JP2019061996A - 基板反転装置、基板処理装置および基板挟持装置 - Google Patents
基板反転装置、基板処理装置および基板挟持装置 Download PDFInfo
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Abstract
Description
9 基板
10 インデクサセル
12 移載ロボット
20 洗浄処理セル
22 搬送ロボット
24 裏面洗浄処理部
71,71a 上ガイド
72,72a 下ガイド
74,74a ガイド移動機構
75,75a 上回転軸
76,76a 下回転軸
77,77a 切替機構
80 反転機構
82 回転軸
100,100a 基板反転装置
711,711a 第1上接触領域
712,712a 第2上接触領域
721,721a 第1下接触領域
722,722a 第2下接触領域
771,771a 上ガイド回転機構
772,772a 下ガイド回転機構
Claims (8)
- 基板反転装置であって、
基板の幅方向内方に向かうに従って下方へと向かう下傾斜面を、水平状態の前記基板の周縁部に接触させて前記基板を下方から支持する複数の下ガイドと、
前記幅方向内方に向かうに従って上方へと向かう上傾斜面を、前記複数の下ガイドとの接触位置よりも上側にて前記基板の周縁部に接触させて前記複数の下ガイドとの間で前記基板を挟持する複数の上ガイドと、
前記複数の下ガイドおよび前記複数の上ガイドを水平方向を向く回転軸を中心として回転することにより、前記複数の下ガイドおよび前記複数の上ガイドにより挟持された前記基板を反転させる反転機構と、
前記複数の下ガイドおよび前記複数の上ガイドを、前記基板に接触する接触位置と、前記接触位置よりも前記基板から離れた退避位置との間で進退させるガイド移動機構と、
前記複数の下ガイドおよび前記複数の上ガイドと前記基板との接触状態を変更する切替機構と、
を備え、
各下ガイドが、前記切替機構により切り替えられて選択的に前記下傾斜面とされる第1下接触領域および第2下接触領域を備え、
各上ガイドが、前記切替機構により切り替えられて選択的に前記上傾斜面とされる第1上接触領域および第2上接触領域を備えることを特徴とする基板反転装置。 - 請求項1に記載の基板反転装置であって、
前記各下ガイドにおいて、前記幅方向に延びる下回転軸の長手方向の同じ位置に前記第1下接触領域および前記第2下接触領域が配置され、
前記各上ガイドにおいて、前記幅方向に延びる上回転軸の長手方向の同じ位置に前記第1上接触領域および前記第2上接触領域が配置され、
前記切替機構が、
前記各下ガイドを前記下回転軸を中心として回転させることにより、前記第1下接触領域および前記第2下接触領域を選択的に前記下傾斜面とする下ガイド回転機構と、
前記各上ガイドを前記上回転軸を中心として回転させることにより、前記第1上接触領域および前記第2上接触領域を選択的に前記上傾斜面とする上ガイド回転機構と、
を備えることを特徴とする基板反転装置。 - 請求項1に記載の基板反転装置であって、
前記各下ガイドにおいて、上下方向に延びる下回転軸に対して線対称の位置に前記第1下接触領域および前記第2下接触領域が配置され、
前記各上ガイドにおいて、前記上下方向に延びる上回転軸に対して線対称の位置に前記第1上接触領域および前記第2上接触領域が配置され、
前記切替機構が、
前記各下ガイドを前記下回転軸を中心として回転させることにより、前記第1下接触領域および前記第2下接触領域を選択的に前記下傾斜面とする下ガイド回転機構と、
前記各上ガイドを前記上回転軸を中心として回転させることにより、前記第1上接触領域および前記第2上接触領域を選択的に前記上傾斜面とする上ガイド回転機構と、
を備えることを特徴とする基板反転装置。 - 請求項2または3に記載の基板反転装置であって、
前記下ガイド回転機構が、前記各下ガイドを前記下回転軸を中心として180度回転させることにより、前記第1下接触領域および前記第2下接触領域を選択的に前記下傾斜面とし、
前記上ガイド回転機構が、前記各上ガイドを前記上回転軸を中心として180度回転させることにより、前記第1上接触領域および前記第2上接触領域を選択的に前記上傾斜面とすることを特徴とする基板反転装置。 - 請求項1ないし4のいずれか1つに記載の基板反転装置であって、
前記各上ガイドが、平面視において前記各下ガイドと異なる位置に配置されることを特徴とする基板反転装置。 - 基板処理装置であって、
請求項1ないし5のいずれか1つに記載の基板反転装置と、
前記基板反転装置にて反転された前記基板の裏面を洗浄する裏面洗浄部と、
前記基板反転装置と前記裏面洗浄部との間で前記基板を搬送する基板搬送部と、
を備えることを特徴とする基板処理装置。 - 請求項6に記載の基板処理装置であって、
前記裏面洗浄部および前記基板搬送部が配置された洗浄処理ブロックと、
他の基板搬送部が配置され、前記洗浄処理ブロックに未処理の基板を渡すとともに前記洗浄処理ブロックから処理済みの基板を受け取るインデクサブロックと、
をさらに備え、
前記基板反転装置が、前記洗浄処理ブロックと前記インデクサブロックとの接続部に配置され、
前記基板搬送部と前記他の基板搬送部のうち一方の搬送部が前記基板反転装置に基板を搬入した場合、前記基板反転装置にて反転された前記基板を他方の基板搬送部が前記基板反転装置から搬出することを特徴とする基板処理装置。 - 基板挟持装置であって、
基板の幅方向内方に向かうに従って下方へと向かう下傾斜面を、水平状態の前記基板の周縁部に接触させて前記基板を下方から支持する複数の下ガイドと、
前記幅方向内方に向かうに従って上方へと向かう上傾斜面を、前記複数の下ガイドとの接触位置よりも上側にて前記基板の周縁部に接触させて前記複数の下ガイドとの間で前記基板を挟持する複数の上ガイドと、
前記複数の下ガイドおよび前記複数の上ガイドと前記基板との接触状態を変更する切替機構と、
を備え、
各下ガイドが、前記切替機構により切り替えられて選択的に前記下傾斜面とされる第1下接触領域および第2下接触領域を備え、
各上ガイドが、前記切替機構により切り替えられて選択的に前記上傾斜面とされる第1上接触領域および第2上接触領域を備えることを特徴とする基板挟持装置。
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US16/112,893 US20190096729A1 (en) | 2017-09-25 | 2018-08-27 | Substrate inverting device, substrate processing apparatus, and substrate catch-and-hold device |
KR1020180101236A KR102363210B1 (ko) | 2017-09-25 | 2018-08-28 | 기판 반전 장치, 기판 처리 장치 및 기판 협지 장치 |
TW107130122A TWI673822B (zh) | 2017-09-25 | 2018-08-29 | 基板反轉裝置、基板處理裝置以及基板夾持裝置 |
CN201811107884.5A CN109560031B (zh) | 2017-09-25 | 2018-09-21 | 基板反转装置、基板处理装置以及基板夹持装置 |
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JP2021057378A (ja) * | 2019-09-27 | 2021-04-08 | 株式会社Screenホールディングス | 基板処理装置 |
WO2023047788A1 (ja) * | 2021-09-22 | 2023-03-30 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
JP7478776B2 (ja) | 2021-07-07 | 2024-05-07 | アプライド マテリアルズ インコーポレイテッド | ゲートスタック形成のための統合湿式洗浄 |
JP7485729B2 (ja) | 2021-07-07 | 2024-05-16 | アプライド マテリアルズ インコーポレイテッド | エピタキシャル成長のための統合湿式洗浄 |
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JP7267215B2 (ja) * | 2020-01-22 | 2023-05-01 | 東京エレクトロン株式会社 | 搬送装置、処理システム及び搬送方法 |
CN111348427B (zh) * | 2020-03-13 | 2022-04-22 | 北京北方华创微电子装备有限公司 | 机械手 |
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