18/52
    • C08G18/6666—Compounds of group C08G18/48 or C08G18/52
    • C08G18/6692—Compounds of group C08G18/48 or C08G18/52 with compounds of group C08G18/34
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L75/00—Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
    • C08L75/04—Polyurethanes
    • C08L75/08—Polyurethanes from polyethers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Materials For Photolithography (AREA)
DE69322989T 1992-04-03 1993-04-02 Lichtempfindliche Zusammensetzung Expired - Fee Related DE69322989T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4082426A JP2879390B2 (ja) 1992-04-03 1992-04-03 感光性組成物

Publications (2)

Publication Number Publication Date
DE69322989D1 true DE69322989D1 (de) 1999-02-25
DE69322989T2 DE69322989T2 (de) 1999-05-27

Family

ID=13774263

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69322989T Expired - Fee Related DE69322989T2 (de) 1992-04-03 1993-04-02 Lichtempfindliche Zusammensetzung

Country Status (4)

Country Link
US (1) US5340685A (de)
EP (1) EP0563990B1 (de)
JP (1) JP2879390B2 (de)
DE (1) DE69322989T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0730979B1 (de) * 1995-03-06 2000-08-30 Fuji Photo Film Co., Ltd. Träger für lithographische Druckplatten, Herstellungsverfahren desselben und Vorrichtung zur elektrochemischen Aufrauhung
US5731127A (en) * 1995-04-11 1998-03-24 Dainippon Ink And Chemicals, Inc. Photosensitive composition and photosensitive planographic printing plate having a resin with urea bonds in the side chain
JP3907144B2 (ja) * 1998-04-09 2007-04-18 富士フイルム株式会社 平版印刷版の製造方法、レーザ走査露光用平版印刷版原版、および光重合性組成物
DE10064889A1 (de) 2000-12-23 2002-07-18 Agfa Gevaert Nv Aufzeichnungsmaterial mit negativ arbeitender, strahlungsempfindlicher Schicht, die Zusätze zur Förderung der Entwickelbarkeit enthält
EP1235106B1 (de) * 2001-02-08 2011-12-07 FUJIFILM Corporation Vorläufer für eine lithographische Druckplatte
JP4068892B2 (ja) * 2002-05-20 2008-03-26 富士フイルム株式会社 画像形成材料
US7358032B2 (en) * 2002-11-08 2008-04-15 Fujifilm Corporation Planographic printing plate precursor
JP4244309B2 (ja) * 2003-09-12 2009-03-25 富士フイルム株式会社 平版印刷版原版
US7423132B2 (en) * 2004-06-14 2008-09-09 Board Of Trustees Of Michigan State University Method for the enrichment and characterization of phosphorylated peptides or proteins

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1308595C (en) * 1985-11-22 1992-10-13 Toshiaki Aoai Photosensitive composition
JPH083630B2 (ja) * 1986-01-23 1996-01-17 富士写真フイルム株式会社 感光性組成物
JPH0776832B2 (ja) * 1986-11-28 1995-08-16 富士写真フイルム株式会社 感光性組成物
JPH0727208B2 (ja) * 1987-04-20 1995-03-29 富士写真フイルム株式会社 感光性組成物
JPH087439B2 (ja) * 1988-05-20 1996-01-29 富士写真フイルム株式会社 感光性組成物
US5279917A (en) * 1991-05-09 1994-01-18 Konica Corporation Light-sensitive composition comprising a fluorine copolymer surfactant

Also Published As

Publication number Publication date
DE69322989T2 (de) 1999-05-27
US5340685A (en) 1994-08-23
EP0563990A1 (de) 1993-10-06
JPH05281719A (ja) 1993-10-29
EP0563990B1 (de) 1999-01-13
JP2879390B2 (ja) 1999-04-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee