JP5639745B2 - レーザ露光装置 - Google Patents
レーザ露光装置 Download PDFInfo
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- JP5639745B2 JP5639745B2 JP2009022631A JP2009022631A JP5639745B2 JP 5639745 B2 JP5639745 B2 JP 5639745B2 JP 2009022631 A JP2009022631 A JP 2009022631A JP 2009022631 A JP2009022631 A JP 2009022631A JP 5639745 B2 JP5639745 B2 JP 5639745B2
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- Prior art keywords
- fly
- eye lens
- laser light
- laser
- lens
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- 230000003287 optical effect Effects 0.000 claims description 66
- 238000005286 illumination Methods 0.000 claims description 16
- 230000001939 inductive effect Effects 0.000 claims description 3
- 239000011521 glass Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000004323 axial length Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
- G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
- G02B19/0052—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0955—Lenses
- G02B27/0961—Lens arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70083—Non-homogeneous intensity distribution in the mask plane
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Optical Scanning Systems (AREA)
Description
レーザ光源1から放射されたレーザ光は、二つの反射ミラー11,12で反射されて、第1の光路差調整部材3に入射する。この第1の光路差調整部材3は、第1のフライアイレンズ2の各集光レンズ2aに対応して、光軸に平行な軸方向の長さが夫々異なり屈折率が1よりも大きい複数の透明部材3aを組み合わせて構成したものであるため、第1の光路差調整部材3の複数の透明部材3aを射出するレーザ光は、互いに位相がずれたものとなっている。
2…第1のフライアイレンズ(フライアイレンズ)
2a…第1のフライアイレンズの集光レンズ
3…第1の光路差調整部材(第1の位相差生起手段)
3a…第1の光路差調整部材の透明部材
4…第1のコンデンサーレンズ
5…平行平面回転板
6…第2のフライアイレンズ
6a…第2のフライアイレンズの集光レンズ
7…第2の光路差調整部材(第2の位相差生起手段)
7a…第2の光路差調整部材の透明部材
8…第2のコンデンサーレンズ
9…フォトマスク
10…フォトマスク上の照明領域
Claims (2)
- レーザ光を放射するレーザ光源と、
前記レーザ光の光軸に略直交する面内に複数のレンズが並べて配置され、射出光を一旦集光した後、放射状に発散させてレーザ光の断面形状を拡大する第1のフライアイレンズと、
前記第1のフライアイレンズのレーザ光の入射側に配置され、前記第1のフライアイレンズの各集光レンズに夫々入射するレーザ光に位相差を生じさせる第1の位相差生起手段と、
前記第1のフライアイレンズを射出し断面形状が拡大されたレーザ光を平行光にするコンデンサーレンズと、
前記コンデンサーレンズの光軸に略直交する面内に複数のレンズが並べて配置され、レーザ光によるフォトマスクの照明領域内の光強度分布を均一化する第2のフライアイレンズと、
前記第2のフライアイレンズのレーザ光の入射側に配置され、前記第2のフライアイレンズの各集光レンズに夫々入射するレーザ光に位相差を生じさせる第2の位相差生起手段と、
を備え、
前記コンデンサーレンズのレーザ光の入射側に、光軸に対して傾いて配置され、光軸を中心に回転して前記照明領域を微動させる透明な平行平面回転板をさらに設けたことを特徴とするレーザ露光装置。 - 前記第2の位相差生起手段は、光軸方向の長さが異なり、光軸と直交する面内にて第1の方向に長い複数の板状の透明部材を前記第1の方向と直交する第2の方向に重ね合せて構成したものであることを特徴とする請求項1記載のレーザ露光装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009022631A JP5639745B2 (ja) | 2009-02-03 | 2009-02-03 | レーザ露光装置 |
KR1020117016451A KR101634329B1 (ko) | 2009-02-03 | 2010-02-02 | 레이저 노광 장치 |
PCT/JP2010/051447 WO2010090190A1 (ja) | 2009-02-03 | 2010-02-02 | レーザ露光装置 |
CN2010800064003A CN102308364A (zh) | 2009-02-03 | 2010-02-02 | 激光曝光装置 |
TW099103204A TWI463270B (zh) | 2009-02-03 | 2010-02-03 | 雷射曝光裝置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009022631A JP5639745B2 (ja) | 2009-02-03 | 2009-02-03 | レーザ露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010182731A JP2010182731A (ja) | 2010-08-19 |
