JP6045869B2 - 基板処理装置および基板処理方法 - Google Patents
基板処理装置および基板処理方法 Download PDFInfo
- Publication number
- JP6045869B2 JP6045869B2 JP2012219502A JP2012219502A JP6045869B2 JP 6045869 B2 JP6045869 B2 JP 6045869B2 JP 2012219502 A JP2012219502 A JP 2012219502A JP 2012219502 A JP2012219502 A JP 2012219502A JP 6045869 B2 JP6045869 B2 JP 6045869B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- transfer robot
- transfer
- unit
- surface cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
- H01L21/67781—Batch transfer of wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67796—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations with angular orientation of workpieces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
図1は、本発明に係る基板処理装置1の平面図である。また、図2は図1のA−A線から見た図であり、図3は図1のB−B線から見た図である。なお、図1から図3にはそれらの方向関係を明確にするためZ軸方向を鉛直方向とし、XY平面を水平面とするXYZ直交座標系を付している。基板処理装置1は、複数枚の基板Wに連続してスクラブ洗浄処理を行う洗浄装置であり、インデクサブロックIDおよび洗浄処理ブロックSPの2つのブロック(処理区画)を並設して構成されている。本実施形態の基板Wは円板形状の半導体ウェハーである。また、基板処理装置1は、インデクサブロックIDおよび洗浄処理ブロックSPに設けられた各動作機構を制御して基板Wの洗浄処理を実行させる制御部5を備える。
次に、本発明の第2実施形態について説明する。第2実施形態の基板処理装置の構成は第1実施形態と全く同じである。また、第2実施形態における基板Wの搬送手順も第1実施形態と同様である。第2実施形態が第1実施形態と相違するのは、移載ロボットIRおよび主搬送ロボットMRが基板Wを搬送しつつ回転させる態様として、ハンドを回転させる時期を限定している点である。
以上、本発明の実施の形態について説明したが、この発明はその趣旨を逸脱しない限りにおいて上述したもの以外に種々の変更を行うことが可能である。例えば、上記各実施形態においては、移載ロボットIRの移載ハンド12a,12bおよび主搬送ロボットMRの搬送ハンド32a,32bが180°回転できるものとされていたが、移載ロボットIRの移載ハンド12a,12bは少なくとも90°回転できる構成であれば良い。また、基板処理装置1に表面洗浄処理ユニットSSおよび裏面洗浄処理ユニットSSRのいずれか一方のみが搭載されている場合には、それらの間での基板Wの反転が不要であるため、主搬送ロボットMRの搬送ハンド32a,32bも少なくとも90°回転できる構成であれば良い。
5 制御部
11 カセットステージ
15,35 回転板
16,36 ロータリアクチュエータ
12a,12b 移載ハンド
32a,32b 搬送ハンド
37,53 把持機構
50 基板受渡部
51,251,511,512 縦パス
54 スライド駆動機構
C カセット
ID インデクサブロック
IR 移載ロボット
MR 主搬送ロボット
PL1 第1処理部列
PL2 第2処理部列
RX 回転中心軸
SP 洗浄処理ブロック
SS 表面洗浄処理ユニット
SSR 裏面洗浄処理ユニット
W 基板
Claims (8)
- 主搬送ロボットおよび当該主搬送ロボットによって基板が搬送される処理部を有する処理ブロックと、
移載ロボットを有し、カセットから未処理の基板を取り出して前記処理ブロックに渡すとともに前記処理ブロックから処理済みの基板を受け取ってカセットに収納するインデクサブロックと、
前記インデクサブロックと前記処理ブロックとの接続部分に設けられ、前記主搬送ロボットと前記移載ロボットとの間で受け渡される基板を起立姿勢にて保持する受渡部と、
を備え、
前記主搬送ロボットは、基板を把持する第1ハンドおよび前記第1ハンドを水平方向に沿う軸を中心として少なくとも90°回転させる第1回転機構を有し、前記第1ハンドに把持した基板を水平方向に沿う軸を中心として90°回転させつつ前記受渡部と前記処理部との間で当該基板を搬送し、
前記移載ロボットは、基板を把持する第2ハンドおよび前記第2ハンドを水平方向に沿う軸を中心として少なくとも90°回転させる第2回転機構を有し、前記第2ハンドに把持した基板を水平方向に沿う軸を中心として90°回転させつつ前記受渡部とカセットとの間で当該基板を搬送し、
前記処理部は、基板の裏面を洗浄する裏面洗浄処理ユニットを含み、
前記移載ロボットが前記カセットから受け取った基板を90°回転させて前記受渡部に渡し、かつ、前記主搬送ロボットが前記受渡部から受け取った当該基板を90°回転させて前記裏面洗浄処理ユニットに渡すことによって、当該基板を表裏反転させて前記裏面洗浄処理ユニットに搬送することを特徴とする基板処理装置。 - 請求項1記載の基板処理装置において、
前記処理部は、基板の表面を洗浄する表面洗浄処理ユニットを含み、
前記主搬送ロボットは、前記裏面洗浄処理ユニットから取り出した基板を180°回転させつつ前記表面洗浄処理ユニットに搬送することを特徴とする基板処理装置。 - 請求項1または請求項2記載の基板処理装置において、
前記主搬送ロボットは、前記第1ハンドに把持した基板を起立姿勢にして旋回動作を行うことなく鉛直方向への昇降動作を行い、
前記移載ロボットは、前記第2ハンドに把持した基板を起立姿勢にして旋回動作を行うことなく鉛直方向への昇降動作を行うことを特徴とする基板処理装置。 - 請求項1から請求項3のいずれかに記載の基板処理装置において、
前記基板は直径が450mmの半導体ウェハーであることを特徴とする基板処理装置。 - (a) 移載ロボットがカセットから未処理の基板を取り出し、当該基板を水平方向に沿う軸を中心として90°回転させつつ受渡部に渡す工程と、
(b) 前記受渡部が前記移載ロボットから受け取った前記基板を起立姿勢にて保持する工程と、
(c) 主搬送ロボットが前記受渡部から前記基板を受け取り、前記基板を水平方向に沿う軸を中心として90°回転させつつ処理部に搬送する工程と、
(d) 前記主搬送ロボットが前記処理部から処理済みの基板を受け取り、前記基板を水平方向に沿う軸を中心として90°回転させつつ前記受渡部に渡す工程と、
(e) 前記受渡部が前記主搬送ロボットから受け取った前記基板を起立姿勢にて保持する工程と、
(f) 前記移載ロボットが前記受渡部から前記基板を受け取り、前記基板を水平方向に沿う軸を中心として90°回転させつつカセットに搬送して収納する工程と、
を備え、
前記処理部は、基板の裏面を洗浄する裏面洗浄処理ユニットを含み、
前記工程(a)にて前記移載ロボットが前記カセットから受け取った基板を90°回転させて前記受渡部に渡し、かつ、前記工程(c)にて前記主搬送ロボットが前記受渡部から受け取った当該基板を90°回転させて前記裏面洗浄処理ユニットに渡すことによって、当該基板を表裏反転させて前記裏面洗浄処理ユニットに搬送することを特徴とする基板処理方法。 - 請求項5記載の基板処理方法において、
前記処理部は、基板の表面を洗浄する表面洗浄処理ユニットを含み、
(g) 前記主搬送ロボットが前記裏面洗浄処理ユニットから取り出した基板を180°回転させつつ前記表面洗浄処理ユニットに搬送する工程をさらに備えることを特徴とする基板処理方法。 - 請求項5または請求項6に記載の基板処理方法において、
前記工程(a)および前記工程(f)は、前記移載ロボットが基板を起立姿勢にして旋回動作を行うことなく鉛直方向への昇降動作を行う工程を含み、
前記工程(c)および前記工程(d)は、前記主搬送ロボットが基板を起立姿勢にして旋回動作を行うことなく鉛直方向への昇降動作を行う工程を含むことを特徴とする基板処理方法。 - 請求項5から請求項7のいずれかに記載の基板処理方法において、
前記基板は直径が450mmの半導体ウェハーであることを特徴とする基板処理方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012219502A JP6045869B2 (ja) | 2012-10-01 | 2012-10-01 | 基板処理装置および基板処理方法 |
US14/019,595 US9327918B2 (en) | 2012-10-01 | 2013-09-06 | Substrate processing apparatus and substrate processing method for performing cleaning process and the like on substrate |
TW102134340A TWI496237B (zh) | 2012-10-01 | 2013-09-24 | 基板處理裝置及基板處理方法 |
KR1020130113219A KR101461339B1 (ko) | 2012-10-01 | 2013-09-24 | 기판 처리 장치 및 기판 처리 방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012219502A JP6045869B2 (ja) | 2012-10-01 | 2012-10-01 | 基板処理装置および基板処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014072490A JP2014072490A (ja) | 2014-04-21 |
JP6045869B2 true JP6045869B2 (ja) | 2016-12-14 |
Family
ID=50385378
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012219502A Active JP6045869B2 (ja) | 2012-10-01 | 2012-10-01 | 基板処理装置および基板処理方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US9327918B2 (ja) |
JP (1) | JP6045869B2 (ja) |
