JP2019531598A - 接合電界効果トランジスタと統合されたデバイス、およびそれを製造するための方法 - Google Patents
接合電界効果トランジスタと統合されたデバイス、およびそれを製造するための方法 Download PDFInfo
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Abstract
Description
Claims (19)
- 接合電界効果トランジスタ(JFET)と統合されたデバイスであって、前記デバイスが、JFET領域と電源デバイス領域とに分割されており、また、前記デバイスが、
一部分が前記JFET領域内に配置されており他の部分が前記電源デバイス領域内に配置されている、第1の伝導型を有するドレインと、
一部分が前記JFET領域内に配置されており他の部分が前記電源デバイス領域内に配置されている、前記ドレインの前面に配置された第1の伝導型領域と、
を備え、前記JFET領域が、
前記第1の伝導型を有するJFETソースと、
前記第1の伝導型領域内に配置されかつ前記JFETソースの両側に形成された、第2の伝導型を有する第1のウェルであって、前記第1の伝導型が前記第2の伝導型とは反対である第1のウェルと、
前記JFETソースに接触している、前記JFETソース上に形成された金属電極と、
前記JFETソースの両側の前記第1のウェル上に配置されたJFET金属ゲートと、
前記第1のウェル内で前記JFET金属ゲートの下に配置された第1のクランピング領域であって、前記第2の伝導型のものでありかつ前記第1のウェルのイオン濃度よりも高いイオン濃度を有する第1のクランピング領域と、
をさらに含むことを特徴とするデバイス。 - 請求項1に記載のデバイスであって、前記JFET領域と前記電源デバイス領域との間の境界に配置された分離ウェルをさらに備えて、前記JFET領域を前記電源デバイス領域から分離することを特徴とするデバイス。
- 請求項1に記載のデバイスであって、前記JFET領域が、
トレンチ、および
オーム接点領域
を有して形成され、
前記トレンチの内壁が、酸化ケイ素で覆われ、また、前記酸化ケイ素で覆われた前記トレンチが、前記JFET金属ゲートで充填され、
前記オーム接点領域が、前記第1のウェル内で前記トレンチの底に接触する位置に形成され、また、前記オーム接点領域が、前記第2の伝導型を有しかつ前記JFET金属ゲートと接触している
ことを特徴とするデバイス。 - 請求項1に記載のデバイスであって、垂直二重拡散金属酸化物半導体電界効果トランジスタ(VDMOS)であることを特徴とするデバイス。
- 請求子4に記載のデバイスであって、
前記電源デバイス領域が、
ゲートと、
前記第2の伝導型を有する第2のウェルと、
前記第2のウェル内に配置された、前記第1の伝導型を有するVDMOSソースと、
前記第2のウェルの底に配置された第2のクランピング領域と、
を有して形成されることを特徴とするデバイス。 - 請求項5に記載のデバイスであって、前記第2のウェルのそれぞれに、トレンチが形成され、前記第2の伝導型のオーム接点領域が、前記第2のウェルのそれぞれの中で前記トレンチの底に接触する位置に形成され、前記デバイスが、前記VDMOSソースの金属接点をさらに備え、前記VDMOSソースの前記金属接点が、前記電源デバイス領域の前記トレンチに入れられ、前記VDMOSソースを突き抜けて、前記オーム接点領域まで延び、前記オーム接点領域のイオン濃度が、前記第2のウェルの前記イオン濃度よりも高いことを特徴とするデバイス。
- 請求項6に記載のデバイスであって、前記第2の伝導型の非クランプ誘導性スイッチング領域が、前記電源デバイス領域の前記第2のウェル内で前記VDMOSソースと前記オーム接点領域との間にさらに形成され、前記非クランプ誘導性スイッチング領域のイオン濃度が、前記第2のウェルの前記イオン濃度よりも高いことを特徴とするデバイス。
- 請求項1に記載のデバイスであって、前記第1の伝導型が、N型であり、前記第2の伝導型が、P型であり、前記第1の伝導型領域が、N型エピタキシャル層であることを特徴とするデバイス。
- 接合電界効果トランジスタ(JFET)と統合されたデバイスを製造するための方法であって、前記デバイスが、JFET領域および電源デバイス領域を備え、前記方法が、
第1の伝導型領域が形成される第1の伝導型の基板を用意するステップであって、前記第1の伝導型が第2の伝導型とは反対であるステップと、
前記第2の伝導型のイオンを前記第1の伝導型領域に注入して、ドライブインにより前記第1の伝導型領域内に第1のウェルを形成するステップと、
前記第1の伝導型領域の表面上にフィールド酸化物層およびゲート酸化物層を順々に成長させ、前記第1の伝導型領域の前記表面上にポリシリコン層を形成し、前記第2の伝導型のイオンを前記電源デバイス領域の前記第1の伝導型領域に注入して、ドライブインにより複数の第2のウェルを形成するステップと、
前記第1の伝導型のイオンを前記電源デバイス領域の前記第2のウェルに注入して、電源デバイスソースを形成するステップと、
前記JFET領域の隣り合った2つの前記第2のウェル間に前記第1の伝導型のイオンを注入して、JFETソースを形成するステップと、
コンタクトホールをフォトエッチングおよびエッチングし、前記第2の伝導型のイオンを前記コンタクトホールに注入して、前記第1のウェル内および前記第2のウェルの底にクランピング領域を形成するステップであって、前記クランピング領域のイオン濃度が、前記第1のウェルの前記イオン濃度よりも高いステップと、
金属層を堆積させ、前記コンタクトホールを前記金属層で充填して、前記JFETソースの金属電極、JFET金属ゲート、および前記電源デバイスソースの金属接点をそれぞれ形成するステップと、
を含むことを特徴とする方法。 - 請求項9に記載の方法であって、前記第1の伝導型領域内に分離ウェルを形成するステップが、前記JFET領域と前記電源デバイス領域との分離として、前記JFET領域と前記電源デバイス領域との間の境界に前記分離ウェルを形成することを含むことを特徴とする方法。
- 請求項9に記載の方法であって、前記第2の伝導型のイオンを前記第1の伝導型領域に注入し、ドライブインにより前記複数の第2のウェルを形成する前記ステップにおいて、当該注入が、前記フィールド酸化物層および前記ポリシリコン層をマスクとして機能させることによって行われることを特徴とする方法。
- 請求項11に記載の方法であって、前記電源デバイスソースを形成する前記ステップと前記JFETソースを形成する前記ステップとの間に、
前記フィールド酸化物層および前記ポリシリコン層の表面上に同様に重ねられる注入障壁層を形成するステップと、
前記第2の伝導型のイオンを前記電源デバイス領域の前記第2のウェルに注入して、前記第2のウェル内で前記電源デバイスソースの下に非クランプ誘導性スイッチング領域を形成するステップであって、注入エネルギーが、前記第1の伝導型のイオンを前記電源デバイス領域の前記第2のウェルに注入する前記ステップの前記注入エネルギーよりも大きく、また、前記注入障壁層と重なり合った前記フィールド酸化物層および前記ポリシリコン層が、前記第2の伝導型の注入されるイオンを遮断するステップと、
をさらに含むことを特徴とする方法。 - 請求項9に記載の方法であって、前記コンタクトホールをフォトエッチングおよびエッチングする前記ステップの前に、
前記第1のウェルのそれぞれおよび前記第2のウェルのそれぞれにトレンチをエッチングするステップであって、前記JFET金属ゲートが、前記第1のウェル内の前記トレンチに充填された金属層によって形成され、前記電源デバイスソースの前記金属接点が、前記第2のウェル内の前記トレンチに充填された金属層によって形成されるステップ
をさらに含むことを特徴とする方法。 - 請求項13に記載の方法であって、前記第2のウェルのそれぞれに前記トレンチをエッチングする前記ステップの後に、前記第2の伝導型のイオンを前記トレンチに注入して、前記第2のウェルのそれぞれの中で前記トレンチの底に接触する位置、および前記第1のウェルのそれぞれの中で前記トレンチの底に接触する位置に、前記第2の伝導型のオーム接点領域を形成するステップをさらに含むことを特徴とする方法。
- 請求項14に記載の方法であって、前記第2の伝導型のイオンを再注入して、前記第2のウェルの底および前記JFETソースの両側の前記第1のウェル内に前記第2の伝導型のクランピング領域を形成するステップをさらに含むことを特徴とする方法。
- 請求項15に記載の方法であって、前記第2の伝導型のイオンを再注入する前記ステップにおける注入エネルギーが、480keVであることを特徴とする方法。
- 請求項9に記載の方法であって、前記第1の伝導型が、N型であり、前記第2の伝導型が、P型であり、前記第1の伝導型領域が、N型エピタキシャル層であることを特徴とする方法。
- 請求項9に記載の方法であって、前記デバイスが、垂直二重拡散金属酸化物半導体電界効果トランジスタ(VDMOS)であることを特徴とする方法。
- 請求項9に記載の方法であって、前記第2の伝導型のイオンを前記第1の伝導型領域に注入しかつドライブインする前記ステップにおいて、注入密度が、1.5E13cm−2から2.2E13cm−2であり、
前記第1の伝導型領域に前記第1のウェルを形成する前記ステップにおいて、形成される前記第1のウェルのウェル深さが、8.5マイクロメートルから13.5マイクロメートルまでである
ことを特徴とする方法。
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Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61283169A (ja) * | 1985-06-10 | 1986-12-13 | Tdk Corp | 縦形電界効果トランジスタおよびその製造方法 |
JPH05235361A (ja) * | 1991-06-26 | 1993-09-10 | Texas Instr Inc <Ti> | Dmosトランジスタとその製造法 |
JP2002184975A (ja) * | 2000-12-14 | 2002-06-28 | Toshiba Corp | パワーmosfet及びその製造方法 |
JP2002185013A (ja) * | 2000-12-19 | 2002-06-28 | Hitachi Ltd | 炭化珪素半導体装置とそれを用いた電力変換器 |
JP2002343969A (ja) * | 2001-05-16 | 2002-11-29 | Nec Corp | 縦型電界効果トランジスタ及びその製造方法 |
JP2006108217A (ja) * | 2004-10-01 | 2006-04-20 | Hitachi Ltd | 炭化珪素半導体装置 |
US20110180858A1 (en) * | 2010-01-28 | 2011-07-28 | System General Corp. | Semiconductor Device |
JP2011238899A (ja) * | 2010-04-13 | 2011-11-24 | Shindengen Electric Mfg Co Ltd | 半導体装置の製造方法 |
CN103022035A (zh) * | 2012-01-20 | 2013-04-03 | 成都芯源系统有限公司 | 一种集成电路及制作集成电路的方法 |
US20140117415A1 (en) * | 2012-10-30 | 2014-05-01 | Chengdu Monolithic Power Systems Co., Ltd. | Junction field effect transistors and associated fabrication methods |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63266882A (ja) | 1987-04-24 | 1988-11-02 | Hitachi Ltd | 縦型絶縁ゲ−ト電界効果トランジスタ |
