JP2021521469A - フォトマスク保管ボックス - Google Patents
フォトマスク保管ボックス Download PDFInfo
- Publication number
- JP2021521469A JP2021521469A JP2019554657A JP2019554657A JP2021521469A JP 2021521469 A JP2021521469 A JP 2021521469A JP 2019554657 A JP2019554657 A JP 2019554657A JP 2019554657 A JP2019554657 A JP 2019554657A JP 2021521469 A JP2021521469 A JP 2021521469A
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- bolt
- storage box
- lower case
- fixing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D25/00—Details of other kinds or types of rigid or semi-rigid containers
- B65D25/02—Internal fittings
- B65D25/10—Devices to locate articles in containers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D81/00—Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents
- B65D81/02—Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents specially adapted to protect contents from mechanical damage
- B65D81/05—Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents specially adapted to protect contents from mechanical damage maintaining contents at spaced relation from package walls, or from other contents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
- B65D85/30—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure
- B65D85/48—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure for glass sheets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6734—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders specially adapted for supporting large square shaped substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67346—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders characterized by being specially adapted for supporting a single substrate or by comprising a stack of such individual supports
Abstract
Description
このような問題点を解決するために、韓国特許登録第10−1121176号のフォトマスクケースの構造、及び日本特許公開第2010−72420号のフォトマスクケースなどが開示されている。
220 上部ケース
300 固定部
310 胴体
320 ボルト部材
330 回転キャップ部材
340 加圧固定部材
R 曲面部
Claims (8)
- 内部にフォトマスクが載置されるように支持部を備える下部ケース、下部ケースと締結される上部ケース、及び下部ケースの内側縁部に設けられ、下部ケースの支持部に装着されたフォトマスクを固定させるための固定部を含むフォトマスク保管ボックスであって、
前記固定部は、
合成樹脂素材から直方体形に形成され、上端にボルト移動空間部が備えられ、前記ボルト移動空間部の上端にボルトガイドホールが形成される胴体と、
中央部にノブが結合され、後方に前記ノブを固定させるナットが結合され、前方にボルト用ブッシュが結合され、前記ボルトガイドホールに水平に締結され、前記胴体のボルト移動空間部で前記ノブが回転することによって前後進するボルト部材と、
合成樹脂素材から形成され、前記ボルト部材の前面にボルト結合され、前記ノブの回転時に前記ボルト部材とともに回転しながら前後進する回転キャップ部材と、
テプロン素材から円筒状に形成され、前記回転キャップ部材に押し込まれて結合され、前記回転キャップ部材の回転時に回転なしに前記フォトマスクに圧力を加えて固定させる加圧固定部材とを含んでなることを特徴とする、フォトマスク保管ボックス。 - 前記胴体は、前記ボルト部材と結合するように、前記ボルトガイドホールと対応する位置に前記ボルト部材のボルト用ブッシュが貫通するブッシュ貫通ホールが備えられた板状の胴体カバーが前面に分解可能に結合されることを特徴とする、請求項1に記載のフォトマスク保管ボックス。
- 前記胴体カバーは、前記ブッシュ貫通ホールに合成樹脂素材のカバー用ブッシュが結合されることを特徴とする、請求項2に記載のフォトマスク保管ボックス。
- 前記胴体は、前記ボルトガイドホールの内部に前記ボルト部材が締結されるように、コイルインサートを備えることを特徴とする、請求項1に記載のフォトマスク保管ボックス。
