JP2016510943A5 - - Google Patents
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- Publication number
- JP2016510943A5 JP2016510943A5 JP2015548787A JP2015548787A JP2016510943A5 JP 2016510943 A5 JP2016510943 A5 JP 2016510943A5 JP 2015548787 A JP2015548787 A JP 2015548787A JP 2015548787 A JP2015548787 A JP 2015548787A JP 2016510943 A5 JP2016510943 A5 JP 2016510943A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor nanowire
- semiconductor
- nanowire
- insulating material
- catalyst particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 53
- 239000002070 nanowire Substances 0.000 claims 51
- 239000011810 insulating material Substances 0.000 claims 11
- 239000003054 catalyst Substances 0.000 claims 8
- 239000002245 particle Substances 0.000 claims 8
- 238000000034 method Methods 0.000 claims 6
- 239000003989 dielectric material Substances 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000011159 matrix material Substances 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/723,413 US9012883B2 (en) | 2012-12-21 | 2012-12-21 | Recessed contact to semiconductor nanowires |
| PCT/IB2013/003176 WO2014096962A2 (en) | 2012-12-21 | 2013-12-06 | Recessed contact to semiconductor nanowires |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016510943A JP2016510943A (ja) | 2016-04-11 |
| JP2016510943A5 true JP2016510943A5 (enExample) | 2017-01-19 |
| JP6254608B2 JP6254608B2 (ja) | 2017-12-27 |
Family
ID=50973605
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015548787A Expired - Fee Related JP6254608B2 (ja) | 2012-12-21 | 2013-12-06 | 半導体ナノワイヤへの凹んだコンタクト |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US9012883B2 (enExample) |
| EP (1) | EP2936568B1 (enExample) |
| JP (1) | JP6254608B2 (enExample) |
| CN (1) | CN104995741B (enExample) |
| WO (1) | WO2014096962A2 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9012883B2 (en) | 2012-12-21 | 2015-04-21 | Sol Voltaics Ab | Recessed contact to semiconductor nanowires |
| WO2016069831A1 (en) * | 2014-10-30 | 2016-05-06 | President And Fellows Of Harvard College | Nanoscale wires with tip-localized junctions |
| WO2016071762A1 (en) * | 2014-11-07 | 2016-05-12 | Sol Voltaics Ab | Shell-enabled vertical alignment and precision-assembly of a close-packed colloidal crystal film |
| DE102015205230B4 (de) * | 2015-03-23 | 2023-01-19 | Universität Duisburg-Essen | Verfahren zur Herstellung von Bauelementen aufweisend eine Schottky-Diode mittels Drucktechnik und Bauelement |
| KR101787435B1 (ko) * | 2016-02-29 | 2017-10-19 | 피에스아이 주식회사 | 나노 로드 제조방법 |
| EP3260414A1 (en) | 2016-06-21 | 2017-12-27 | Sol Voltaics AB | Method for transferring nanowires from a fluid to a substrate surface |
| FR3064109B1 (fr) * | 2017-03-20 | 2025-03-14 | Commissariat Energie Atomique | Structure a nanofils et procede de realisation d'une telle structure |
| KR101919487B1 (ko) * | 2017-09-14 | 2018-11-19 | 한국과학기술연구원 | 반도체 기판을 텍스쳐링하는 방법과, 이 방법에 의해 제조된 반도체 기판, 그리고, 이러한 반도체 기판을 포함하는 태양 전지 |
| JP7371366B2 (ja) * | 2019-06-27 | 2023-10-31 | 富士通株式会社 | 半導体デバイス、及びこれを用いた無線受信器 |
| US11101744B2 (en) * | 2019-12-27 | 2021-08-24 | Michael Junior Spruill | Capacitive engine featuring an extrinsic semiconductor |
| CN111180554B (zh) * | 2020-01-08 | 2023-01-03 | 燕山大学 | 一种混合结构太阳能电池的制备方法 |
| EP4138141A4 (en) * | 2020-04-15 | 2023-06-07 | Fujitsu Limited | SEMICONDUCTOR DEVICE, RESERVOIR COMPUTER SYSTEM AND METHOD OF MAKING A SEMICONDUCTOR DEVICE |
| US11094846B1 (en) * | 2020-08-31 | 2021-08-17 | 4233999 Canada Inc. | Monolithic nanocolumn structures |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3870459B2 (ja) * | 1996-10-28 | 2007-01-17 | ソニー株式会社 | 量子細線の製造方法 |
| JP4235440B2 (ja) | 2002-12-13 | 2009-03-11 | キヤノン株式会社 | 半導体デバイスアレイ及びその製造方法 |
| US6933222B2 (en) * | 2003-01-02 | 2005-08-23 | Intel Corporation | Microcircuit fabrication and interconnection |
| US20060207647A1 (en) | 2005-03-16 | 2006-09-21 | General Electric Company | High efficiency inorganic nanorod-enhanced photovoltaic devices |
| US7230286B2 (en) * | 2005-05-23 | 2007-06-12 | International Business Machines Corporation | Vertical FET with nanowire channels and a silicided bottom contact |
| EP1804286A1 (en) | 2005-12-27 | 2007-07-04 | Interuniversitair Microelektronica Centrum | Elongate nanostructure semiconductor device |
| KR100721020B1 (ko) * | 2006-01-20 | 2007-05-23 | 삼성전자주식회사 | 콘택 구조체를 포함하는 반도체 소자 및 그 형성 방법 |
| DE102006013245A1 (de) * | 2006-03-22 | 2007-10-04 | Infineon Technologies Ag | Verfahren zur Ausbildung von Öffnungen in einer Matrizenschicht und zur Herstellung von Kondensatoren |
| WO2008156421A2 (en) * | 2007-06-19 | 2008-12-24 | Qunano Ab | Nanowire-based solar cell structure |
| US20080315430A1 (en) * | 2007-06-22 | 2008-12-25 | Qimonda Ag | Nanowire vias |
| CN101842909A (zh) * | 2007-07-19 | 2010-09-22 | 加利福尼亚技术学院 | 半导体的有序阵列结构 |
| EP2019313B1 (en) * | 2007-07-25 | 2015-09-16 | Stichting IMEC Nederland | Sensor device comprising elongated nanostructures, its use and manufacturing method |
| JP2010538464A (ja) * | 2007-08-28 | 2010-12-09 | カリフォルニア インスティテュート オブ テクノロジー | ポリマ埋め込み型半導体ロッドアレイ |
| KR20090058952A (ko) * | 2007-12-05 | 2009-06-10 | 삼성전자주식회사 | 나노로드를 이용한 발광소자 및 그 제조 방법 |
| WO2010120233A2 (en) * | 2009-04-15 | 2010-10-21 | Sol Voltaics Ab | Multi-junction photovoltaic cell with nanowires |
| US8698254B2 (en) * | 2009-09-30 | 2014-04-15 | National University Corporation Hokkaido University | Tunnel field effect transistor and method for manufacturing same |
| US9305766B2 (en) | 2009-12-22 | 2016-04-05 | Qunano Ab | Method for manufacturing a nanowire structure |
| JP2011187901A (ja) * | 2010-03-11 | 2011-09-22 | Canon Inc | 半導体デバイスの製造方法 |
| US7906354B1 (en) * | 2010-03-30 | 2011-03-15 | Eastman Kodak Company | Light emitting nanowire device |
| WO2011142717A1 (en) | 2010-05-11 | 2011-11-17 | Qunano Ab | Gas-phase synthesis of wires |
| WO2012035243A1 (fr) | 2010-09-14 | 2012-03-22 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Dispositif optoelectronique a base de nanofils pour l'émission de lumière |
| GB201015411D0 (en) | 2010-09-15 | 2010-10-27 | Univ Leuven Kath | Anti-cancer activity of novel bicyclic heterocycles |
| WO2013126432A1 (en) * | 2012-02-21 | 2013-08-29 | California Institute Of Technology | Axially-integrated epitaxially-grown tandem wire arrays |
| US9012883B2 (en) | 2012-12-21 | 2015-04-21 | Sol Voltaics Ab | Recessed contact to semiconductor nanowires |
-
2012
- 2012-12-21 US US13/723,413 patent/US9012883B2/en not_active Expired - Fee Related
-
2013
- 2013-12-06 EP EP13865741.6A patent/EP2936568B1/en not_active Not-in-force
- 2013-12-06 WO PCT/IB2013/003176 patent/WO2014096962A2/en not_active Ceased
- 2013-12-06 CN CN201380073253.5A patent/CN104995741B/zh not_active Expired - Fee Related
- 2013-12-06 JP JP2015548787A patent/JP6254608B2/ja not_active Expired - Fee Related
-
2015
- 2015-03-27 US US14/671,666 patent/US9419086B2/en active Active
-
2016
- 2016-07-28 US US15/221,811 patent/US9818830B2/en not_active Expired - Fee Related
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