JP5639745B2 true JP5639745B2 (ja) | 2014-12-10 |
Family
ID=42542084
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009022631A Active JP5639745B2 (ja) | 2009-02-03 | 2009-02-03 | レーザ露光装置 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5639745B2 (ja) |
KR (1) | KR101634329B1 (ja) |
CN (1) | CN102308364A (ja) |
TW (1) | TWI463270B (ja) |
WO (1) | WO2010090190A1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5803222B2 (ja) * | 2011-04-05 | 2015-11-04 | 株式会社ブイ・テクノロジー | レーザ照明装置 |
CN103703408B (zh) * | 2011-04-05 | 2016-01-13 | 株式会社V技术 | 激光照明装置 |
JP6002964B2 (ja) * | 2012-01-31 | 2016-10-05 | 株式会社ブイ・テクノロジー | レーザ照明装置 |
CN102269936B (zh) * | 2011-06-01 | 2013-07-10 | 长春理工大学 | 一种仿真飞蛾复眼光学减反射结构图案的方法和系统 |
JP6345963B2 (ja) * | 2014-03-28 | 2018-06-20 | 株式会社Screenホールディングス | 光照射装置および描画装置 |
WO2017066207A1 (en) | 2015-10-11 | 2017-04-20 | Dolby Laboratories Licensing Corporation | Improved optical system for image projectors |
CN108037641A (zh) * | 2017-12-14 | 2018-05-15 | 中国科学院长春光学精密机械与物理研究所 | 一种基于有效光强分布的蛾眼结构制备系统及其制备方法 |
JP2021009274A (ja) * | 2018-07-09 | 2021-01-28 | レーザーテック株式会社 | 光源、検査装置、euv光の生成方法及び検査方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2662562B2 (ja) * | 1988-04-11 | 1997-10-15 | 株式会社ニコン | 露光装置 |
US6885433B2 (en) * | 1990-11-15 | 2005-04-26 | Nikon Corporation | Projection exposure apparatus and method |
JP3360686B2 (ja) * | 1990-12-27 | 2002-12-24 | 株式会社ニコン | 照明光学装置および投影露光装置並びに露光方法および素子製造方法 |
US5742426A (en) * | 1995-05-25 | 1998-04-21 | York; Kenneth K. | Laser beam treatment pattern smoothing device and laser beam treatment pattern modulator |
JPH1062710A (ja) * | 1996-08-22 | 1998-03-06 | Nikon Corp | 照明光学系 |
JP3987350B2 (ja) * | 2001-11-16 | 2007-10-10 | 株式会社リコー | レーザ照明光学系及びそれを用いた露光装置、レーザ加工装置、投射装置 |
JP3826047B2 (ja) * | 2002-02-13 | 2006-09-27 | キヤノン株式会社 | 露光装置、露光方法、及びそれを用いたデバイス製造方法 |
JP3969197B2 (ja) | 2002-06-06 | 2007-09-05 | 石川島播磨重工業株式会社 | レーザ照射装置 |
JP2007206566A (ja) * | 2006-02-03 | 2007-08-16 | Seiko Epson Corp | プロジェクタ |
-
2009
- 2009-02-03 JP JP2009022631A patent/JP5639745B2/ja active Active
-
2010
- 2010-02-02 KR KR1020117016451A patent/KR101634329B1/ko active IP Right Grant
- 2010-02-02 WO PCT/JP2010/051447 patent/WO2010090190A1/ja active Application Filing
- 2010-02-02 CN CN2010800064003A patent/CN102308364A/zh active Pending
- 2010-02-03 TW TW099103204A patent/TWI463270B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR20110120872A (ko) | 2011-11-04 |
CN102308364A (zh) | 2012-01-04 |
TWI463270B (zh) | 2014-12-01 |
KR101634329B1 (ko) | 2016-07-08 |
WO2010090190A1 (ja) | 2010-08-12 |
TW201115279A (en) | 2011-05-01 |
JP2010182731A (ja) | 2010-08-19 |
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