JP3790691B2 - 基板乾燥方法及び基板乾燥装置 - Google Patents

基板乾燥方法及び基板乾燥装置 Download PDF

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Publication number
JP3790691B2
JP3790691B2 JP2001268424A JP2001268424A JP3790691B2 JP 3790691 B2 JP3790691 B2 JP 3790691B2 JP 2001268424 A JP2001268424 A JP 2001268424A JP 2001268424 A JP2001268424 A JP 2001268424A JP 3790691 B2 JP3790691 B2 JP 3790691B2
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substrate
air
speed
transport
transported
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Japanese (ja)
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JP2003077883A (ja
JP2003077883A5 (https=
Inventor
賢哉 篠崎
徹也 佐田
孝志 中満
茂登 鶴田
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to JP2001268424A priority Critical patent/JP3790691B2/ja
Priority to KR1020020053401A priority patent/KR100877146B1/ko
Publication of JP2003077883A publication Critical patent/JP2003077883A/ja
Publication of JP2003077883A5 publication Critical patent/JP2003077883A5/ja
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Publication of JP3790691B2 publication Critical patent/JP3790691B2/ja
Priority to KR1020080041040A priority patent/KR100854466B1/ko
Priority to KR1020080041036A priority patent/KR100886020B1/ko
Priority to KR1020080091039A priority patent/KR100899608B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2001268424A 2001-09-05 2001-09-05 基板乾燥方法及び基板乾燥装置 Expired - Fee Related JP3790691B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2001268424A JP3790691B2 (ja) 2001-09-05 2001-09-05 基板乾燥方法及び基板乾燥装置
KR1020020053401A KR100877146B1 (ko) 2001-09-05 2002-09-05 기판건조방법 및 기판건조장치
KR1020080041040A KR100854466B1 (ko) 2001-09-05 2008-05-01 기판건조방법 및 기판건조장치
KR1020080041036A KR100886020B1 (ko) 2001-09-05 2008-05-01 기판건조방법 및 기판건조장치
KR1020080091039A KR100899608B1 (ko) 2001-09-05 2008-09-17 기판건조방법 및 기판건조장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001268424A JP3790691B2 (ja) 2001-09-05 2001-09-05 基板乾燥方法及び基板乾燥装置

Publications (3)

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JP2003077883A JP2003077883A (ja) 2003-03-14
JP2003077883A5 JP2003077883A5 (https=) 2004-09-16
JP3790691B2 true JP3790691B2 (ja) 2006-06-28

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JP2001268424A Expired - Fee Related JP3790691B2 (ja) 2001-09-05 2001-09-05 基板乾燥方法及び基板乾燥装置

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Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4152871B2 (ja) 2003-12-03 2008-09-17 東京エレクトロン株式会社 ノズル及び基板処理装置
JP4509613B2 (ja) * 2004-03-19 2010-07-21 大日本スクリーン製造株式会社 基板処理装置
JP2006003036A (ja) * 2004-06-18 2006-01-05 Shimada Phys & Chem Ind Co Ltd 乾燥装置
JP4557872B2 (ja) * 2005-11-28 2010-10-06 株式会社日立ハイテクノロジーズ 基板処理装置、基板処理方法、及び基板の製造方法
JP4908316B2 (ja) * 2007-05-29 2012-04-04 株式会社日立ハイテクノロジーズ 洗浄装置、フラットパネルディスプレイの製造装置及びフラットパネルディスプレイ
CN108847398B (zh) * 2018-05-16 2021-01-01 武汉华星光电半导体显示技术有限公司 用于干燥基板的风刀装置
JP7451781B2 (ja) * 2022-03-18 2024-03-18 芝浦メカトロニクス株式会社 基板処理装置
JP2023156115A (ja) * 2022-04-12 2023-10-24 日本電気硝子株式会社 ガラス製品の製造装置及び製造方法
CN116287483B (zh) * 2023-03-23 2024-02-13 重庆能源职业学院 一种具有往复运动结构的烘干设备

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