KR (1) | KR101461339B1 (ja) |
TW (1) | TWI496237B (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102004421B1 (ko) * | 2017-06-13 | 2019-07-29 | 삼성디스플레이 주식회사 | 기판 처리 장치 |
JP6917846B2 (ja) * | 2017-09-25 | 2021-08-11 | 株式会社Screenホールディングス | 基板反転装置、基板処理装置および基板挟持装置 |
US10510573B2 (en) * | 2017-11-14 | 2019-12-17 | Taiwan Semiconductor Manufacturing Co., Ltd. | Loading apparatus and operating method thereof |
CN207967026U (zh) * | 2018-03-14 | 2018-10-12 | 君泰创新(北京)科技有限公司 | 电池片载板翻转机构及电池片镀膜工艺生产线 |
CN111063652B (zh) * | 2018-10-16 | 2022-08-30 | 沈阳芯源微电子设备股份有限公司 | 一种基板夹持承载台 |
JP7359610B2 (ja) | 2019-09-13 | 2023-10-11 | 株式会社Screenホールディングス | 基板処理装置 |
KR102473569B1 (ko) * | 2020-01-15 | 2022-12-02 | 세메스 주식회사 | 기판 반송 장치 및 이를 구비하는 기판 처리 시스템 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1022359A (ja) * | 1996-07-01 | 1998-01-23 | Dainippon Screen Mfg Co Ltd | 基板搬送装置 |
JP3745064B2 (ja) | 1997-01-23 | 2006-02-15 | 大日本スクリーン製造株式会社 | 基板搬送装置およびそれを用いた基板搬送方法ならびに基板姿勢変換装置 |
JP3905658B2 (ja) | 1999-02-08 | 2007-04-18 | 大日本スクリーン製造株式会社 | 基板搬送装置 |
US6406359B1 (en) * | 1999-06-01 | 2002-06-18 | Applied Materials, Inc. | Apparatus for transferring semiconductor substrates using an input module |
US6361422B1 (en) * | 1999-06-15 | 2002-03-26 | Applied Materials, Inc. | Method and apparatus for transferring semiconductor substrates using an input module |
US6481951B1 (en) * | 1999-09-16 | 2002-11-19 | Applied Materials, Inc. | Multiple sided robot blade for semiconductor processing equipment |
JP2001274232A (ja) * | 2000-03-27 | 2001-10-05 | Tokyo Electron Ltd | 基板処理装置 |
JP3459632B2 (ja) | 2000-11-27 | 2003-10-20 | 株式会社石井表記 | 基板洗浄装置 |
JP2003100695A (ja) * | 2001-09-26 | 2003-04-04 | Dainippon Screen Mfg Co Ltd | 基板洗浄装置 |
WO2005015627A1 (en) * | 2003-08-07 | 2005-02-17 | Ebara Corporation | Substrate processing apparatus, substrate processing method, and substrate holding apparatus |
JP4030946B2 (ja) | 2003-09-26 | 2008-01-09 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP4467367B2 (ja) * | 2004-06-22 | 2010-05-26 | 大日本スクリーン製造株式会社 | 基板反転装置、基板搬送装置、基板処理装置、基板反転方法、基板搬送方法および基板処理方法 |
JP4744426B2 (ja) | 2006-12-27 | 2011-08-10 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
JP5004612B2 (ja) * | 2007-02-15 | 2012-08-22 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP5385537B2 (ja) * | 2008-02-26 | 2014-01-08 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP5107122B2 (ja) * | 2008-04-03 | 2012-12-26 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP5102717B2 (ja) | 2008-08-13 | 2012-12-19 | 大日本スクリーン製造株式会社 | 基板搬送装置およびこれを備えた基板処理装置 |
