JP2016510943A5 - - Google Patents

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Publication number
JP2016510943A5
JP2016510943A5 JP2015548787A JP2015548787A JP2016510943A5 JP 2016510943 A5 JP2016510943 A5 JP 2016510943A5 JP 2015548787 A JP2015548787 A JP 2015548787A JP 2015548787 A JP2015548787 A JP 2015548787A JP 2016510943 A5 JP2016510943 A5 JP 2016510943A5
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JP
Japan
Prior art keywords
semiconductor nanowire
semiconductor
nanowire
insulating material
catalyst particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2015548787A
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English (en)
Japanese (ja)
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JP6254608B2 (ja
JP2016510943A (ja
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Publication date
Priority claimed from US13/723,413 external-priority patent/US9012883B2/en
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Publication of JP2016510943A publication Critical patent/JP2016510943A/ja
Publication of JP2016510943A5 publication Critical patent/JP2016510943A5/ja
Application granted granted Critical
Publication of JP6254608B2 publication Critical patent/JP6254608B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2015548787A 2012-12-21 2013-12-06 半導体ナノワイヤへの凹んだコンタクト Expired - Fee Related JP6254608B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/723,413 US9012883B2 (en) 2012-12-21 2012-12-21 Recessed contact to semiconductor nanowires
PCT/IB2013/003176 WO2014096962A2 (en) 2012-12-21 2013-12-06 Recessed contact to semiconductor nanowires

Publications (3)

Publication Number Publication Date
JP2016510943A JP2016510943A (ja) 2016-04-11
JP2016510943A5 true JP2016510943A5 (enExample) 2017-01-19
JP6254608B2 JP6254608B2 (ja) 2017-12-27

Family

ID=50973605

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015548787A Expired - Fee Related JP6254608B2 (ja) 2012-12-21 2013-12-06 半導体ナノワイヤへの凹んだコンタクト

Country Status (5)

Country Link
US (3) US9012883B2 (enExample)
EP (1) EP2936568B1 (enExample)
JP (1) JP6254608B2 (enExample)
CN (1) CN104995741B (enExample)
WO (1) WO2014096962A2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9012883B2 (en) 2012-12-21 2015-04-21 Sol Voltaics Ab Recessed contact to semiconductor nanowires
WO2016069831A1 (en) * 2014-10-30 2016-05-06 President And Fellows Of Harvard College Nanoscale wires with tip-localized junctions
US10692719B2 (en) * 2014-11-07 2020-06-23 Alignd Systems Ab Shell-enabled vertical alignment and precision-assembly of a close-packed colloidal crystal film
DE102015205230B4 (de) * 2015-03-23 2023-01-19 Universität Duisburg-Essen Verfahren zur Herstellung von Bauelementen aufweisend eine Schottky-Diode mittels Drucktechnik und Bauelement
KR101787435B1 (ko) * 2016-02-29 2017-10-19 피에스아이 주식회사 나노 로드 제조방법
EP3260414A1 (en) 2016-06-21 2017-12-27 Sol Voltaics AB Method for transferring nanowires from a fluid to a substrate surface
FR3064109B1 (fr) * 2017-03-20 2025-03-14 Commissariat Energie Atomique Structure a nanofils et procede de realisation d'une telle structure
KR101919487B1 (ko) * 2017-09-14 2018-11-19 한국과학기술연구원 반도체 기판을 텍스쳐링하는 방법과, 이 방법에 의해 제조된 반도체 기판, 그리고, 이러한 반도체 기판을 포함하는 태양 전지
JP7371366B2 (ja) * 2019-06-27 2023-10-31 富士通株式会社 半導体デバイス、及びこれを用いた無線受信器
US11101744B2 (en) * 2019-12-27 2021-08-24 Michael Junior Spruill Capacitive engine featuring an extrinsic semiconductor
CN111180554B (zh) * 2020-01-08 2023-01-03 燕山大学 一种混合结构太阳能电池的制备方法
CN115428166A (zh) * 2020-04-15 2022-12-02 富士通株式会社 半导体装置、储层计算系统以及半导体装置的制造方法
US11094846B1 (en) * 2020-08-31 2021-08-17 4233999 Canada Inc. Monolithic nanocolumn structures

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JP3870459B2 (ja) * 1996-10-28 2007-01-17 ソニー株式会社 量子細線の製造方法
JP4235440B2 (ja) 2002-12-13 2009-03-11 キヤノン株式会社 半導体デバイスアレイ及びその製造方法
US6933222B2 (en) * 2003-01-02 2005-08-23 Intel Corporation Microcircuit fabrication and interconnection
US20060207647A1 (en) 2005-03-16 2006-09-21 General Electric Company High efficiency inorganic nanorod-enhanced photovoltaic devices
US7230286B2 (en) * 2005-05-23 2007-06-12 International Business Machines Corporation Vertical FET with nanowire channels and a silicided bottom contact
EP1804286A1 (en) 2005-12-27 2007-07-04 Interuniversitair Microelektronica Centrum Elongate nanostructure semiconductor device
KR100721020B1 (ko) * 2006-01-20 2007-05-23 삼성전자주식회사 콘택 구조체를 포함하는 반도체 소자 및 그 형성 방법
DE102006013245A1 (de) * 2006-03-22 2007-10-04 Infineon Technologies Ag Verfahren zur Ausbildung von Öffnungen in einer Matrizenschicht und zur Herstellung von Kondensatoren
AU2008264257A1 (en) * 2007-06-19 2008-12-24 Qunano Ab Nanowire-based solar cell structure
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JP2010533985A (ja) * 2007-07-19 2010-10-28 カリフォルニア インスティテュート オブ テクノロジー 半導体の規則配列構造
EP2019313B1 (en) * 2007-07-25 2015-09-16 Stichting IMEC Nederland Sensor device comprising elongated nanostructures, its use and manufacturing method
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US7906354B1 (en) * 2010-03-30 2011-03-15 Eastman Kodak Company Light emitting nanowire device
JP6313975B2 (ja) 2010-05-11 2018-04-18 クナノ・アーベー ワイヤーの気相合成
CN102959740B (zh) 2010-09-14 2018-08-03 原子能与替代能源委员会 用于光发射的基于纳米线的光电器件
GB201015411D0 (en) 2010-09-15 2010-10-27 Univ Leuven Kath Anti-cancer activity of novel bicyclic heterocycles
WO2013126432A1 (en) * 2012-02-21 2013-08-29 California Institute Of Technology Axially-integrated epitaxially-grown tandem wire arrays
US9012883B2 (en) 2012-12-21 2015-04-21 Sol Voltaics Ab Recessed contact to semiconductor nanowires

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