- 前記胴体は、前記コイルインサートと前記ボルト部材間の摩擦時に発生する微細チップが外部に流出することを前記スポンジ及びシリコンカバーによって防止するために、前記ボルトガイドホールの前後にチップ保存空間部が形成され、前記チップ保存空間部の入出口側に係止突起が形成され、ボルト貫通ホールが形成された弾性素材のシリコンカバーが前記係止突起に結合され、前記チップ保存空間部にオイルの含浸されたスポンジが収納されることを特徴とする、請求項4に記載のフォトマスク保管ボックス。
- 前記回転キャップ部材は、前記加圧固定部材が押し込まれて結合されるように、外周部の外側に切開部が形成され、外周部の内側に係止突起が形成されることを特徴とする、請求項1に記載のフォトマスク保管ボックス。
- 前記加圧固定部材は、外側面に前記係止突起に結合されるように段差部が形成されることを特徴とする、請求項6に記載のフォトマスク保管ボックス。
- 前記加圧固定部材は、前記フォトマスクと点接触して前記フォトマスクにパーティクルが発生することを防止するために、前面に曲面部が形成されることを特徴とする、請求項1に記載のフォトマスク保管ボックス。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2019-0006335 | 2019-01-17 | ||
KR1020190006335A KR101987741B1 (ko) | 2019-01-17 | 2019-01-17 | 포토마스크 보관 박스 |
PCT/KR2019/007203 WO2020149466A1 (ko) | 2019-01-17 | 2019-06-14 | 포토마스크 보관 박스 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021521469A true JP2021521469A (ja) | 2021-08-26 |
JP7138275B2 JP7138275B2 (ja) | 2022-09-16 |
Family
ID=66845897
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019554657A Active JP7138275B2 (ja) | 2019-01-17 | 2019-06-14 | フォトマスク保管ボックス |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7138275B2 (ja) |
KR (1) | KR101987741B1 (ja) |
CN (1) | CN111439468B (ja) |
WO (1) | WO2020149466A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101987741B1 (ko) * | 2019-01-17 | 2019-06-12 | 피엠씨글로벌 주식회사 | 포토마스크 보관 박스 |
CN113002957B (zh) * | 2021-04-16 | 2022-08-30 | 彩虹(合肥)液晶玻璃有限公司 | 一种玻璃基板包装运输装置 |
Citations (13)
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---|---|---|---|---|
JP2001033943A (ja) * | 1999-07-23 | 2001-02-09 | Mitsubishi Electric Corp | マスク装置 |
JP2004247718A (ja) * | 2003-01-23 | 2004-09-02 | Yamaha Corp | ホトマスクホルダーおよびホトマスク固定方法 |
EP1531363A1 (en) * | 2003-10-27 | 2005-05-18 | ASML Netherlands B.V. | Reticle holder |
JP2006184442A (ja) * | 2004-12-27 | 2006-07-13 | Nikon Corp | レチクル保護装置および露光装置 |
JP2007233335A (ja) * | 2006-01-31 | 2007-09-13 | Hoya Corp | マスク収容ユニット、フォトマスク基板の搬送方法、フォトマスク製品の製造方法及びフォトマスクの露光・転写方法。 |
KR20090067095A (ko) * | 2007-12-20 | 2009-06-24 | 주식회사 에스앤에스텍 | 마스크 컨테이너 |
US20100294688A1 (en) * | 2009-05-19 | 2010-11-25 | Ming-Chien Chiu | Photomask case structure |
US20100322754A1 (en) * | 2009-06-23 | 2010-12-23 | Sang Don Lee | Apparatus for Substrate Alignment, Apparatus for Substrate Processing Having the Same, and Substrate Alignment Method |
US20120140199A1 (en) * | 2010-12-02 | 2012-06-07 | Globalfoundries Inc. | Mechanical fixture of pellicle to lithographic photomask |
JP2012186391A (ja) * | 2011-03-07 | 2012-09-27 | Canon Inc | レチクル収容容器、露光装置及びデバイス製造方法 |
JP2013097047A (ja) * | 2011-10-28 | 2013-05-20 | Shin Etsu Chem Co Ltd | ペリクル収容容器 |
JP2013107686A (ja) * | 2011-11-22 | 2013-06-06 | Asahi Glass Co Ltd | ガラス板梱包体のガラス板押え装置 |
JP2019129267A (ja) * | 2018-01-25 | 2019-08-01 | 株式会社ブイ・テクノロジー | 基板保持装置及び基板検査装置 |
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JPH09204039A (ja) * | 1996-01-25 | 1997-08-05 | Shin Etsu Chem Co Ltd | ペリクル枠保持具 |
JP4391435B2 (ja) * | 2005-03-22 | 2009-12-24 | 信越化学工業株式会社 | ペリクル収納容器 |
EP1928764B1 (en) * | 2005-09-27 | 2011-11-02 | Entegris, Inc. | Reticle pod |
TWI303618B (en) * | 2006-08-10 | 2008-12-01 | Gudeng Prec Industral Co Ltd | Metal photomask box |
JP5052106B2 (ja) * | 2006-11-22 | 2012-10-17 | 旭化成イーマテリアルズ株式会社 | ペリクルの収納方法 |
KR101121176B1 (ko) * | 2008-04-23 | 2012-03-23 | 피엠씨글로벌 주식회사 | 포토마스크 케이스의 구조 |
JP2010072420A (ja) | 2008-09-19 | 2010-04-02 | Toppan Printing Co Ltd | フォトマスクケース |
KR101987741B1 (ko) * | 2019-01-17 | 2019-06-12 | 피엠씨글로벌 주식회사 | 포토마스크 보관 박스 |
-
2019
- 2019-01-17 KR KR1020190006335A patent/KR101987741B1/ko active IP Right Grant
- 2019-06-14 WO PCT/KR2019/007203 patent/WO2020149466A1/ko active Application Filing
- 2019-06-14 JP JP2019554657A patent/JP7138275B2/ja active Active
- 2019-11-05 CN CN201911070920.XA patent/CN111439468B/zh active Active
Patent Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001033943A (ja) * | 1999-07-23 | 2001-02-09 | Mitsubishi Electric Corp | マスク装置 |
JP2004247718A (ja) * | 2003-01-23 | 2004-09-02 | Yamaha Corp | ホトマスクホルダーおよびホトマスク固定方法 |
EP1531363A1 (en) * | 2003-10-27 | 2005-05-18 | ASML Netherlands B.V. | Reticle holder |
JP2006184442A (ja) * | 2004-12-27 | 2006-07-13 | Nikon Corp | レチクル保護装置および露光装置 |
JP2007233335A (ja) * | 2006-01-31 | 2007-09-13 | Hoya Corp | マスク収容ユニット、フォトマスク基板の搬送方法、フォトマスク製品の製造方法及びフォトマスクの露光・転写方法。 |
KR20090067095A (ko) * | 2007-12-20 | 2009-06-24 | 주식회사 에스앤에스텍 | 마스크 컨테이너 |
US20100294688A1 (en) * | 2009-05-19 | 2010-11-25 | Ming-Chien Chiu | Photomask case structure |
US20100322754A1 (en) * | 2009-06-23 | 2010-12-23 | Sang Don Lee | Apparatus for Substrate Alignment, Apparatus for Substrate Processing Having the Same, and Substrate Alignment Method |
US20120140199A1 (en) * | 2010-12-02 | 2012-06-07 | Globalfoundries Inc. | Mechanical fixture of pellicle to lithographic photomask |
JP2012186391A (ja) * | 2011-03-07 | 2012-09-27 | Canon Inc | レチクル収容容器、露光装置及びデバイス製造方法 |
JP2013097047A (ja) * | 2011-10-28 | 2013-05-20 | Shin Etsu Chem Co Ltd | ペリクル収容容器 |
JP2013107686A (ja) * | 2011-11-22 | 2013-06-06 | Asahi Glass Co Ltd | ガラス板梱包体のガラス板押え装置 |
JP2019129267A (ja) * | 2018-01-25 | 2019-08-01 | 株式会社ブイ・テクノロジー | 基板保持装置及び基板検査装置 |
Also Published As
Publication number | Publication date |
---|---|
KR101987741B1 (ko) | 2019-06-12 |
WO2020149466A1 (ko) | 2020-07-23 |
JP7138275B2 (ja) | 2022-09-16 |
CN111439468B (zh) | 2021-08-13 |
CN111439468A (zh) | 2020-07-24 |
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