JP2010503882A5 - - Google Patents

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Publication number
JP2010503882A5
JP2010503882A5 JP2009527724A JP2009527724A JP2010503882A5 JP 2010503882 A5 JP2010503882 A5 JP 2010503882A5 JP 2009527724 A JP2009527724 A JP 2009527724A JP 2009527724 A JP2009527724 A JP 2009527724A JP 2010503882 A5 JP2010503882 A5 JP 2010503882A5
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JP
Japan
Prior art keywords
optical system
condensing optical
reflecting surface
mirrors
mirror
Prior art date
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Application number
JP2009527724A
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English (en)
Japanese (ja)
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JP5410283B2 (ja
JP2010503882A (ja
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Publication date
Priority claimed from EP06425634A external-priority patent/EP1901126B1/en
Application filed filed Critical
Publication of JP2010503882A publication Critical patent/JP2010503882A/ja
Publication of JP2010503882A5 publication Critical patent/JP2010503882A5/ja
Application granted granted Critical
Publication of JP5410283B2 publication Critical patent/JP5410283B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009527724A 2006-09-15 2007-09-03 集光光学系 Expired - Fee Related JP5410283B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06425634A EP1901126B1 (en) 2006-09-15 2006-09-15 A collector optical system
EP06425634.0 2006-09-15
PCT/EP2007/007674 WO2008031514A2 (en) 2006-09-15 2007-09-03 A collector optical system

Publications (3)

Publication Number Publication Date
JP2010503882A JP2010503882A (ja) 2010-02-04
JP2010503882A5 true JP2010503882A5 (enExample) 2010-10-21
JP5410283B2 JP5410283B2 (ja) 2014-02-05

Family

ID=37686093

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009527724A Expired - Fee Related JP5410283B2 (ja) 2006-09-15 2007-09-03 集光光学系

Country Status (5)

Country Link
US (1) US8390785B2 (enExample)
EP (1) EP1901126B1 (enExample)
JP (1) JP5410283B2 (enExample)
AT (1) ATE528693T1 (enExample)
WO (1) WO2008031514A2 (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2083327B1 (en) * 2008-01-28 2017-11-29 Media Lario s.r.l. Improved grazing incidence collector optical systems for EUV and X-ray applications
EP2083328B1 (en) 2008-01-28 2013-06-19 Media Lario s.r.l. Grazing incidence collector for laser produced plasma sources
US8050380B2 (en) * 2009-05-05 2011-11-01 Media Lario, S.R.L. Zone-optimized mirrors and optical systems using same
RU2404444C1 (ru) * 2009-12-29 2010-11-20 Общество С Ограниченной Ответственностью "Инсмат Технология" Способ фокусировки осесимметричного потока излучения, генерируемого источником волновой природы, и оптическая система для его осуществления
US8330131B2 (en) 2010-01-11 2012-12-11 Media Lario, S.R.L. Source-collector module with GIC mirror and LPP EUV light source
JP5093267B2 (ja) * 2010-03-11 2012-12-12 ウシオ電機株式会社 集光鏡アッセンブリおよびこの集光鏡アッセンブリを用いた極端紫外光光源装置
US8587768B2 (en) 2010-04-05 2013-11-19 Media Lario S.R.L. EUV collector system with enhanced EUV radiation collection
DE102010028655A1 (de) * 2010-05-06 2011-11-10 Carl Zeiss Smt Gmbh EUV-Kollektor
US8686381B2 (en) 2010-06-28 2014-04-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin vapor LPP target system
US20120050707A1 (en) 2010-08-30 2012-03-01 Media Lario S.R.L Source-collector module with GIC mirror and tin wire EUV LPP target system
US8344339B2 (en) 2010-08-30 2013-01-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin rod EUV LPP target system
US8258485B2 (en) 2010-08-30 2012-09-04 Media Lario Srl Source-collector module with GIC mirror and xenon liquid EUV LPP target system
US20120050706A1 (en) 2010-08-30 2012-03-01 Media Lario S.R.L Source-collector module with GIC mirror and xenon ice EUV LPP target system
US8746975B2 (en) 2011-02-17 2014-06-10 Media Lario S.R.L. Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography
US8731139B2 (en) 2011-05-04 2014-05-20 Media Lario S.R.L. