JP2018137439A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2018137439A5 JP2018137439A5 JP2018023304A JP2018023304A JP2018137439A5 JP 2018137439 A5 JP2018137439 A5 JP 2018137439A5 JP 2018023304 A JP2018023304 A JP 2018023304A JP 2018023304 A JP2018023304 A JP 2018023304A JP 2018137439 A5 JP2018137439 A5 JP 2018137439A5
- Authority
- JP
- Japan
- Prior art keywords
- nanowire
- conductivity
- tip
- type semiconductor
- tip portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002070 nanowire Substances 0.000 claims 10
- 238000000034 method Methods 0.000 claims 6
- 239000004065 semiconductor Substances 0.000 claims 3
- 239000012159 carrier gas Substances 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 2
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261719133P | 2012-10-26 | 2012-10-26 | |
| US61/719,133 | 2012-10-26 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015539716A Division JP6293157B2 (ja) | 2012-10-26 | 2013-10-22 | ナノワイヤサイズの光電構造及びその選択された部分を改質する方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018137439A JP2018137439A (ja) | 2018-08-30 |
| JP2018137439A5 true JP2018137439A5 (enExample) | 2018-10-18 |
| JP6486519B2 JP6486519B2 (ja) | 2019-03-20 |
Family
ID=50545186
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015539716A Active JP6293157B2 (ja) | 2012-10-26 | 2013-10-22 | ナノワイヤサイズの光電構造及びその選択された部分を改質する方法 |
| JP2018023304A Active JP6486519B2 (ja) | 2012-10-26 | 2018-02-13 | ナノワイヤサイズの光電構造及びその選択された部分を改質する方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015539716A Active JP6293157B2 (ja) | 2012-10-26 | 2013-10-22 | ナノワイヤサイズの光電構造及びその選択された部分を改質する方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US9166106B2 (enExample) |
| EP (1) | EP2912699B1 (enExample) |
| JP (2) | JP6293157B2 (enExample) |
| TW (1) | TW201428999A (enExample) |
| WO (1) | WO2014066379A1 (enExample) |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014066371A1 (en) | 2012-10-26 | 2014-05-01 | Glo Ab | Nanowire sized opto-electronic structure and method for modifying selected portions of same |
| EP2912699B1 (en) | 2012-10-26 | 2019-12-18 | Glo Ab | Method for modifying selected portions of nanowire sized opto-electronic structure |
| KR101554032B1 (ko) * | 2013-01-29 | 2015-09-18 | 삼성전자주식회사 | 나노구조 반도체 발광소자 |
| JP6205747B2 (ja) * | 2013-02-21 | 2017-10-04 | 富士通株式会社 | 光半導体素子及びその製造方法 |
| WO2014138904A1 (en) * | 2013-03-14 | 2014-09-18 | The Royal Institution For The Advancement Of Learning/Mcgill University | Methods and devices for solid state nanowire devices |
| US10079331B2 (en) | 2013-03-15 | 2018-09-18 | Glo Ab | High index dielectric film to increase extraction efficiency of nanowire LEDs |
| US9522821B2 (en) * | 2013-04-18 | 2016-12-20 | Bo Cui | Method of fabricating nano-scale structures and nano-scale structures fabricated using the method |
| KR102075985B1 (ko) * | 2013-10-14 | 2020-02-11 | 삼성전자주식회사 | 나노구조 반도체 발광소자 |
| FR3016081B1 (fr) * | 2013-12-27 | 2017-03-24 | Aledia | Dispositif optoelectronique a diodes electroluminescentes a courant de fuite reduit |
| KR102188497B1 (ko) * | 2014-03-27 | 2020-12-09 | 삼성전자주식회사 | 나노구조 반도체 발광소자 |
| KR102188494B1 (ko) * | 2014-07-21 | 2020-12-09 | 삼성전자주식회사 | 반도체 발광소자, 반도체 발광소자 제조방법 및 반도체 발광소자 패키지 제조방법 |
| EP3180806A4 (en) * | 2014-08-12 | 2018-03-07 | Glo Ab | Iii-nitride nanowire led with strain modified surface active region and method of making thereof |
| KR102227771B1 (ko) | 2014-08-25 | 2021-03-16 | 삼성전자주식회사 | 나노구조 반도체 발광소자 |
| KR102337405B1 (ko) * | 2014-09-05 | 2021-12-13 | 삼성전자주식회사 | 나노구조 반도체 발광소자 |
| US9620559B2 (en) * | 2014-09-26 | 2017-04-11 | Glo Ab | Monolithic image chip for near-to-eye display |
| FR3026564B1 (fr) * | 2014-09-30 | 2018-02-16 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Dispositif optoelectronique a elements semiconducteurs tridimensionnels |
| US10134591B2 (en) | 2014-10-07 | 2018-11-20 | Tandem Sun Ab | Method for manufacturing a semiconductor device |
| DE102014117995A1 (de) * | 2014-12-05 | 2016-06-09 | Osram Opto Semiconductors Gmbh | Halbleiterschichtenfolge zur Erzeugung von sichtbarem Licht und Leuchtdiode |
| US11322652B2 (en) * | 2015-12-14 | 2022-05-03 | Ostendo Technologies, Inc. | Methods for producing composite GaN nanocolumns and light emitting structures made from the methods |
| DE102016102876A1 (de) * | 2016-02-18 | 2017-08-24 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauelement und Verfahren zur Herstellung eines optoelektronischen Halbleiterbauelements |
| CN207396531U (zh) | 2017-01-31 | 2018-05-22 | 杭州探真纳米科技有限公司 | 一种悬臂末端纳米探针 |
| US10840223B2 (en) * | 2017-03-23 | 2020-11-17 | Intel Corporation | Augmented reality display systems with super-lambertian LED source |
| JP7007547B2 (ja) * | 2017-04-11 | 2022-01-24 | 日亜化学工業株式会社 | 発光素子の製造方法 |
| CN109103101B (zh) * | 2017-06-21 | 2020-09-29 | 清华大学 | 纳米微结构的制备方法 |
| CN109103090B (zh) * | 2017-06-21 | 2020-12-04 | 清华大学 | 纳米带的制备方法 |
| JP6947386B2 (ja) * | 2017-06-29 | 2021-10-13 | 学校法人 名城大学 | 半導体発光素子および半導体発光素子の製造方法 |
| KR102520379B1 (ko) | 2017-10-05 | 2023-04-10 | 헥사겜 아베 | 평면의 iii-n 반도체 층을 갖는 반도체 디바이스 및 제작 방법 |
| CN113646894B (zh) | 2018-08-24 | 2024-07-16 | 马修·哈滕斯维尔德 | 纳米线发光开关装置及其方法 |
| JP7348520B2 (ja) * | 2018-12-25 | 2023-09-21 | 日亜化学工業株式会社 | 発光装置及び表示装置 |
| JP7227463B2 (ja) | 2018-12-27 | 2023-02-22 | 日亜化学工業株式会社 | 発光素子及びその製造方法 |
| JP7176700B2 (ja) | 2020-07-31 | 2022-11-22 | セイコーエプソン株式会社 | 発光装置およびプロジェクター |
| JP7655502B2 (ja) | 2021-01-15 | 2025-04-02 | セイコーエプソン株式会社 | 発光装置およびプロジェクター |
| JP7136374B1 (ja) * | 2022-01-12 | 2022-09-13 | 信越半導体株式会社 | マイクロled構造体を有するウェーハ、マイクロled構造体を有するウェーハの製造方法およびマイクロled構造体を有する接合型半導体ウェーハの製造方法 |
| KR20230114631A (ko) | 2022-01-25 | 2023-08-01 | 삼성전자주식회사 | 나노 로드 발광 다이오드, 디스플레이 장치 및 제조 방법 |
Family Cites Families (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20020049630A (ko) * | 2000-12-19 | 2002-06-26 | 임지순 | 전계방출 에미터 |
| US7335908B2 (en) | 2002-07-08 | 2008-02-26 | Qunano Ab | Nanostructures and methods for manufacturing the same |
| US7132677B2 (en) | 2004-02-13 | 2006-11-07 | Dongguk University | Super bright light emitting diode of nanorod array structure having InGaN quantum well and method for manufacturing the same |
| US7858996B2 (en) * | 2006-02-17 | 2010-12-28 | The Regents Of The University Of California | Method for growth of semipolar (Al,In,Ga,B)N optoelectronic devices |
| WO2007022359A2 (en) * | 2005-08-16 | 2007-02-22 | The Regents Of The University Of California | Vertical integrated silicon nanowire field effect transistors and methods of fabrication |
