JP2018060879A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP2018060879A JP2018060879A JP2016196234A JP2016196234A JP2018060879A JP 2018060879 A JP2018060879 A JP 2018060879A JP 2016196234 A JP2016196234 A JP 2016196234A JP 2016196234 A JP2016196234 A JP 2016196234A JP 2018060879 A JP2018060879 A JP 2018060879A
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- Prior art keywords
- semiconductor device
- film
- conductive film
- recesses
- opening
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- 238000009792 diffusion process Methods 0.000 description 4
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- 239000012535 impurity Substances 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
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- 229920005591 polysilicon Polymers 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
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- 229910018125 Al-Si Inorganic materials 0.000 description 1
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- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- HIVGXUNKSAJJDN-UHFFFAOYSA-N [Si].[P] Chemical compound [Si].[P] HIVGXUNKSAJJDN-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
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- 239000002344 surface layer Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
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- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
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Abstract
【解決手段】半導体装置は、半導体基板と、半導体基板の表面を覆い、互いに平行に配置された複数の凹部を表面に有する導電膜と、複数の凹部に対して0°よりも大であり且つ90°よりも小である角度をなす辺を備えた開口部において導電膜を部分的に露出させるように導電膜の表面を覆う保護膜と、を含む。
【選択図】図6A
Description
図6Aは、本発明の第1の実施形態に係る半導体装置1の構成を示す平面図であり、図6Bは、図6Aにおいて破線で囲む領域Bの拡大図である。半導体装置1は、保護膜40の開口部41の形状が、比較例に係る半導体装置1Xと異なり、それ以外の構成は、比較例に係る半導体装置1Xと同様である。すなわち、半導体装置1は、一例としてパワーMOSFETを構成するものであり、その断面構造は、図1Bに示される比較例に係る半導体装置1Xと同様である。また、半導体装置1において、保護膜40を形成する方法は、比較例に係る半導体装置1Xと同様であり、ポリイミド膜40aの表面にレジスト膜50を形成し、レジスト膜50を部分的に露光する工程(図2A参照)、レジスト膜50を現像し、ポリイミド膜40aをハーフエッチングする工程(図2B参照)、ポリイミド膜40aをジャストエッチングする工程(図2C参照)、ポリイミド膜40aをオーバーエッチングする工程(図2D参照)、レジスト膜50を除去し、ポリイミド膜40aを熱硬化する工程(図2E参照)を含む。なお、図6Aおよび図6Bにおいて、導電膜30の図示が省略されているが、導電膜30は、ゲート20を覆うように半導体基板10の表面に形成されている。また、導電膜30の表面に形成される凹部31は、互いに隣接するゲート20同士の間に対応する位置に形成され、ゲート20の伸びる方向と平行な方向に伸びている。また、図6Aおよび図6Bにおいて、保護膜40については、開口部41の外縁である開口端41Eのみが示されているが、保護膜40は、比較例に係る半導体装置1Xと同様、開口部41において導電膜30を部分的に露出させるように導電膜30の表面を覆っている。
図7Aは、本発明の第2の実施形態に係る半導体装置1Aの構成を示す平面図であり、図7Bは、図7Aにおいて破線で囲む領域Cの拡大図である。半導体装置1Aは、保護膜40の開口部41の形状が、比較例に係る半導体装置1Xおよび第1の実施形態に係る半導体装置1と異なり、それ以外の構成は、比較例に係る半導体装置1Xおよび第1の実施形態に係る半導体装置1と同様である。また、半導体装置1Aにおいて、保護膜40を形成する方法は、上記した比較例に係る半導体装置1Xおよび第1の実施形態に係る半導体装置1と同様である。なお、図7Aおよび図7Bにおいて、導電膜30の図示が省略されているが、導電膜30は、ゲート20を覆うように半導体基板10の表面に形成されている。また、導電膜30の表面に形成される凹部31は、互いに隣接するゲート20同士の間に対応する位置に形成され、ゲート20の伸びる方向と平行な方向に伸びている。また、図7Aおよび図7Bにおいて、保護膜40については、開口部41の外縁である開口端41Eのみが示されているが、保護膜40は、比較例に係る半導体装置1Xと同様、開口部41において導電膜30を部分的に露出させるように導電膜30の表面を覆っている。
図8Aは、本発明の第3の実施形態に係る半導体装置1Bの構成を示す平面図であり、図8Bは、図8Aにおいて破線で囲む領域Dの拡大図である。半導体装置1Bは、保護膜40の開口部41の形状が、比較例に係る半導体装置1Xおよび第1の実施形態に係る半導体装置1と異なり、それ以外の構成は、比較例に係る半導体装置1Xおよび第1の実施形態に係る半導体装置1と同様である。また、半導体装置1Bにおいて、保護膜40を形成する方法は、上記した比較例に係る半導体装置1Xおよび第1の実施形態に係る半導体装置1と同様である。なお、図8Aおよび図8Bにおいて、導電膜30の図示が省略されているが、導電膜30は、ゲート20を覆うように半導体基板10の表面に形成されている。また、導電膜30の凹部31は、互いに隣接するゲート20同士の間に対応する位置に形成され、ゲート20の伸びる方向と平行な方向に伸びている。また、図8Aおよび図8Bにおいて、保護膜40については、開口部41の外縁である開口端41Eのみが示されているが、保護膜40は、比較例に係る半導体装置1Xと同様、開口部41において導電膜30を部分的に露出させるように導電膜30の表面を覆っている。
図10Aは、本発明の第4の実施形態に係る半導体装置1Cの構成を示す平面図であり、図10Bは、図10Aにおいて破線で囲む領域Eの拡大図である。半導体装置1Cは、保護膜40の開口部41の形状が、比較例に係る半導体装置1Xおよび第1の実施形態に係る半導体装置1と異なり、それ以外の構成は、比較例に係る半導体装置1Xおよび第1の実施形態に係る半導体装置1と同様である。また、半導体装置1Cにおいて、保護膜40を形成する方法は、上記した比較例に係る半導体装置1Xおよび第1の実施形態に係る半導体装置1と同様である。なお、図10Aおよび図10Bにおいて、導電膜30の図示が省略されているが、導電膜30は、ゲート20を覆うように半導体基板10の表面に形成されている。また、導電膜30の凹部31は、互いに隣接するゲート20同士の間に対応する位置に形成され、ゲート20の伸びる方向と平行な方向に伸びている。また、図10Aおよび図10Bにおいて、保護膜40については、開口部41の外縁である開口端41Eのみが示されているが、保護膜40は、比較例に係る半導体装置1Xと同様、開口部41において導電膜30を部分的に露出させるように導電膜30の表面を覆っている。
10 半導体基板
11 基板層
12 エピタキシャル層
20 ゲート
30 導電膜
31 凹部
40 保護膜
41 開口部
41E 開口端
42 残渣
Claims (11)
- 半導体基板と、
前記半導体基板の表面を覆い、互いに平行に配置された直線状の複数の凹部を表面に有する導電膜と、
前記導電膜の表面を覆い、前記複数の凹部に対して0°よりも大であり且つ90°よりも小である角度をなす辺を備え且つ前記導電膜を部分的に露出させる開口部を有する保護膜と、
を含む半導体装置。 - 前記開口部の形状は、前記複数の凹部に対して0°よりも大であり且つ90°よりも小である角度をなす互いに対向する2辺と、前記複数の凹部に対して垂直な互いに対向する他の2辺と、を有する四角形である
請求項1に記載の半導体装置。 - 前記開口部の形状は、前記複数の凹部に対して0°よりも大であり且つ90°よりも小である角度をなす互いに対向する2辺と、前記複数の凹部に対して0°よりも大であり且つ90°よりも小である角度をなす他の2辺と、を有する四角形である
請求項2に記載の半導体装置。 - 前記開口部は、前記複数の凹部の少なくとも1つと繰り返し交差するように蛇行しつつ前記複数の凹部に沿った辺を備えている
請求項1に記載の半導体装置。 - 前記開口部の蛇行した辺は、前記複数の凹部に対して0°よりも大であり且つ90°よりも小である角度をなす複数の辺からなるジグザグパターンを有する
請求項4に記載の半導体装置。 - 半導体基板と、
前記半導体基板の表面を覆い、互いに平行に配置された直線状の複数の凹部を表面に有する導電膜と、
前記導電膜の表面を覆い、前記複数の凹部の少なくとも1つと繰り返し交差するように蛇行しつつ前記複数の凹部に沿った辺を備えた開口部を有する保護膜と、
を含む半導体装置。 - 前記開口部の蛇行した辺は、前記複数の凹部と平行な第1の部分と、一端が前記第1の部分に接続され且つ前記開口部の内側に向かう前記複数の凹部と垂直な第2の部分と、一端が前記第2の部分の他端に接続され且つ前記複数の凹部と平行な第3の部分と、一端が前記第3の部分に接続され且つ前記開口部の外側に向かう前記複数の凹部と垂直な第4の部分と、からなる単位パターンを繰り返して構成される凹凸パターンを有する
請求項6に記載の半導体装置。 - 前記半導体基板の表面に設けられて、各々が前記複数の凹部に沿った直線状であり且つ前記導電膜で覆われた複数の構造物を更に含み、
前記複数の凹部は、前記複数の構造物によって前記半導体基板の表面に形成される凹凸に起因して形成される
請求項1から請求項7のいずれか1項に記載の半導体装置。 - 前記複数の構造物は、前記半導体基板に形成されたトランジスタのゲートである
請求項8に記載の半導体装置。 - 前記半導体基板は、基板層と、前記基板層に積層されたエピタキシャル層と、を含んで構成されている
請求項1から請求項9のいずれか1項に記載の半導体装置。 - 前記半導体基板の前記導電膜で覆われた面とは反対側の面に、裏面電極が設けられている
請求項1から請求項10のいずれか1項に記載の半導体装置。
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