DE102014201622A1 - Verfahren zum Herstellen eines Spiegelelements - Google Patents
Verfahren zum Herstellen eines Spiegelelements Download PDFInfo
- Publication number
- DE102014201622A1 DE102014201622A1 DE102014201622.3A DE102014201622A DE102014201622A1 DE 102014201622 A1 DE102014201622 A1 DE 102014201622A1 DE 102014201622 A DE102014201622 A DE 102014201622A DE 102014201622 A1 DE102014201622 A1 DE 102014201622A1
- Authority
- DE
- Germany
- Prior art keywords
- mirror
- layer stack
- mirror element
- curvature
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 19
- 239000000758 substrate Substances 0.000 claims abstract description 60
- 238000000034 method Methods 0.000 claims abstract description 31
- 238000005452 bending Methods 0.000 claims abstract description 16
- 238000011282 treatment Methods 0.000 claims description 13
- 230000015572 biosynthetic process Effects 0.000 claims description 8
- 238000005286 illumination Methods 0.000 claims description 8
- 210000001747 pupil Anatomy 0.000 claims description 8
- 230000003287 optical effect Effects 0.000 claims description 7
- 230000001939 inductive effect Effects 0.000 claims description 3
- 238000000137 annealing Methods 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000002131 composite material Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 81
- 238000000576 coating method Methods 0.000 description 20
- 239000011248 coating agent Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 5
- 230000001965 increasing effect Effects 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000001393 microlithography Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910005542 GaSb Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000006094 Zerodur Substances 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000006735 deficit Effects 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- VTGARNNDLOTBET-UHFFFAOYSA-N gallium antimonide Chemical compound [Sb]#[Ga] VTGARNNDLOTBET-UHFFFAOYSA-N 0.000 description 1
- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 1
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- GALOTNBSUVEISR-UHFFFAOYSA-N molybdenum;silicon Chemical compound [Mo]#[Si] GALOTNBSUVEISR-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000013598 vector Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/10—Mirrors with curved faces
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102014201622.3A DE102014201622A1 (de) | 2014-01-30 | 2014-01-30 | Verfahren zum Herstellen eines Spiegelelements |
| CN201580004334.9A CN105917255B (zh) | 2014-01-30 | 2015-01-29 | 制造反射镜元件的方法 |
| PCT/EP2015/051791 WO2015114043A1 (de) | 2014-01-30 | 2015-01-29 | Verfahren zum herstellen eines spiegelelements |
| JP2016549378A JP6550066B2 (ja) | 2014-01-30 | 2015-01-29 | ミラー素子を製造する方法 |
| EP15705920.5A EP3100083B1 (de) | 2014-01-30 | 2015-01-29 | Verfahren zum herstellen eines spiegelelements |
| US15/225,328 US10423073B2 (en) | 2014-01-30 | 2016-08-01 | Method for producing a mirror element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102014201622.3A DE102014201622A1 (de) | 2014-01-30 | 2014-01-30 | Verfahren zum Herstellen eines Spiegelelements |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102014201622A1 true DE102014201622A1 (de) | 2015-08-20 |
Family
ID=52574101
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102014201622.3A Ceased DE102014201622A1 (de) | 2014-01-30 | 2014-01-30 | Verfahren zum Herstellen eines Spiegelelements |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10423073B2 (enExample) |
| EP (1) | EP3100083B1 (enExample) |
| JP (1) | JP6550066B2 (enExample) |
| CN (1) | CN105917255B (enExample) |
| DE (1) | DE102014201622A1 (enExample) |
| WO (1) | WO2015114043A1 (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102015225510A1 (de) * | 2015-12-16 | 2017-01-12 | Carl Zeiss Smt Gmbh | Spiegelelement, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
| DE102019202222A1 (de) * | 2019-02-19 | 2020-08-20 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Ablenkspiegel aus Diamant sowie Verfahren zur Herstellung |
| DE102023206689A1 (de) | 2023-07-13 | 2025-01-16 | Carl Zeiss Smt Gmbh | Aktuierbare Spiegel-Baugruppe |
| WO2025087653A1 (de) * | 2023-10-24 | 2025-05-01 | Carl Zeiss Smt Gmbh | Optisches element und euv-lithographiesystem |
| DE102024205025A1 (de) * | 2024-05-29 | 2025-12-04 | Carl Zeiss Smt Gmbh | Mikro-elektro-mechanisch bewegbares Element und System |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR3065536B1 (fr) * | 2017-04-20 | 2019-07-12 | Alpao | Miroir deformable a courbure variable et procede de fabrication d'un miroir associe |
| CN107143756B (zh) * | 2017-06-14 | 2020-05-08 | 上海安茗科技中心(有限合伙) | 灯具 |
| EP3703114A1 (en) * | 2019-02-26 | 2020-09-02 | ASML Netherlands B.V. | Reflector manufacturing method and associated reflector |
| DE102023200603A1 (de) | 2023-01-26 | 2024-08-01 | Carl Zeiss Smt Gmbh | Verfahren zum Herstellen einer Spiegelanordnung, sowie Beschichtungsanlage |
| DE102023205340A1 (de) | 2023-06-07 | 2024-12-12 | Carl Zeiss Smt Gmbh | Verfahren zum Herstellen eines optischen Elements, sowie optisches Element und Beschichtungsanlage |
| JP7519150B1 (ja) * | 2024-04-11 | 2024-07-19 | 合同会社北海道環境・エネルギー研究所 | 柱面体作製方法及びその作製方法を用いて作製された柱面体 |
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| JPH06186418A (ja) * | 1992-06-30 | 1994-07-08 | Victor Co Of Japan Ltd | ダイクロイックミラーの製造方法 |
| US6011646A (en) | 1998-02-20 | 2000-01-04 | The Regents Of The Unviersity Of California | Method to adjust multilayer film stress induced deformation of optics |
| WO2004029692A2 (en) | 2002-09-25 | 2004-04-08 | Rosemount Aerospace Inc. | Micro mirror structure with flat reflective coating |
| WO2005026843A2 (en) | 2003-09-12 | 2005-03-24 | Carl Zeiss Smt Ag | Illumination system for a microlithography projection exposure installation |
| US7056627B2 (en) | 2002-08-23 | 2006-06-06 | Hoya Corporation | Method of manufacturing a reflection type mask blank and method of manufacturing a reflection type mask |
| DE102005044716A1 (de) | 2005-09-19 | 2007-04-05 | Carl Zeiss Smt Ag | Aktives optisches Element |
| US20080153010A1 (en) * | 2006-11-09 | 2008-06-26 | Asahi Glass Company., Ltd. | Method for depositing reflective multilayer film of reflective mask blank for euv lithography and method for producing reflective mask blank for euv lithography |
| US20080166534A1 (en) | 2005-02-28 | 2008-07-10 | Nikon Corporation | Optical Element and Method for Manufacturing Optical Element |
| DE102008009600A1 (de) | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie |
| DE102008042212A1 (de) | 2008-09-19 | 2010-04-01 | Carl Zeiss Smt Ag | Reflektives optisches Element und Verfahren zu seiner Herstellung |
| DE10314212B4 (de) * | 2002-03-29 | 2010-06-02 | Hoya Corp. | Verfahren zur Herstellung eines Maskenrohlings, Verfahren zur Herstellung einer Transfermaske |
| US20110001947A1 (en) | 2008-02-15 | 2011-01-06 | Carl Zeiss Smt Ag | Facet mirror for use in a projection exposure apparatus for microlithography |
| DE102009033511A1 (de) | 2009-07-15 | 2011-01-20 | Carl Zeiss Smt Ag | Mikrospiegelanordnung mit Anti-Reflexbeschichtung sowie Verfahren zu deren Herstellung |
| DE102011003357A1 (de) | 2011-01-31 | 2012-08-02 | Carl Zeiss Smt Gmbh | Spiegel für den EUV-Wellenlängenbereich, Herstellungsverfahren für einen solchen Spiegel, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv |
| WO2013077430A1 (ja) | 2011-11-25 | 2013-05-30 | 旭硝子株式会社 | Ｅｕｖリソグラフィ用反射型マスクブランクおよびその製造方法 |
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| JPH09197124A (ja) * | 1996-01-23 | 1997-07-31 | Nippon Electric Glass Co Ltd | ダイクロイックミラー |
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| KR100647968B1 (ko) | 1999-07-22 | 2006-11-17 | 코닝 인코포레이티드 | 극 자외선 소프트 ｘ-선 투사 리소그라피 방법 및 마스크디바이스 |
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| DE102011084117A1 (de) * | 2011-10-07 | 2013-04-11 | Carl Zeiss Smt Gmbh | Reflektives optisches Element für den EUV-Wellenlängenbereich, Verfahren zur Erzeugung und zur Korrektur eines solchen Elements, Projektionsobjektiv für die Mikrolithographie mit einem solchen Element und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv |
-
2014
- 2014-01-30 DE DE102014201622.3A patent/DE102014201622A1/de not_active Ceased
-
2015
- 2015-01-29 WO PCT/EP2015/051791 patent/WO2015114043A1/de not_active Ceased
- 2015-01-29 CN CN201580004334.9A patent/CN105917255B/zh active Active
- 2015-01-29 EP EP15705920.5A patent/EP3100083B1/de active Active
- 2015-01-29 JP JP2016549378A patent/JP6550066B2/ja active Active
-
2016
- 2016-08-01 US US15/225,328 patent/US10423073B2/en active Active
Patent Citations (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06186418A (ja) * | 1992-06-30 | 1994-07-08 | Victor Co Of Japan Ltd | ダイクロイックミラーの製造方法 |
| US6011646A (en) | 1998-02-20 | 2000-01-04 | The Regents Of The Unviersity Of California | Method to adjust multilayer film stress induced deformation of optics |
| DE10314212B4 (de) * | 2002-03-29 | 2010-06-02 | Hoya Corp. | Verfahren zur Herstellung eines Maskenrohlings, Verfahren zur Herstellung einer Transfermaske |
| US7056627B2 (en) | 2002-08-23 | 2006-06-06 | Hoya Corporation | Method of manufacturing a reflection type mask blank and method of manufacturing a reflection type mask |
| WO2004029692A2 (en) | 2002-09-25 | 2004-04-08 | Rosemount Aerospace Inc. | Micro mirror structure with flat reflective coating |
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| US20080166534A1 (en) | 2005-02-28 | 2008-07-10 | Nikon Corporation | Optical Element and Method for Manufacturing Optical Element |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102015225510A1 (de) * | 2015-12-16 | 2017-01-12 | Carl Zeiss Smt Gmbh | Spiegelelement, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
| US10598921B2 (en) | 2015-12-16 | 2020-03-24 | Carl Zeiss Smt Gmbh | Mirror element, in particular for a microlithographic projection exposure apparatus |
| DE102019202222A1 (de) * | 2019-02-19 | 2020-08-20 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Ablenkspiegel aus Diamant sowie Verfahren zur Herstellung |
| DE102019202222B4 (de) | 2019-02-19 | 2023-08-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Ablenkspiegel aus Diamant sowie Verfahren zur Herstellung |
| DE102023206689A1 (de) | 2023-07-13 | 2025-01-16 | Carl Zeiss Smt Gmbh | Aktuierbare Spiegel-Baugruppe |
| WO2025012094A1 (de) | 2023-07-13 | 2025-01-16 | Carl Zeiss Smt Gmbh | Aktuierbare spiegel-baugruppe |
| WO2025087653A1 (de) * | 2023-10-24 | 2025-05-01 | Carl Zeiss Smt Gmbh | Optisches element und euv-lithographiesystem |
| DE102024205025A1 (de) * | 2024-05-29 | 2025-12-04 | Carl Zeiss Smt Gmbh | Mikro-elektro-mechanisch bewegbares Element und System |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105917255A (zh) | 2016-08-31 |
| CN105917255B (zh) | 2019-10-25 |
| EP3100083B1 (de) | 2019-08-14 |
| JP2017506363A (ja) | 2017-03-02 |
| US10423073B2 (en) | 2019-09-24 |
| JP6550066B2 (ja) | 2019-07-24 |
| EP3100083A1 (de) | 2016-12-07 |
| WO2015114043A1 (de) | 2015-08-06 |
| US20160342093A1 (en) | 2016-11-24 |
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