DE69029180T2 (de) * | 1989-08-30 | 1997-05-22 | Siliconix Inc | Transistor mit Spannungsbegrenzungsanordnung |
JP3413569B2 (ja) | 1998-09-16 | 2003-06-03 | 株式会社日立製作所 | 絶縁ゲート型半導体装置およびその製造方法 |
EP1058303A1 (en) | 1999-05-31 | 2000-12-06 | STMicroelectronics S.r.l. | Fabrication of VDMOS structure with reduced parasitic effects |
US7667268B2 (en) * | 2002-08-14 | 2010-02-23 | Advanced Analogic Technologies, Inc. | Isolated transistor |
CN101026190A (zh) * | 2007-03-30 | 2007-08-29 | 东南大学 | 沟槽高压n型金属氧化物半导体管及其制备工艺 |
CN100466228C (zh) * | 2007-09-13 | 2009-03-04 | 无锡市晶源微电子有限公司 | 增强型和耗尽型垂直双扩散型场效应管单片集成制作工艺 |
CN101404292A (zh) * | 2008-09-27 | 2009-04-08 | 电子科技大学 | 一种vdmos器件 |
US8643067B2 (en) * | 2011-09-30 | 2014-02-04 | Maxim Integrated Products, Inc. | Strapped dual-gate VDMOS device |
US8963218B2 (en) * | 2011-09-30 | 2015-02-24 | Maxim Integrated Products, Inc. | Dual-gate VDMOS device |
US9209318B2 (en) * | 2013-02-20 | 2015-12-08 | Infineon Technologies Austria Ag | Vertical JFET with body diode and device regions disposed in a single compound epitaxial layer |
WO2014133138A1 (ja) | 2013-03-01 | 2014-09-04 | 富士電機株式会社 | 半導体装置 |
CN203644787U (zh) * | 2013-12-26 | 2014-06-11 | 厦门元顺微电子技术有限公司 | 一种优化栅n沟道vdmos功率器件 |
CN104009088B (zh) * | 2014-05-29 | 2017-04-12 | 西安电子科技大学 | 一种栅控垂直双扩散金属‑氧化物半导体场效应晶体管 |
-
2016
- 2016-08-31 CN CN201610793832.2A patent/CN107785366B/zh active Active
-
2017
- 2017-08-31 EP EP17845510.1A patent/EP3509101B1/en active Active
- 2017-08-31 JP JP2019511876A patent/JP6861274B2/ja active Active
- 2017-08-31 US US16/329,413 patent/US10879385B2/en active Active
- 2017-08-31 WO PCT/CN2017/099860 patent/WO2018041208A1/zh unknown
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61283169A (ja) * | 1985-06-10 | 1986-12-13 | Tdk Corp | 縦形電界効果トランジスタおよびその製造方法 |
JPH05235361A (ja) * | 1991-06-26 | 1993-09-10 | Texas Instr Inc <Ti> | Dmosトランジスタとその製造法 |
JP2002184975A (ja) * | 2000-12-14 | 2002-06-28 | Toshiba Corp | パワーmosfet及びその製造方法 |
JP2002185013A (ja) * | 2000-12-19 | 2002-06-28 | Hitachi Ltd | 炭化珪素半導体装置とそれを用いた電力変換器 |
JP2002343969A (ja) * | 2001-05-16 | 2002-11-29 | Nec Corp | 縦型電界効果トランジスタ及びその製造方法 |
JP2006108217A (ja) * | 2004-10-01 | 2006-04-20 | Hitachi Ltd | 炭化珪素半導体装置 |
US20110180858A1 (en) * | 2010-01-28 | 2011-07-28 | System General Corp. | Semiconductor Device |
JP2011238899A (ja) * | 2010-04-13 | 2011-11-24 | Shindengen Electric Mfg Co Ltd | 半導体装置の製造方法 |
CN103022035A (zh) * | 2012-01-20 | 2013-04-03 | 成都芯源系统有限公司 | 一种集成电路及制作集成电路的方法 |
US20140117415A1 (en) * | 2012-10-30 | 2014-05-01 | Chengdu Monolithic Power Systems Co., Ltd. | Junction field effect transistors and associated fabrication methods |
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