JP2016502754A5 - - Google Patents
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- Publication number
- JP2016502754A5 JP2016502754A5 JP2015539716A JP2015539716A JP2016502754A5 JP 2016502754 A5 JP2016502754 A5 JP 2016502754A5 JP 2015539716 A JP2015539716 A JP 2015539716A JP 2015539716 A JP2015539716 A JP 2015539716A JP 2016502754 A5 JP2016502754 A5 JP 2016502754A5
- Authority
- JP
- Japan
- Prior art keywords
- nanowire
- tip
- conductivity
- layer
- side wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002070 nanowire Substances 0.000 claims 20
- 238000000034 method Methods 0.000 claims 9
- 239000000463 material Substances 0.000 claims 6
- 239000004065 semiconductor Substances 0.000 claims 5
- 229910002704 AlGaN Inorganic materials 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 claims 2
- 239000012159 carrier gas Substances 0.000 claims 1
- 238000009413 insulation Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261719133P | 2012-10-26 | 2012-10-26 | |
| US61/719,133 | 2012-10-26 | ||
| PCT/US2013/066165 WO2014066379A1 (en) | 2012-10-26 | 2013-10-22 | Nanowire sized opto-electronic structure and method for modifying selected portions of same |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018023304A Division JP6486519B2 (ja) | 2012-10-26 | 2018-02-13 | ナノワイヤサイズの光電構造及びその選択された部分を改質する方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016502754A JP2016502754A (ja) | 2016-01-28 |
| JP2016502754A5 true JP2016502754A5 (enExample) | 2016-12-08 |
| JP6293157B2 JP6293157B2 (ja) | 2018-03-14 |
Family
ID=50545186
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015539716A Active JP6293157B2 (ja) | 2012-10-26 | 2013-10-22 | ナノワイヤサイズの光電構造及びその選択された部分を改質する方法 |
| JP2018023304A Active JP6486519B2 (ja) | 2012-10-26 | 2018-02-13 | ナノワイヤサイズの光電構造及びその選択された部分を改質する方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018023304A Active JP6486519B2 (ja) | 2012-10-26 | 2018-02-13 | ナノワイヤサイズの光電構造及びその選択された部分を改質する方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US9166106B2 (enExample) |
| EP (1) | EP2912699B1 (enExample) |
| JP (2) | JP6293157B2 (enExample) |
| TW (1) | TW201428999A (enExample) |
| WO (1) | WO2014066379A1 (enExample) |
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| WO2014066371A1 (en) | 2012-10-26 | 2014-05-01 | Glo Ab | Nanowire sized opto-electronic structure and method for modifying selected portions of same |
| EP2912699B1 (en) | 2012-10-26 | 2019-12-18 | Glo Ab | Method for modifying selected portions of nanowire sized opto-electronic structure |
| KR101554032B1 (ko) * | 2013-01-29 | 2015-09-18 | 삼성전자주식회사 | 나노구조 반도체 발광소자 |
| JP6205747B2 (ja) * | 2013-02-21 | 2017-10-04 | 富士通株式会社 | 光半導体素子及びその製造方法 |
| WO2014138904A1 (en) * | 2013-03-14 | 2014-09-18 | The Royal Institution For The Advancement Of Learning/Mcgill University | Methods and devices for solid state nanowire devices |
| US10079331B2 (en) | 2013-03-15 | 2018-09-18 | Glo Ab | High index dielectric film to increase extraction efficiency of nanowire LEDs |
| US9522821B2 (en) * | 2013-04-18 | 2016-12-20 | Bo Cui | Method of fabricating nano-scale structures and nano-scale structures fabricated using the method |
| KR102075985B1 (ko) * | 2013-10-14 | 2020-02-11 | 삼성전자주식회사 | 나노구조 반도체 발광소자 |
