JP2019524938A5 - - Google Patents
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- Publication number
- JP2019524938A5 JP2019524938A5 JP2019503696A JP2019503696A JP2019524938A5 JP 2019524938 A5 JP2019524938 A5 JP 2019524938A5 JP 2019503696 A JP2019503696 A JP 2019503696A JP 2019503696 A JP2019503696 A JP 2019503696A JP 2019524938 A5 JP2019524938 A5 JP 2019524938A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- norbornene
- copolymer
- nadic
- hept
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 0 *=C(C1C2C3C=CC1C3)OC2=N Chemical compound *=C(C1C2C3C=CC1C3)OC2=N 0.000 description 1
- ZRUAAYUHWWAFLZ-UHFFFAOYSA-N CC(C(C1)C2C(O3)=O)=CC1C2C3=[U] Chemical compound CC(C(C1)C2C(O3)=O)=CC1C2C3=[U] ZRUAAYUHWWAFLZ-UHFFFAOYSA-N 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662367857P | 2016-07-28 | 2016-07-28 | |
| US62/367,857 | 2016-07-28 | ||
| PCT/US2017/044281 WO2018022952A1 (en) | 2016-07-28 | 2017-07-28 | Nadic anhydride polymers and photosensitive compositions derived therefrom |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019524938A JP2019524938A (ja) | 2019-09-05 |
| JP2019524938A5 true JP2019524938A5 (https=) | 2020-07-02 |
| JP6765501B2 JP6765501B2 (ja) | 2020-10-07 |
Family
ID=59677305
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019503696A Expired - Fee Related JP6765501B2 (ja) | 2016-07-28 | 2017-07-28 | 無水ナジック酸重合体及びそれに由来する感光性組成物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10591818B2 (https=) |
| JP (1) | JP6765501B2 (https=) |
| KR (1) | KR102172939B1 (https=) |
| CN (1) | CN109476948A (https=) |
| TW (1) | TWI716619B (https=) |
| WO (1) | WO2018022952A1 (https=) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170053442A (ko) * | 2015-11-06 | 2017-05-16 | 롬엔드하스전자재료코리아유한회사 | 감광성 수지 조성물 및 이로부터 제조된 경화막 |
| JP2018189738A (ja) * | 2017-04-28 | 2018-11-29 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ | ポジ型感光性シロキサン組成物、およびそれを用いて形成した硬化膜 |
| EP3837266A1 (en) | 2018-08-17 | 2021-06-23 | Massachusetts Institute of Technology | Degradable polymers of a cyclic silyl ether and uses thereof |
| TW202100575A (zh) | 2019-05-31 | 2021-01-01 | 美商普羅梅勒斯有限公司 | 作為光學或3d印刷材料的快速可光固化的多環烯烴組成物 |
| CN110437739B (zh) * | 2019-07-15 | 2021-02-19 | 淮阴工学院 | 环氧复合涂料及其制备方法 |
| JP2022550283A (ja) * | 2019-09-20 | 2022-12-01 | スリーエム イノベイティブ プロパティズ カンパニー | 低波面誤差光学フィルタフィルム |
| EP4058501A1 (en) * | 2019-11-15 | 2022-09-21 | Massachusetts Institute of Technology | Functional oligomers and functional polymers including hydroxylated polymers and conjugates thereof and uses thereof |
| TWI850509B (zh) * | 2019-12-30 | 2024-08-01 | 日商住友電木股份有限公司 | 催化多環烯烴組成物的uv活性衍生物 |
| TWI850512B (zh) * | 2019-12-30 | 2024-08-01 | 日商住友電木股份有限公司 | 作為光學材料之uv活性鈀催化多環烯烴聚合物組成物 |
| JP7494805B2 (ja) * | 2020-06-25 | 2024-06-04 | 信越化学工業株式会社 | 化学増幅レジスト材料及びパターン形成方法 |
| EP4237461A4 (en) * | 2020-10-30 | 2025-03-12 | Promerus, LLC | Shelf life stable and improved mass polymerizable polycyclic-olefinic compositions |
| CN117062852A (zh) | 2021-02-01 | 2023-11-14 | 麻省理工学院 | 可再加工的组合物 |
| US20240270898A1 (en) * | 2021-06-01 | 2024-08-15 | Massachusetts Institute Of Technology | Latent-fluoride containing polymers for triggered degradation |
| TW202334271A (zh) * | 2022-02-18 | 2023-09-01 | 美商普羅梅勒斯有限公司 | Romp本體聚合及陽離子聚合型組成物用雙觸媒體系 |
| TW202528838A (zh) * | 2023-09-29 | 2025-07-16 | 美商普羅梅勒斯有限公司 | 含有不含pfas的多環烯烴三元共聚物之感光性組成物及由其製成的半導體裝置 |
| TW202528839A (zh) * | 2023-09-29 | 2025-07-16 | 美商普羅梅勒斯有限公司 | 含有不含pfas的多環烯烴聚合物之感光性組成物及由其製成的半導體裝置 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3232417A (en) * | 1964-07-27 | 1966-02-01 | C F Butz Engineering | Continuous action deflector for conveyors |
| JPS5818370B2 (ja) * | 1973-09-19 | 1983-04-12 | ジェイエスアール株式会社 | ノルボルネンジカルボンサンムスイブツルイ ノ キヨウジユウゴウタイ ノ セイゾウホウ |
| JP2961722B2 (ja) | 1991-12-11 | 1999-10-12 | ジェイエスアール株式会社 | 感放射線性樹脂組成物 |
| US6232417B1 (en) | 1996-03-07 | 2001-05-15 | The B. F. Goodrich Company | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
| CN1198181C (zh) | 1996-03-07 | 2005-04-20 | 住友电木株式会社 | 包括具有酸不稳定侧基的多环聚合物的光刻胶组合物 |
| US6569971B2 (en) * | 1998-08-27 | 2003-05-27 | Hyundai Electronics Industries Co., Ltd. | Polymers for photoresist and photoresist compositions using the same |
| JP3262108B2 (ja) | 1998-09-09 | 2002-03-04 | 東レ株式会社 | ポジ型感光性樹脂組成物 |
| US6235447B1 (en) * | 1998-10-17 | 2001-05-22 | Hyundai Electronics Industries Co., Ltd. | Photoresist monomers, polymers thereof, and photoresist compositions containing the same |
| KR100389912B1 (ko) * | 1999-12-08 | 2003-07-04 | 삼성전자주식회사 | 지환식 감광성 폴리머 및 이를 포함하는 레지스트 조성물 |
| EP1130468A3 (en) * | 2000-02-25 | 2003-07-30 | Shipley Company LLC | Polymer and photoresist compositions |
| US6737215B2 (en) | 2001-05-11 | 2004-05-18 | Clariant Finance (Bvi) Ltd | Photoresist composition for deep ultraviolet lithography |
| JP3952756B2 (ja) | 2001-11-29 | 2007-08-01 | 日本ゼオン株式会社 | 感放射線性樹脂組成物及びその利用 |
| JP4576797B2 (ja) | 2002-03-28 | 2010-11-10 | 東レ株式会社 | ポジ型感光性樹脂組成物及びそれよりなる絶縁膜、半導体装置、及び有機電界発光素子 |
| JP4675259B2 (ja) * | 2005-02-25 | 2011-04-20 | 三井化学株式会社 | オレフィンの重合方法及び該重合方法で得られる重合体 |
| CN1828418A (zh) * | 2006-03-27 | 2006-09-06 | 苏州华飞微电子材料有限公司 | 含硅偶联剂的193nm光刻胶及其成膜树脂 |
| RU2011108263A (ru) * | 2008-08-04 | 2012-09-10 | ФАЙРСТОУН ПОЛИМЕРС, ЭлЭлСи (US) | Аддукты полимеров, получаемых метатезисной полимеризацией, и их получение |
| US8753790B2 (en) | 2009-07-01 | 2014-06-17 | Promerus, Llc | Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom |
| CN103370347B (zh) * | 2010-11-24 | 2016-08-10 | 普罗米鲁斯有限责任公司 | 可自成像成膜聚合物、其组合物以及由其制得的器件和结构 |
| JP5937104B2 (ja) * | 2010-12-29 | 2016-06-22 | プロメラス， エルエルシー | 仮接着のためのポリマー組成物 |
| JP2014040532A (ja) * | 2012-08-23 | 2014-03-06 | Shin Etsu Chem Co Ltd | 環状オレフィン付加重合体及びその製造方法 |
| WO2014176490A1 (en) * | 2013-04-26 | 2014-10-30 | Promerus, Llc | Photosensitive compositions and applications thereof |
| WO2015038412A2 (en) * | 2013-09-16 | 2015-03-19 | Promerus, Llc | Amine treated maleic anhydride polymers with pendent silyl group, compositions and applications thereof |
-
2017
- 2017-07-28 JP JP2019503696A patent/JP6765501B2/ja not_active Expired - Fee Related
- 2017-07-28 TW TW106125554A patent/TWI716619B/zh not_active IP Right Cessation
- 2017-07-28 WO PCT/US2017/044281 patent/WO2018022952A1/en not_active Ceased
- 2017-07-28 KR KR1020197005100A patent/KR102172939B1/ko not_active Expired - Fee Related
- 2017-07-28 US US15/662,372 patent/US10591818B2/en active Active
- 2017-07-28 CN CN201780046385.7A patent/CN109476948A/zh active Pending
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