JP2011512647A5 - - Google Patents
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- JP2011512647A5 JP2011512647A5 JP2010543446A JP2010543446A JP2011512647A5 JP 2011512647 A5 JP2011512647 A5 JP 2011512647A5 JP 2010543446 A JP2010543446 A JP 2010543446A JP 2010543446 A JP2010543446 A JP 2010543446A JP 2011512647 A5 JP2011512647 A5 JP 2011512647A5
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- light source
- condensing optical
- axis
- grazing incidence
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP08001536.5 | 2008-01-28 | ||
| EP08001536.5A EP2083328B1 (en) | 2008-01-28 | 2008-01-28 | Grazing incidence collector for laser produced plasma sources |
| PCT/EP2009/000539 WO2009095220A2 (en) | 2008-01-28 | 2009-01-28 | Grazing incidence collector for laser produced plasma sources |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011512647A JP2011512647A (ja) | 2011-04-21 |
| JP2011512647A5 true JP2011512647A5 (enExample) | 2012-03-15 |
| JP5368478B2 JP5368478B2 (ja) | 2013-12-18 |
Family
ID=39766873
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010543446A Expired - Fee Related JP5368478B2 (ja) | 2008-01-28 | 2009-01-28 | レーザ生成プラズマ源の斜入射集光光学系 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8411815B2 (enExample) |
| EP (1) | EP2083328B1 (enExample) |
| JP (1) | JP5368478B2 (enExample) |
| DE (1) | DE112009000120T5 (enExample) |
| WO (1) | WO2009095220A2 (enExample) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI457715B (zh) | 2008-12-27 | 2014-10-21 | Ushio Electric Inc | Light source device |
| DE102009047712A1 (de) * | 2009-12-09 | 2011-06-16 | Carl Zeiss Smt Gmbh | EUV-Lichtquelle für eine Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage |
| US8330131B2 (en) | 2010-01-11 | 2012-12-11 | Media Lario, S.R.L. | Source-collector module with GIC mirror and LPP EUV light source |
| JP5093267B2 (ja) * | 2010-03-11 | 2012-12-12 | ウシオ電機株式会社 | 集光鏡アッセンブリおよびこの集光鏡アッセンブリを用いた極端紫外光光源装置 |
| JP5670174B2 (ja) * | 2010-03-18 | 2015-02-18 | ギガフォトン株式会社 | チャンバ装置および極端紫外光生成装置 |
| US8587768B2 (en) | 2010-04-05 | 2013-11-19 | Media Lario S.R.L. | EUV collector system with enhanced EUV radiation collection |
| US8810775B2 (en) * | 2010-04-16 | 2014-08-19 | Media Lario S.R.L. | EUV mirror module with a nickel electroformed curved mirror |
| DE102010028655A1 (de) | 2010-05-06 | 2011-11-10 | Carl Zeiss Smt Gmbh | EUV-Kollektor |
| US9057962B2 (en) * | 2010-06-18 | 2015-06-16 | Media Lario S.R.L. | Source-collector module with GIC mirror and LPP EUV light source |
| US8686381B2 (en) * | 2010-06-28 | 2014-04-01 | Media Lario S.R.L. | Source-collector module with GIC mirror and tin vapor LPP target system |
| US20120050706A1 (en) * | 2010-08-30 | 2012-03-01 | Media Lario S.R.L | Source-collector module with GIC mirror and xenon ice EUV LPP target system |
| US8258485B2 (en) * | 2010-08-30 | 2012-09-04 | Media Lario Srl | Source-collector module with GIC mirror and xenon liquid EUV LPP target system |
| US20120050707A1 (en) * | 2010-08-30 | 2012-03-01 | Media Lario S.R.L | Source-collector module with GIC mirror and tin wire EUV LPP target system |
| US8344339B2 (en) | 2010-08-30 | 2013-01-01 | Media Lario S.R.L. | Source-collector module with GIC mirror and tin rod EUV LPP target system |
| DE102010039965B4 (de) | 2010-08-31 | 2019-04-25 | Carl Zeiss Smt Gmbh | EUV-Kollektor |
| CN102621815B (zh) * | 2011-01-26 | 2016-12-21 | Asml荷兰有限公司 | 用于光刻设备的反射光学部件及器件制造方法 |
| NL2009352A (en) | 2011-09-22 | 2013-03-25 | Asml Netherlands Bv | Radiation source. |
| NL2010274C2 (en) | 2012-02-11 | 2015-02-26 | Media Lario Srl | Source-collector modules for euv lithography employing a gic mirror and a lpp source. |
| JP2013211517A (ja) * | 2012-03-01 | 2013-10-10 | Gigaphoton Inc | Euv光集光装置 |
| DE102012220465A1 (de) | 2012-11-09 | 2014-05-15 | Carl Zeiss Smt Gmbh | EUV-Kollektor |
| EP2746850B1 (en) | 2012-12-20 | 2015-03-18 | USHIO Denki Kabushiki Kaisha | Method of manufacturing mirror shells of a nested shells grazing incidence mirror |
| US8872143B2 (en) * | 2013-03-14 | 2014-10-28 | Asml Netherlands B.V. | Target for laser produced plasma extreme ultraviolet light source |
| DE102014006265B4 (de) | 2013-05-03 | 2017-08-24 | Media Lario S.R.L. | Sn-dampf-euv-llp-quellsystem für die euv-lithographie |
| US9585236B2 (en) | 2013-05-03 | 2017-02-28 | Media Lario Srl | Sn vapor EUV LLP source system for EUV lithography |
| DE102013107192A1 (de) | 2013-07-08 | 2015-01-08 | Carl Zeiss Laser Optics Gmbh | Reflektives optisches Element für streifenden Einfall im EUV-Wellenlängenbereich |
| IT202000017086A1 (it) * | 2020-07-14 | 2022-01-14 | Istituto Naz Di Astrofisica | Procedimento per la realizzazione di elementi ottici per ottiche di telescopi utilizzabili in missioni spaziali |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6586757B2 (en) * | 1997-05-12 | 2003-07-01 | Cymer, Inc. | Plasma focus light source with active and buffer gas control |
| US6566668B2 (en) * | 1997-05-12 | 2003-05-20 | Cymer, Inc. | Plasma focus light source with tandem ellipsoidal mirror units |
| US6278764B1 (en) | 1999-07-22 | 2001-08-21 | The Regents Of The Unviersity Of California | High efficiency replicated x-ray optics and fabrication method |
| US6831963B2 (en) * | 2000-10-20 | 2004-12-14 | University Of Central Florida | EUV, XUV, and X-Ray wavelength sources created from laser plasma produced from liquid metal solutions |
| EP1152555A1 (en) | 2000-05-03 | 2001-11-07 | Media Lario S.r.L. | Telescope mirror for high bandwidth free space optical data transmission |
| US7180081B2 (en) * | 2000-06-09 | 2007-02-20 | Cymer, Inc. | Discharge produced plasma EUV light source |
| US7410265B2 (en) | 2000-09-13 | 2008-08-12 | Carl Zeiss Smt Ag | Focusing-device for the radiation from a light source |
| US6633048B2 (en) | 2001-05-03 | 2003-10-14 | Northrop Grumman Corporation | High output extreme ultraviolet source |
| US7916388B2 (en) * | 2007-12-20 | 2011-03-29 | Cymer, Inc. | Drive laser for EUV light source |
| DE10158216A1 (de) | 2001-11-28 | 2003-06-18 | Carlos Alberto Valenzuela | Spiegel, optisches Abbildungssystem und deren Verwendung |
| DE10214259A1 (de) * | 2002-03-28 | 2003-10-23 | Zeiss Carl Semiconductor Mfg | Kollektoreinheit für Beleuchtungssysteme mit einer Wellenlänge <193 nm |
| CN1495528B (zh) * | 2002-08-15 | 2011-10-12 | Asml荷兰有限公司 | 光刻投射装置及用于所述装置中的反射器组件 |
| AU2003266975A1 (en) * | 2002-12-19 | 2004-07-14 | Carl Zeiss Smt Ag | Illumination system having a more efficient collector optic |
| US7217940B2 (en) * | 2003-04-08 | 2007-05-15 | Cymer, Inc. | Collector for EUV light source |
| US7075713B2 (en) * | 2003-05-05 | 2006-07-11 | University Of Central Florida Research Foundation | High efficiency collector for laser plasma EUV source |
| US6841322B1 (en) | 2003-06-30 | 2005-01-11 | Intel Corporation | Detecting erosion in collector optics with plasma sources in extreme ultraviolet (EUV) lithography systems |
| US7230258B2 (en) | 2003-07-24 | 2007-06-12 | Intel Corporation | Plasma-based debris mitigation for extreme ultraviolet (EUV) light source |
| FR2860385B1 (fr) * | 2003-09-26 | 2007-06-01 | Cit Alcatel | Source euv |
| JP4584261B2 (ja) | 2003-11-25 | 2010-11-17 | メディア ラリオ ソシエタ ア レスポンサビリタ リミタータ | 電鋳による冷却および熱交換システムの製造 |
| US7423275B2 (en) | 2004-01-15 | 2008-09-09 | Intel Corporation | Erosion mitigation for collector optics using electric and magnetic fields |
| US7164144B2 (en) | 2004-03-10 | 2007-01-16 | Cymer Inc. | EUV light source |
| US7196342B2 (en) * | 2004-03-10 | 2007-03-27 | Cymer, Inc. | Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source |
| US7483223B2 (en) * | 2004-05-06 | 2009-01-27 | Carl Zeiss Smt Ag | Optical component having an improved transient thermal behavior and method for improving the transient thermal behavior of an optical component |
| FR2871622B1 (fr) * | 2004-06-14 | 2008-09-12 | Commissariat Energie Atomique | Dispositif de generation de lumiere dans l'extreme ultraviolet et application a une source de lithographie par rayonnement dans l'extreme ultraviolet |
| US7868304B2 (en) * | 2005-02-07 | 2011-01-11 | Asml Netherlands B.V. | Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| DE102005014433B3 (de) * | 2005-03-24 | 2006-10-05 | Xtreme Technologies Gmbh | Verfahren und Anordnung zur effizienten Erzeugung von kurzwelliger Strahlung auf Basis eines lasererzeugten Plasmas |
| DE102005052257B4 (de) | 2005-11-02 | 2013-11-14 | Symrise Ag | Verfahren zur Herstellung von C1-C8-Alkancarbonsäure-C1-C4-alkylestern |
| DE102005053415A1 (de) * | 2005-11-04 | 2007-05-10 | Carl Zeiss Laser Optics Gmbh | Optisches Bauelement mit verbessertem thermischen Verhalten |
| US7372049B2 (en) * | 2005-12-02 | 2008-05-13 | Asml Netherlands B.V. | Lithographic apparatus including a cleaning device and method for cleaning an optical element |
| DE102006027856B3 (de) * | 2006-06-13 | 2007-11-22 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von extrem ultravioletter Strahlung mittels elektrischer Entladung an regenerierbaren Elektroden |
| EP1882984B1 (en) * | 2006-07-28 | 2011-10-12 | Media Lario s.r.l. | Multi-reflection optical systems and their fabrication |
| TW200808134A (en) * | 2006-07-28 | 2008-02-01 | Ushio Electric Inc | Light source device for producing extreme ultraviolet radiation and method of generating extreme ultraviolet radiation |
| EP1901126B1 (en) * | 2006-09-15 | 2011-10-12 | Media Lario s.r.l. | A collector optical system |
| WO2008043577A1 (en) * | 2006-10-13 | 2008-04-17 | Media Lario S.R.L. | Coated mirrors and their fabication |
-
2008
- 2008-01-28 EP EP08001536.5A patent/EP2083328B1/en active Active
-
2009
- 2009-01-28 US US12/734,829 patent/US8411815B2/en not_active Expired - Fee Related
- 2009-01-28 DE DE112009000120T patent/DE112009000120T5/de not_active Ceased
- 2009-01-28 WO PCT/EP2009/000539 patent/WO2009095220A2/en not_active Ceased
- 2009-01-28 JP JP2010543446A patent/JP5368478B2/ja not_active Expired - Fee Related
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