JP6550066B2 - ミラー素子を製造する方法 - Google Patents

ミラー素子を製造する方法 Download PDF

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Publication number
JP6550066B2
JP6550066B2 JP2016549378A JP2016549378A JP6550066B2 JP 6550066 B2 JP6550066 B2 JP 6550066B2 JP 2016549378 A JP2016549378 A JP 2016549378A JP 2016549378 A JP2016549378 A JP 2016549378A JP 6550066 B2 JP6550066 B2 JP 6550066B2
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substrate
mirror element
mirror
layer
curvature
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JP2017506363A (ja
JP2017506363A5 (enExample
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エンキッシュ ハルトムット
エンキッシュ ハルトムット
フーベル ペーター
フーベル ペーター
シュトローベル セバスチャン
シュトローベル セバスチャン
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/10—Mirrors with curved faces
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2016549378A 2014-01-30 2015-01-29 ミラー素子を製造する方法 Active JP6550066B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014201622.3A DE102014201622A1 (de) 2014-01-30 2014-01-30 Verfahren zum Herstellen eines Spiegelelements
DE102014201622.3 2014-01-30
PCT/EP2015/051791 WO2015114043A1 (de) 2014-01-30 2015-01-29 Verfahren zum herstellen eines spiegelelements

Publications (3)

Publication Number Publication Date
JP2017506363A JP2017506363A (ja) 2017-03-02
JP2017506363A5 JP2017506363A5 (enExample) 2018-03-08
JP6550066B2 true JP6550066B2 (ja) 2019-07-24

Family

ID=52574101

Family Applications (1)

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JP2016549378A Active JP6550066B2 (ja) 2014-01-30 2015-01-29 ミラー素子を製造する方法

Country Status (6)

Country Link
US (1) US10423073B2 (enExample)
EP (1) EP3100083B1 (enExample)
JP (1) JP6550066B2 (enExample)
CN (1) CN105917255B (enExample)
DE (1) DE102014201622A1 (enExample)
WO (1) WO2015114043A1 (enExample)

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DE102019202222B4 (de) * 2019-02-19 2023-08-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Ablenkspiegel aus Diamant sowie Verfahren zur Herstellung
EP3703114A1 (en) * 2019-02-26 2020-09-02 ASML Netherlands B.V. Reflector manufacturing method and associated reflector
DE102023200603A1 (de) 2023-01-26 2024-08-01 Carl Zeiss Smt Gmbh Verfahren zum Herstellen einer Spiegelanordnung, sowie Beschichtungsanlage
DE102023205340A1 (de) 2023-06-07 2024-12-12 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines optischen Elements, sowie optisches Element und Beschichtungsanlage
DE102023206689A1 (de) 2023-07-13 2025-01-16 Carl Zeiss Smt Gmbh Aktuierbare Spiegel-Baugruppe
DE102023210486A1 (de) * 2023-10-24 2025-04-24 Carl Zeiss Smt Gmbh Optisches Element und EUV-Lithographiesystem
JP7519150B1 (ja) * 2024-04-11 2024-07-19 合同会社北海道環境・エネルギー研究所 柱面体作製方法及びその作製方法を用いて作製された柱面体
DE102024205025A1 (de) * 2024-05-29 2025-12-04 Carl Zeiss Smt Gmbh Mikro-elektro-mechanisch bewegbares Element und System

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Also Published As

Publication number Publication date
CN105917255A (zh) 2016-08-31
CN105917255B (zh) 2019-10-25
DE102014201622A1 (de) 2015-08-20
EP3100083B1 (de) 2019-08-14
JP2017506363A (ja) 2017-03-02
US10423073B2 (en) 2019-09-24
EP3100083A1 (de) 2016-12-07
WO2015114043A1 (de) 2015-08-06
US20160342093A1 (en) 2016-11-24

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