JP2001007045A5 - - Google Patents

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Publication number
JP2001007045A5
JP2001007045A5 JP1999179233A JP17923399A JP2001007045A5 JP 2001007045 A5 JP2001007045 A5 JP 2001007045A5 JP 1999179233 A JP1999179233 A JP 1999179233A JP 17923399 A JP17923399 A JP 17923399A JP 2001007045 A5 JP2001007045 A5 JP 2001007045A5
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JP
Japan
Prior art keywords
laser
heat treatment
optical system
intensity distribution
substrate
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JP1999179233A
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English (en)
Japanese (ja)
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JP2001007045A (ja
JP3562389B2 (ja
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Priority claimed from JP17923399A external-priority patent/JP3562389B2/ja
Priority to JP17923399A priority Critical patent/JP3562389B2/ja
Priority to US09/599,645 priority patent/US6437284B1/en
Priority to CA002312223A priority patent/CA2312223A1/en
Priority to DE60027820T priority patent/DE60027820T2/de
Priority to EP00113378A priority patent/EP1063049B1/en
Priority to CNB001187449A priority patent/CN1146027C/zh
Priority to TW089112338A priority patent/TW469539B/zh
Priority to KR10-2000-0035042A priority patent/KR100371986B1/ko
Publication of JP2001007045A publication Critical patent/JP2001007045A/ja
Publication of JP3562389B2 publication Critical patent/JP3562389B2/ja
Application granted granted Critical
Publication of JP2001007045A5 publication Critical patent/JP2001007045A5/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP17923399A 1999-06-25 1999-06-25 レーザ熱処理装置 Expired - Lifetime JP3562389B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP17923399A JP3562389B2 (ja) 1999-06-25 1999-06-25 レーザ熱処理装置
TW089112338A TW469539B (en) 1999-06-25 2000-06-23 Optical system for laser heat treatment, laser heat treating apparatus, and method for producing semiconductor devices by using the same
CA002312223A CA2312223A1 (en) 1999-06-25 2000-06-23 Optical system and apparatus for laser heat treatment and method for producing semiconductor devices by using the same
DE60027820T DE60027820T2 (de) 1999-06-25 2000-06-23 Vorrichtung mit einem optischen System zur Laserwärmebehandlung und ein diese Vorrichtung verwendendes Verfahren zur Herstellung von Halbleiteranordnungen
EP00113378A EP1063049B1 (en) 1999-06-25 2000-06-23 Apparatus with an optical system for laser heat treatment and method for producing semiconductor devices by using the same
CNB001187449A CN1146027C (zh) 1999-06-25 2000-06-23 光学系统及其装置和使用该光学系统制造半导体装置的方法
US09/599,645 US6437284B1 (en) 1999-06-25 2000-06-23 Optical system and apparatus for laser heat treatment and method for producing semiconductor devices by using the same
KR10-2000-0035042A KR100371986B1 (ko) 1999-06-25 2000-06-24 레이저 열처리용 광학장치, 레이저 열처리 장치 및 반도체의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17923399A JP3562389B2 (ja) 1999-06-25 1999-06-25 レーザ熱処理装置

Publications (3)

Publication Number Publication Date
JP2001007045A JP2001007045A (ja) 2001-01-12
JP3562389B2 JP3562389B2 (ja) 2004-09-08
JP2001007045A5 true JP2001007045A5 (enExample) 2004-10-28

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP17923399A Expired - Lifetime JP3562389B2 (ja) 1999-06-25 1999-06-25 レーザ熱処理装置

Country Status (8)

Country Link
US (1) US6437284B1 (enExample)
EP (1) EP1063049B1 (enExample)
JP (1) JP3562389B2 (enExample)
KR (1) KR100371986B1 (enExample)
CN (1) CN1146027C (enExample)
CA (1) CA2312223A1 (enExample)
DE (1) DE60027820T2 (enExample)
TW (1) TW469539B (enExample)

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