| US20070158661A1 (en) | 2006-01-12 | 2007-07-12 | Rutgers, The State University Of New Jersey | ZnO nanostructure-based light emitting device |
| JP5483887B2 (ja) | 2006-03-08 | 2014-05-07 | クナノ アーベー | Si上のエピタキシャルな半導体ナノワイヤの金属無しでの合成方法 |
| MX2008011275A (es) | 2006-03-10 | 2008-11-25 | Stc Unm | Crecimiento pulsado de nanoalambres de gan y aplicaciones en materiales y dispositivos de substrato semiconductor de nitruros del grupo iii. |
| US7968359B2 (en) * | 2006-03-10 | 2011-06-28 | Stc.Unm | Thin-walled structures |
| WO2008034823A1 (en) | 2006-09-18 | 2008-03-27 | Qunano Ab | Method of producing precision vertical and horizontal layers in a vertical semiconductor structure |
| WO2008140611A2 (en) | 2006-12-18 | 2008-11-20 | The Regents Of The University Of California | Nanowire array-based light emitting diodes and lasers |
| EP2095426A4 (en) | 2006-12-22 | 2012-10-10 | Qunano Ab | NANOELECTRONIC STRUCTURE AND PRODUCTION METHOD THEREOF |
| CN101669219B (zh) * | 2006-12-22 | 2011-10-05 | 昆南诺股份有限公司 | 带有直立式纳米线结构的led及其制作方法 |
| EP2102899B1 (en) | 2007-01-12 | 2020-11-11 | QuNano AB | Nitride nanowires and method of producing such |
| KR101524319B1 (ko) | 2007-01-12 | 2015-06-10 | 큐나노 에이비 | 시준 리플렉터를 갖는 나노구조 led 어레이 |
| WO2009009612A2 (en) * | 2007-07-09 | 2009-01-15 | Nanocrystal, Llc | Growth of self-assembled gan nanowires and application in nitride semiconductor bulk material |
| JP2009147140A (ja) | 2007-12-14 | 2009-07-02 | Panasonic Corp | 発光素子および発光素子の製造方法 |
| US8030108B1 (en) * | 2008-06-30 | 2011-10-04 | Stc.Unm | Epitaxial growth of in-plane nanowires and nanowire devices |
| EP2297794B1 (en) | 2008-07-07 | 2017-09-06 | Glo Ab | Nanostructured light emitting diode |
| KR20100080094A (ko) * | 2008-12-31 | 2010-07-08 | 삼성전자주식회사 | 방사형 이종접합 구조의 나노 막대를 이용한 발광 다이오드 |
| EP2446467A4 (en) | 2009-06-26 | 2014-07-02 | California Inst Of Techn | METHOD FOR PRODUCING PASSIVATED SILICON NANODRICES AND APPARATUS THUS OBTAINED THEREFOR |
| US20110079766A1 (en) | 2009-10-01 | 2011-04-07 | Isaac Harshman Wildeson | Process for fabricating iii-nitride based nanopyramid leds directly on a metalized silicon substrate |
| US20110083728A1 (en) * | 2009-10-14 | 2011-04-14 | Palo Alto Research Center Incorporated | Disordered Nanowire Solar Cell |
| JP5014403B2 (ja) * | 2009-11-19 | 2012-08-29 | シャープ株式会社 | 棒状構造発光素子、発光装置、発光装置の製造方法、バックライト、照明装置および表示装置 |
| US8872214B2 (en) | 2009-10-19 | 2014-10-28 | Sharp Kabushiki Kaisha | Rod-like light-emitting device, method of manufacturing rod-like light-emitting device, backlight, illuminating device, and display device |
| JP4814394B2 (ja) * | 2010-03-05 | 2011-11-16 | シャープ株式会社 | 発光装置の製造方法 |
| KR101134493B1 (ko) | 2010-03-19 | 2012-04-13 | 삼성엘이디 주식회사 | 발광 다이오드 및 이의 제조 방법 |
| CN103098237A (zh) * | 2010-06-18 | 2013-05-08 | Glo公司 | 纳米线发光二极管结构及其制造方法 |
| CA2802500A1 (en) | 2010-06-24 | 2011-12-29 | Glo Ab | Substrate with buffer layer for oriented nanowire growth |
| KR101710159B1 (ko) | 2010-09-14 | 2017-03-08 | 삼성전자주식회사 | Ⅲ족 질화물 나노로드 발광소자 및 그 제조 방법 |
| WO2012050888A2 (en) | 2010-09-28 | 2012-04-19 | North Carolina State University | Gallium nitride based structures with embedded voids and methods for their fabrication |
| KR20120040550A (ko) * | 2010-10-19 | 2012-04-27 | 삼성엘이디 주식회사 | 반도체 발광소자 및 그 제조방법 |
| KR20120055390A (ko) * | 2010-11-23 | 2012-05-31 | 삼성엘이디 주식회사 | 발광소자 및 그 제조방법 |
