JP2016500449A5 - - Google Patents
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- Publication number
- JP2016500449A5 JP2016500449A5 JP2015546004A JP2015546004A JP2016500449A5 JP 2016500449 A5 JP2016500449 A5 JP 2016500449A5 JP 2015546004 A JP2015546004 A JP 2015546004A JP 2015546004 A JP2015546004 A JP 2015546004A JP 2016500449 A5 JP2016500449 A5 JP 2016500449A5
- Authority
- JP
- Japan
- Prior art keywords
- capping layer
- thickness
- optical element
- manufacturing
- reflective optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261734183P | 2012-12-06 | 2012-12-06 | |
| DE102012222466.1A DE102012222466A1 (de) | 2012-12-06 | 2012-12-06 | Reflektives optisches Element für die EUV-Lithographie |
| US61/734,183 | 2012-12-06 | ||
| DE102012222466.1 | 2012-12-06 | ||
| PCT/EP2013/075620 WO2014086905A1 (en) | 2012-12-06 | 2013-12-05 | Reflective optical element for euv lithography and method of manufacturing a reflective optical element |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016500449A JP2016500449A (ja) | 2016-01-12 |
| JP2016500449A5 true JP2016500449A5 (enExample) | 2017-01-19 |
| JP6309535B2 JP6309535B2 (ja) | 2018-04-18 |
Family
ID=50778061
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015546004A Active JP6309535B2 (ja) | 2012-12-06 | 2013-12-05 | Ｅｕｖリソグラフィー用反射性光学素子及びその製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9606446B2 (enExample) |
| EP (1) | EP2929398B9 (enExample) |
| JP (1) | JP6309535B2 (enExample) |
| KR (1) | KR102127230B1 (enExample) |
| DE (1) | DE102012222466A1 (enExample) |
| WO (1) | WO2014086905A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102016212373A1 (de) * | 2016-07-07 | 2018-01-11 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
| US10468149B2 (en) * | 2017-02-03 | 2019-11-05 | Globalfoundries Inc. | Extreme ultraviolet mirrors and masks with improved reflectivity |
| JP2021071543A (ja) | 2019-10-29 | 2021-05-06 | ギガフォトン株式会社 | 極端紫外光集光ミラー、極端紫外光生成装置、及び電子デバイスの製造方法 |
| DE102020203286A1 (de) * | 2020-03-13 | 2021-09-16 | 3D Global Holding Gmbh | Lentikularlinsen-Baugruppe zum Anbringen an einer Anzeigefläche |
| KR102882943B1 (ko) * | 2022-04-01 | 2025-11-07 | 에이지씨 가부시키가이샤 | 반사형 마스크 블랭크, 반사형 마스크, 반사형 마스크 블랭크의 제조 방법 및 반사형 마스크의 제조 방법 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW561279B (en) * | 1999-07-02 | 2003-11-11 | Asml Netherlands Bv | Reflector for reflecting radiation in a desired wavelength range, lithographic projection apparatus containing the same and method for their preparation |
| EP1291680A2 (en) * | 2001-08-27 | 2003-03-12 | Nikon Corporation | Multilayer-film mirrors for use in extreme UV optical systems, and methods for manufacturing such mirrors exhibiting improved wave aberrations |
| DE10209493B4 (de) * | 2002-03-07 | 2007-03-22 | Carl Zeiss Smt Ag | Verfahren zur Vermeidung von Kontamination auf optischen Elementen, Vorrichtung zur Regelung von Kontamination auf optischen Elementen und EUV-Lithographievorrichtung |
| DE10309084A1 (de) * | 2003-03-03 | 2004-09-16 | Carl Zeiss Smt Ag | Reflektives optisches Element und EUV-Lithographiegerät |
| JP4521753B2 (ja) * | 2003-03-19 | 2010-08-11 | Ｈｏｙａ株式会社 | 反射型マスクの製造方法及び半導体装置の製造方法 |
| EP1930771A1 (en) | 2006-12-04 | 2008-06-11 | Carl Zeiss SMT AG | Projection objectives having mirror elements with reflective coatings |
| JP5194547B2 (ja) * | 2007-04-26 | 2013-05-08 | 凸版印刷株式会社 | 極端紫外線露光用マスク及びマスクブランク |
| JP5269079B2 (ja) * | 2007-08-20 | 2013-08-21 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 反射コーティングを備えたミラー要素を有する投影対物系 |
| ATE512389T1 (de) * | 2007-10-23 | 2011-06-15 | Imec | Erkennung von kontaminationen in euv-systemen |
| TW201131615A (en) * | 2009-12-09 | 2011-09-16 | Asahi Glass Co Ltd | Multilayer mirror for euv lithography and process for producing same |
| EP2511943A4 (en) * | 2009-12-09 | 2015-09-09 | Asahi Glass Co Ltd | OPTICAL ELEMENT FOR USE IN EUV LITHOGRAPHY |
| DE102009054986B4 (de) * | 2009-12-18 | 2015-11-12 | Carl Zeiss Smt Gmbh | Reflektive Maske für die EUV-Lithographie |
| CN103229248B (zh) | 2010-09-27 | 2016-10-12 | 卡尔蔡司Smt有限责任公司 | 反射镜，包含这种反射镜的投射物镜，以及包含这种投射物镜的用于微光刻的投射曝光设备 |
| DE102010041502A1 (de) * | 2010-09-28 | 2012-03-29 | Carl Zeiss Smt Gmbh | Spiegel, Projektionsobjektiv mit einem solchen Spiegel und Projektionsbelichtungs-anlage für die Mikrolithographie mit einem solchen Projektionsobjektiv |
| DE102011076011A1 (de) * | 2011-05-18 | 2012-11-22 | Carl Zeiss Smt Gmbh | Reflektives optisches Element und optisches System für die EUV-Lithographie |
| DE102012222451A1 (de) | 2012-12-06 | 2014-06-26 | Carl Zeiss Smt Gmbh | Reflektives optisches Element für die EUV-Lithographie |
-
2012
- 2012-12-06 DE DE102012222466.1A patent/DE102012222466A1/de not_active Ceased
-
2013
- 2013-12-05 JP JP2015546004A patent/JP6309535B2/ja active Active
- 2013-12-05 KR KR1020157017603A patent/KR102127230B1/ko active Active
- 2013-12-05 WO PCT/EP2013/075620 patent/WO2014086905A1/en not_active Ceased
- 2013-12-05 EP EP13811826.0A patent/EP2929398B9/en not_active Not-in-force
-
2015
- 2015-06-05 US US14/732,248 patent/US9606446B2/en not_active Expired - Fee Related
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