| FR3016081B1 (fr) * | 2013-12-27 | 2017-03-24 | Aledia | Dispositif optoelectronique a diodes electroluminescentes a courant de fuite reduit |
| KR102188497B1 (ko) * | 2014-03-27 | 2020-12-09 | 삼성전자주식회사 | 나노구조 반도체 발광소자 |
| KR102188494B1 (ko) * | 2014-07-21 | 2020-12-09 | 삼성전자주식회사 | 반도체 발광소자, 반도체 발광소자 제조방법 및 반도체 발광소자 패키지 제조방법 |
| EP3180806A4 (en) * | 2014-08-12 | 2018-03-07 | Glo Ab | Iii-nitride nanowire led with strain modified surface active region and method of making thereof |
| KR102227771B1 (ko) | 2014-08-25 | 2021-03-16 | 삼성전자주식회사 | 나노구조 반도체 발광소자 |
| KR102337405B1 (ko) * | 2014-09-05 | 2021-12-13 | 삼성전자주식회사 | 나노구조 반도체 발광소자 |
| US9620559B2 (en) * | 2014-09-26 | 2017-04-11 | Glo Ab | Monolithic image chip for near-to-eye display |
| FR3026564B1 (fr) * | 2014-09-30 | 2018-02-16 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Dispositif optoelectronique a elements semiconducteurs tridimensionnels |
| US10134591B2 (en) | 2014-10-07 | 2018-11-20 | Tandem Sun Ab | Method for manufacturing a semiconductor device |
| DE102014117995A1 (de) * | 2014-12-05 | 2016-06-09 | Osram Opto Semiconductors Gmbh | Halbleiterschichtenfolge zur Erzeugung von sichtbarem Licht und Leuchtdiode |
| US11322652B2 (en) * | 2015-12-14 | 2022-05-03 | Ostendo Technologies, Inc. | Methods for producing composite GaN nanocolumns and light emitting structures made from the methods |
| DE102016102876A1 (de) * | 2016-02-18 | 2017-08-24 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauelement und Verfahren zur Herstellung eines optoelektronischen Halbleiterbauelements |
| CN207396531U (zh) | 2017-01-31 | 2018-05-22 | 杭州探真纳米科技有限公司 | 一种悬臂末端纳米探针 |
| US10840223B2 (en) * | 2017-03-23 | 2020-11-17 | Intel Corporation | Augmented reality display systems with super-lambertian LED source |
| JP7007547B2 (ja) * | 2017-04-11 | 2022-01-24 | 日亜化学工業株式会社 | 発光素子の製造方法 |
| CN109103101B (zh) * | 2017-06-21 | 2020-09-29 | 清华大学 | 纳米微结构的制备方法 |
| CN109103090B (zh) * | 2017-06-21 | 2020-12-04 | 清华大学 | 纳米带的制备方法 |
| JP6947386B2 (ja) * | 2017-06-29 | 2021-10-13 | 学校法人 名城大学 | 半導体発光素子および半導体発光素子の製造方法 |
| KR102520379B1 (ko) | 2017-10-05 | 2023-04-10 | 헥사겜 아베 | 평면의 iii-n 반도체 층을 갖는 반도체 디바이스 및 제작 방법 |
| CN113646894B (zh) | 2018-08-24 | 2024-07-16 | 马修·哈滕斯维尔德 | 纳米线发光开关装置及其方法 |
| JP7348520B2 (ja) * | 2018-12-25 | 2023-09-21 | 日亜化学工業株式会社 | 発光装置及び表示装置 |
| JP7227463B2 (ja) | 2018-12-27 | 2023-02-22 | 日亜化学工業株式会社 | 発光素子及びその製造方法 |
| JP7176700B2 (ja) | 2020-07-31 | 2022-11-22 | セイコーエプソン株式会社 | 発光装置およびプロジェクター |
| JP7655502B2 (ja) | 2021-01-15 | 2025-04-02 | セイコーエプソン株式会社 | 発光装置およびプロジェクター |
| JP7136374B1 (ja) * | 2022-01-12 | 2022-09-13 | 信越半導体株式会社 | マイクロled構造体を有するウェーハ、マイクロled構造体を有するウェーハの製造方法およびマイクロled構造体を有する接合型半導体ウェーハの製造方法 |
| KR20230114631A (ko) | 2022-01-25 | 2023-08-01 | 삼성전자주식회사 | 나노 로드 발광 다이오드, 디스플레이 장치 및 제조 방법 |
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| KR20020049630A (ko) * | 2000-12-19 | 2002-06-26 | 임지순 | 전계방출 에미터 |
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| US7132677B2 (en) | 2004-02-13 | 2006-11-07 | Dongguk University | Super bright light emitting diode of nanorod array structure having InGaN quantum well and method for manufacturing the same |
| US7858996B2 (en) * | 2006-02-17 | 2010-12-28 | The Regents Of The University Of California | Method for growth of semipolar (Al,In,Ga,B)N optoelectronic devices |
