JP2019514042A5 - - Google Patents
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- JP2019514042A5 JP2019514042A5 JP2018547903A JP2018547903A JP2019514042A5 JP 2019514042 A5 JP2019514042 A5 JP 2019514042A5 JP 2018547903 A JP2018547903 A JP 2018547903A JP 2018547903 A JP2018547903 A JP 2018547903A JP 2019514042 A5 JP2019514042 A5 JP 2019514042A5
- Authority
- JP
- Japan
- Prior art keywords
- buffer
- further embodiments
- hardmask
- nitride
- silicon nitride
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662306979P | 2016-03-11 | 2016-03-11 | |
| US62/306,979 | 2016-03-11 | ||
| PCT/US2017/021769 WO2017156388A1 (en) | 2016-03-11 | 2017-03-10 | Pre-patterned lithography templates, processes based on radiation patterning using the templates and processes to form the templates |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019514042A JP2019514042A (ja) | 2019-05-30 |
| JP2019514042A5 true JP2019514042A5 (enExample) | 2021-08-12 |
| JP6993982B2 JP6993982B2 (ja) | 2022-02-04 |
Family
ID=59786564
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018547903A Active JP6993982B2 (ja) | 2016-03-11 | 2017-03-10 | 予めパターン形成されたリソグラフィ・テンプレート、該テンプレートを使用した放射線パターニングに基づくプロセス、及び該テンプレートを形成するためのプロセス |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US10649328B2 (enExample) |
| JP (1) | JP6993982B2 (enExample) |
| KR (1) | KR102394042B1 (enExample) |
| CN (1) | CN108780739B (enExample) |
| TW (1) | TWI721125B (enExample) |
| WO (1) | WO2017156388A1 (enExample) |
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| TWI545622B (zh) | 2014-02-23 | 2016-08-11 | 東京威力科創股份有限公司 | 藉由交叉多重圖案化層以增加圖案密度的方法 |
| EP4050014B1 (en) | 2014-10-23 | 2026-08-19 | Inpria Corporation | Method for forming a film for high resolution patterning and film formed thereby |
| KR102708400B1 (ko) | 2015-10-13 | 2024-09-20 | 인프리아 코포레이션 | 유기주석 옥사이드 하이드록사이드 패터닝 조성물,전구체 및 패터닝 |
| US9996004B2 (en) * | 2015-11-20 | 2018-06-12 | Lam Research Corporation | EUV photopatterning of vapor-deposited metal oxide-containing hardmasks |
| KR102394042B1 (ko) | 2016-03-11 | 2022-05-03 | 인프리아 코포레이션 | 사전패터닝된 리소그래피 템플레이트, 상기 템플레이트를 이용한 방사선 패터닝에 기초한 방법 및 상기 템플레이트를 형성하기 위한 방법 |
| WO2018031896A1 (en) | 2016-08-12 | 2018-02-15 | Inpria Corporation | Methods of reducing metal residue in edge bead region from metal-containing resists |
| WO2019099981A2 (en) | 2017-11-20 | 2019-05-23 | Inpria Corporation | Organotin clusters, solutions of organotin clusters, and application to high resolution patterning |
| TWI778248B (zh) | 2018-04-05 | 2022-09-21 | 美商英培雅股份有限公司 | 錫十二聚物及具有強euv吸收的輻射可圖案化塗層 |
| JP7649752B2 (ja) | 2019-04-12 | 2025-03-21 | インプリア・コーポレイション | 有機金属フォトレジスト現像剤組成物及び処理方法 |
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2017
- 2017-03-10 KR KR1020187029161A patent/KR102394042B1/ko active Active
- 2017-03-10 TW TW106108071A patent/TWI721125B/zh active
- 2017-03-10 JP JP2018547903A patent/JP6993982B2/ja active Active
- 2017-03-10 WO PCT/US2017/021769 patent/WO2017156388A1/en not_active Ceased
- 2017-03-10 US US15/455,784 patent/US10649328B2/en active Active
- 2017-03-10 CN CN201780016440.8A patent/CN108780739B/zh active Active
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2020
- 2020-04-01 US US16/837,666 patent/US11347145B2/en active Active
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