JP2011511435A5 - - Google Patents

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Publication number
JP2011511435A5
JP2011511435A5 JP2010543445A JP2010543445A JP2011511435A5 JP 2011511435 A5 JP2011511435 A5 JP 2011511435A5 JP 2010543445 A JP2010543445 A JP 2010543445A JP 2010543445 A JP2010543445 A JP 2010543445A JP 2011511435 A5 JP2011511435 A5 JP 2011511435A5
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JP
Japan
Prior art keywords
optical system
condensing optical
radiation
mirrors
mirror
Prior art date
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JP2010543445A
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English (en)
Japanese (ja)
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JP5368477B2 (ja
JP2011511435A (ja
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Publication date
Priority claimed from EP08001535.7A external-priority patent/EP2083327B1/en
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Publication of JP2011511435A publication Critical patent/JP2011511435A/ja
Publication of JP2011511435A5 publication Critical patent/JP2011511435A5/ja
Application granted granted Critical
Publication of JP5368477B2 publication Critical patent/JP5368477B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010543445A 2008-01-28 2009-01-28 Ｅｕｖ及びｘ線用の改良斜入射集光光学系 Expired - Fee Related JP5368477B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08001535.7 2008-01-28
EP08001535.7A EP2083327B1 (en) 2008-01-28 2008-01-28 Improved grazing incidence collector optical systems for EUV and X-ray applications
PCT/EP2009/000538 WO2009095219A1 (en) 2008-01-28 2009-01-28 Improved grazing incidence collector optical systems for euv and x-ray applications

Publications (3)

Publication Number Publication Date
JP2011511435A JP2011511435A (ja) 2011-04-07
JP2011511435A5 true JP2011511435A5 (enExample) 2012-03-15
JP5368477B2 JP5368477B2 (ja) 2013-12-18

Family

ID=39798147

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010543445A Expired - Fee Related JP5368477B2 (ja) 2008-01-28 2009-01-28 Ｅｕｖ及びｘ線用の改良斜入射集光光学系

Country Status (4)

Country Link
US (1) US8594277B2 (enExample)
EP (1) EP2083327B1 (enExample)
JP (1) JP5368477B2 (enExample)
WO (1) WO2009095219A1 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8330131B2 (en) 2010-01-11 2012-12-11 Media Lario, S.R.L. Source-collector module with GIC mirror and LPP EUV light source
US8587768B2 (en) 2010-04-05 2013-11-19 Media Lario S.R.L. EUV collector system with enhanced EUV radiation collection
US8686381B2 (en) 2010-06-28 2014-04-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin vapor LPP target system
US20120050706A1 (en) 2010-08-30 2012-03-01 Media Lario S.R.L Source-collector module with GIC mirror and xenon ice EUV LPP target system
US8258485B2 (en) 2010-08-30 2012-09-04 Media Lario Srl Source-collector module with GIC mirror and xenon liquid EUV LPP target system
US20120050707A1 (en) 2010-08-30 2012-03-01 Media Lario S.R.L Source-collector module with GIC mirror and tin wire EUV LPP target system
US8344339B2 (en) 2010-08-30 2013-01-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin rod EUV LPP target system
DE102010039965B4 (de) * 2010-08-31 2019-04-25 Carl Zeiss Smt Gmbh EUV-Kollektor
US8746975B2 (en) 2011-02-17 2014-06-10 Media Lario S.R.L. Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography
US9377695B2 (en) 2011-02-24 2016-06-28 Asml Netherlands B.V. Grazing incidence reflectors, lithographic apparatus, methods for manufacturing a grazing incidence reflector and methods for manufacturing a device
US8731139B2 (en) 2011-05-04 2014-05-20 Media Lario S.R.L. Evaporative thermal management of grazing incidence collectors for EUV lithography
NL2010274C2 (en) 2012-02-11 2015-02-26 Media Lario Srl Source-collector modules for euv lithography employing a gic mirror and a lpp source.
DE102012220465A1 (de) * 2012-11-09 2014-05-15 Carl Zeiss Smt Gmbh EUV-Kollektor
CN105122140B (zh) * 2013-04-17 2018-06-01 Asml荷兰有限公司 辐射收集器、辐射源以及光刻设备
CN103869633B (zh) * 2014-04-11 2015-08-05 哈尔滨工业大学 极紫外光刻光源收集及照明系统
CN104570623A (zh) * 2015-02-16 2015-04-29 哈尔滨工业大学 Xe介质毛细管放电检测用极紫外光源的光学收集系统
CN107561609B (zh) * 2017-08-22 2019-10-01 哈尔滨工业大学 一种复制制造Wolter-I型反射镜的工艺
EP3627226A1 (en) * 2018-09-20 2020-03-25 ASML Netherlands B.V. Optical system, metrology apparatus and associated method

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10138313A1 (de) 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
DE10158216A1 (de) * 2001-11-28 2003-06-18 Carlos Alberto Valenzuela Spiegel, optisches Abbildungssystem und deren Verwendung
CN1495528B (zh) * 2002-08-15 2011-10-12 Asml荷兰有限公司 光刻投射装置及用于所述装置中的反射器组件
US7217940B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Collector for EUV light source
US6841322B1 (en) 2003-06-30 2005-01-11 Intel Corporation Detecting erosion in collector optics with plasma sources in extreme ultraviolet (EUV) lithography systems
US7230258B2 (en) 2003-07-24 2007-06-12 Intel Corporation Plasma-based debris mitigation for extreme ultraviolet (EUV) light source
US7423275B2 (en) 2004-01-15 2008-09-09 Intel Corporation Erosion mitigation for collector optics using electric and magnetic fields
FR2871622B1 (fr) * 2004-06-14 2008-09-12 Commissariat Energie Atomique Dispositif de generation de lumiere dans l'extreme ultraviolet et application a une source de lithographie par rayonnement dans l'extreme ultraviolet
WO2007003359A1 (de) * 2005-07-01 2007-01-11 Carl Zeiss Smt Ag Kollektoreinheit für ein beleuchtungssystem mit wellenlängen ≤ 193 nm
EP1938150B1 (de) * 2005-10-18 2011-03-23 Carl Zeiss SMT GmbH Kollektor für beleuchtungssysteme mit einer wellenlänge </= 193 nm
JP5076349B2 (ja) * 2006-04-18 2012-11-21 ウシオ電機株式会社 極端紫外光集光鏡および極端紫外光光源装置
US7910900B2 (en) * 2006-07-20 2011-03-22 Carl Zeiss Smt Gmbh Collector for an illumination system
EP1901126B1 (en) * 2006-09-15 2011-10-12 Media Lario s.r.l. A collector optical system

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