| WO2012075461A1 (en) * | 2010-12-02 | 2012-06-07 | Nanocrystal Corporation | Defect-free group iii - nitride nanostructures and devices based on repetitive multiple step growth-etch sequence |
| US20120217474A1 (en) * | 2011-02-25 | 2012-08-30 | Agency For Science, Technology And Research | Photonic device and method of making the same |
| TW201246599A (en) * | 2011-05-06 | 2012-11-16 | Nanocrystal Asia Inc Taiwan | Semiconductor substrate and fabricating method thereof |
| DE112012003376T5 (de) | 2011-08-16 | 2014-06-12 | Brightedge Technologies, Inc. | Seitenberichterstattung |
| US8350249B1 (en) | 2011-09-26 | 2013-01-08 | Glo Ab | Coalesced nanowire structures with interstitial voids and method for manufacturing the same |
| US9035278B2 (en) * | 2011-09-26 | 2015-05-19 | Glo Ab | Coalesced nanowire structures with interstitial voids and method for manufacturing the same |
| CN104769732A (zh) * | 2012-09-18 | 2015-07-08 | Glo公司 | 纳米角锥体大小的光电子结构及其制造方法 |
| WO2014066371A1 (en) | 2012-10-26 | 2014-05-01 | Glo Ab | Nanowire sized opto-electronic structure and method for modifying selected portions of same |
| EP2912699B1 (en) | 2012-10-26 | 2019-12-18 | Glo Ab | Method for modifying selected portions of nanowire sized opto-electronic structure |
| EP2912700A4 (en) | 2012-10-26 | 2016-04-06 | Glo Ab | NANODRAHT LED STRUCTURE AND METHOD FOR THE PRODUCTION THEREOF |
-
2013
- 2013-10-22 EP EP13849611.2A patent/EP2912699B1/en active Active
- 2013-10-22 US US14/059,950 patent/US9166106B2/en active Active
- 2013-10-22 JP JP2015539716A patent/JP6293157B2/ja active Active
- 2013-10-22 WO PCT/US2013/066165 patent/WO2014066379A1/en not_active Ceased
- 2013-10-25 TW TW102138791A patent/TW201428999A/zh unknown
-
2015
- 2015-10-09 US US14/879,502 patent/US9722135B2/en active Active
-
2017
- 2017-06-27 US US15/634,583 patent/US10038115B2/en active Active
-
2018
- 2018-02-13 JP JP2018023304A patent/JP6486519B2/ja active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2018137439A5 (enExample) | ||
| JP2016502754A5 (enExample) | ||
| JP2016527706A5 (enExample) | ||
| JP4970783B2 (ja) | 高効率半導体発光素子及びその製造方法 | |
| CN100379035C (zh) | 制造高效半导体器件的方法 | |
| CN103681985B (zh) | 一种发光二极管的外延片及其制作方法 | |
| CN104485400B (zh) | 一种iii‑v族氮化物的外延结构及其生长方法 | |
| US8017931B2 (en) | LED and fabrication method thereof | |
| US20170141261A1 (en) | Light Emitting Diodes and Fabrication Method | |
| JP2008219016A (ja) | 窒化物半導体層の形成方法、及びそれを有する発光ダイオード | |
| US10319876B2 (en) | Method of forming micro light emitting diode | |
| CN105355725B (zh) | 具有倾斜量子垒结构的氮化镓半导体发光二极管及其制法 | |
| US20110175126A1 (en) | Light-emitting diode structure | |
| JP5569480B2 (ja) | Iii族窒化物半導体発光素子 | |
| CN107768494B (zh) | 一种led外延结构及其制备方法 | |
| CN103022289B (zh) | InGaN基多量子阱结构的制备方法及LED结构 | |
| US9202976B2 (en) | Group III nitride semiconductor light-emitting device and method for producing the same | |
| KR101481722B1 (ko) | 발광소자 및 그 제조방법 | |
| CN102593273B (zh) | 发光二极管装置及基板结构的形成方法 | |
| CN104934509A (zh) | Iii-v族氮化物半导体外延结构、包含该外延结构的器件及其制备方法 | |
| CN105789401A (zh) | Led及其形成方法 | |
| CN104795477A (zh) | 一种倒装结构的发光二极管芯片及其制备方法 | |
| CN215644544U (zh) | 图形化复合衬底及led外延片 | |
| CN106206887B (zh) | 一种发光二极管外延片及其生产方法 | |
| KR101754249B1 (ko) | 양자점을 구비하는 나노선 구조체 및 그 제조 방법 |