| WO2007022359A2 (en) * | 2005-08-16 | 2007-02-22 | The Regents Of The University Of California | Vertical integrated silicon nanowire field effect transistors and methods of fabrication |
| US20070158661A1 (en) | 2006-01-12 | 2007-07-12 | Rutgers, The State University Of New Jersey | ZnO nanostructure-based light emitting device |
| JP5483887B2 (ja) | 2006-03-08 | 2014-05-07 | クナノ アーベー | Si上のエピタキシャルな半導体ナノワイヤの金属無しでの合成方法 |
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| WO2008140611A2 (en) | 2006-12-18 | 2008-11-20 | The Regents Of The University Of California | Nanowire array-based light emitting diodes and lasers |
| EP2095426A4 (en) | 2006-12-22 | 2012-10-10 | Qunano Ab | NANOELECTRONIC STRUCTURE AND PRODUCTION METHOD THEREOF |
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| EP2102899B1 (en) | 2007-01-12 | 2020-11-11 | QuNano AB | Nitride nanowires and method of producing such |
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| JP4814394B2 (ja) * | 2010-03-05 | 2011-11-16 | シャープ株式会社 | 発光装置の製造方法 |
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| KR20120040550A (ko) * | 2010-10-19 | 2012-04-27 | 삼성엘이디 주식회사 | 반도체 발광소자 및 그 제조방법 |
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| WO2012075461A1 (en) * | 2010-12-02 | 2012-06-07 | Nanocrystal Corporation | Defect-free group iii - nitride nanostructures and devices based on repetitive multiple step growth-etch sequence |
| US20120217474A1 (en) * | 2011-02-25 | 2012-08-30 | Agency For Science, Technology And Research | Photonic device and method of making the same |
| TW201246599A (en) * | 2011-05-06 | 2012-11-16 | Nanocrystal Asia Inc Taiwan | Semiconductor substrate and fabricating method thereof |
| DE112012003376T5 (de) | 2011-08-16 | 2014-06-12 | Brightedge Technologies, Inc. | Seitenberichterstattung |
| US8350249B1 (en) | 2011-09-26 | 2013-01-08 | Glo Ab | Coalesced nanowire structures with interstitial voids and method for manufacturing the same |
| US9035278B2 (en) * | 2011-09-26 | 2015-05-19 | Glo Ab | Coalesced nanowire structures with interstitial voids and method for manufacturing the same |
| CN104769732A (zh) * | 2012-09-18 | 2015-07-08 | Glo公司 | 纳米角锥体大小的光电子结构及其制造方法 |
| WO2014066371A1 (en) | 2012-10-26 | 2014-05-01 | Glo Ab | Nanowire sized opto-electronic structure and method for modifying selected portions of same |
| EP2912699B1 (en) | 2012-10-26 | 2019-12-18 | Glo Ab | Method for modifying selected portions of nanowire sized opto-electronic structure |
| EP2912700A4 (en) | 2012-10-26 | 2016-04-06 | Glo Ab | NANODRAHT LED STRUCTURE AND METHOD FOR THE PRODUCTION THEREOF |
-
2013
- 2013-10-22 EP EP13849611.2A patent/EP2912699B1/en active Active
- 2013-10-22 US US14/059,950 patent/US9166106B2/en active Active
- 2013-10-22 JP JP2015539716A patent/JP6293157B2/ja active Active
- 2013-10-22 WO PCT/US2013/066165 patent/WO2014066379A1/en not_active Ceased
- 2013-10-25 TW TW102138791A patent/TW201428999A/zh unknown
-
2015
- 2015-10-09 US US14/879,502 patent/US9722135B2/en active Active
-
2017
- 2017-06-27 US US15/634,583 patent/US10038115B2/en active Active
-
2018
- 2018-02-13 JP JP2018023304A patent/JP6486519B2/ja active Active
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