JP2017506363A5 - - Google Patents

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Publication number
JP2017506363A5
JP2017506363A5 JP2016549378A JP2016549378A JP2017506363A5 JP 2017506363 A5 JP2017506363 A5 JP 2017506363A5 JP 2016549378 A JP2016549378 A JP 2016549378A JP 2016549378 A JP2016549378 A JP 2016549378A JP 2017506363 A5 JP2017506363 A5 JP 2017506363A5
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JP
Japan
Prior art keywords
substrate
mirror element
layer
mirror
layer stack
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JP2016549378A
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English (en)
Japanese (ja)
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JP2017506363A (ja
JP6550066B2 (ja
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Priority claimed from DE102014201622.3A external-priority patent/DE102014201622A1/de
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Publication of JP2017506363A5 publication Critical patent/JP2017506363A5/ja
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Publication of JP6550066B2 publication Critical patent/JP6550066B2/ja
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JP2016549378A 2014-01-30 2015-01-29 ミラー素子を製造する方法 Active JP6550066B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014201622.3A DE102014201622A1 (de) 2014-01-30 2014-01-30 Verfahren zum Herstellen eines Spiegelelements
DE102014201622.3 2014-01-30
PCT/EP2015/051791 WO2015114043A1 (de) 2014-01-30 2015-01-29 Verfahren zum herstellen eines spiegelelements

Publications (3)

Publication Number Publication Date
JP2017506363A JP2017506363A (ja) 2017-03-02
JP2017506363A5 true JP2017506363A5 (enExample) 2018-03-08
JP6550066B2 JP6550066B2 (ja) 2019-07-24

Family

ID=52574101

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016549378A Active JP6550066B2 (ja) 2014-01-30 2015-01-29 ミラー素子を製造する方法

Country Status (6)

Country Link
US (1) US10423073B2 (enExample)
EP (1) EP3100083B1 (enExample)
JP (1) JP6550066B2 (enExample)
CN (1) CN105917255B (enExample)
DE (1) DE102014201622A1 (enExample)
WO (1) WO2015114043A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015225510A1 (de) * 2015-12-16 2017-01-12 Carl Zeiss Smt Gmbh Spiegelelement, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
FR3065536B1 (fr) * 2017-04-20 2019-07-12 Alpao Miroir deformable a courbure variable et procede de fabrication d'un miroir associe
CN107143756B (zh) * 2017-06-14 2020-05-08 上海安茗科技中心(有限合伙) 灯具
DE102019202222B4 (de) * 2019-02-19 2023-08-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Ablenkspiegel aus Diamant sowie Verfahren zur Herstellung
EP3703114A1 (en) * 2019-02-26 2020-09-02 ASML Netherlands B.V. Reflector manufacturing method and associated reflector
DE102023200603A1 (de) 2023-01-26 2024-08-01 Carl Zeiss Smt Gmbh Verfahren zum Herstellen einer Spiegelanordnung, sowie Beschichtungsanlage
DE102023205340A1 (de) 2023-06-07 2024-12-12 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines optischen Elements, sowie optisches Element und Beschichtungsanlage
DE102023206689A1 (de) 2023-07-13 2025-01-16 Carl Zeiss Smt Gmbh Aktuierbare Spiegel-Baugruppe
DE102023210486A1 (de) * 2023-10-24 2025-04-24 Carl Zeiss Smt Gmbh Optisches Element und EUV-Lithographiesystem
JP7519150B1 (ja) * 2024-04-11 2024-07-19 合同会社北海道環境・エネルギー研究所 柱面体作製方法及びその作製方法を用いて作製された柱面体
DE102024205025A1 (de) * 2024-05-29 2025-12-04 Carl Zeiss Smt Gmbh Mikro-elektro-mechanisch bewegbares Element und System

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JPH06186418A (ja) * 1992-06-30 1994-07-08 Victor Co Of Japan Ltd ダイクロイックミラーの製造方法
JPH09197124A (ja) * 1996-01-23 1997-07-31 Nippon Electric Glass Co Ltd ダイクロイックミラー
US6011646A (en) * 1998-02-20 2000-01-04 The Regents Of The Unviersity Of California Method to adjust multilayer film stress induced deformation of optics
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DE102008009600A1 (de) 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie
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JP5525550B2 (ja) * 2009-03-06 2014-06-18 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ用の照明光学系及び光学系
DE102009033511A1 (de) 2009-07-15 2011-01-20 Carl Zeiss Smt Ag Mikrospiegelanordnung mit Anti-Reflexbeschichtung sowie Verfahren zu deren Herstellung
CN102565901B (zh) 2010-12-17 2014-06-04 北京兆阳光热技术有限公司 一种曲面反射镜及其制造方法
DE102011003357A1 (de) 2011-01-31 2012-08-02 Carl Zeiss Smt Gmbh Spiegel für den EUV-Wellenlängenbereich, Herstellungsverfahren für einen solchen Spiegel, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv
CN102759765B (zh) * 2011-04-28 2014-11-05 北京兆阳光热技术有限公司 一种曲面反射镜及其制造方法
DE102011084117A1 (de) * 2011-10-07 2013-04-11 Carl Zeiss Smt Gmbh Reflektives optisches Element für den EUV-Wellenlängenbereich, Verfahren zur Erzeugung und zur Korrektur eines solchen Elements, Projektionsobjektiv für die Mikrolithographie mit einem solchen Element und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv
WO2013077430A1 (ja) * 2011-11-25 2013-05-30 旭硝子株式会社 Ｅｕｖリソグラフィ用反射型マスクブランクおよびその製造方法

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