DE102009038941B4 (de) * | 2009-08-26 | 2013-03-21 | Siltronic Ag | Verfahren zur Herstellung einer Halbleiterscheibe |
-
2012
- 2012-10-01 JP JP2012219502A patent/JP6045869B2/ja active Active
-
2013
- 2013-09-06 US US14/019,595 patent/US9327918B2/en active Active
- 2013-09-24 KR KR1020130113219A patent/KR101461339B1/ko active IP Right Grant
- 2013-09-24 TW TW102134340A patent/TWI496237B/zh active
Also Published As
Publication number | Publication date |
---|---|
JP2014072490A (ja) | 2014-04-21 |
TWI496237B (zh) | 2015-08-11 |
KR20140043670A (ko) | 2014-04-10 |
US9327918B2 (en) | 2016-05-03 |
KR101461339B1 (ko) | 2014-11-14 |
US20140093337A1 (en) | 2014-04-03 |
TW201415575A (zh) | 2014-04-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6045869B2 (ja) | 基板処理装置および基板処理方法 | |
JP5274339B2 (ja) | 基板処理装置および基板搬送方法 | |
US20140202499A1 (en) | Substrate processing method | |
JP5102717B2 (ja) | 基板搬送装置およびこれを備えた基板処理装置 | |
JP2011071293A (ja) | プロセスモジュール、基板処理装置、および基板搬送方法 | |
JP2009252888A (ja) | 基板処理装置 | |
JP6779636B2 (ja) | 基板処理装置 | |
KR102244354B1 (ko) | 기판 반송 기구, 기판 처리 장치 및 기판 반송 방법 | |
JP7359610B2 (ja) | 基板処理装置 | |
JP5524304B2 (ja) | 基板処理装置における基板搬送方法 | |
WO2010113881A1 (ja) | 基板搬送装置及び基板処理装置 | |
JPH11165863A (ja) | 基板搬送装置 | |
KR101383248B1 (ko) | 고속 기판 처리 시스템 | |
CN112570332B (zh) | 基板处理装置 | |
TWI747074B (zh) | 基板處理裝置 | |
JP5283770B2 (ja) | 基板搬送装置およびこれを備えた基板処理装置 | |
TWI529843B (zh) | 基板處理裝置 | |
JPH11251398A (ja) | 基板搬送装置およびこれを用いた基板洗浄装置ならびに基板搬送方法 | |
JP2007053203A (ja) | 基板処理装置および基板搬送方法 | |
JP2006073834A (ja) | 基板搬送装置およびそれを用いた基板処理装置 | |
JP2013055363A (ja) | プロセスモジュール、基板処理装置、および基板搬送方法 | |
JPH11214470A (ja) | 基板搬送装置 | |
JP2024046367A (ja) | 基板処理装置 | |
JP2024046366A (ja) | 基板処理装置 | |
TW202129820A (zh) | 基板處理裝置及基板搬送方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20150619 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20160526 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160531 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160729 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20161101 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20161116 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6045869 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |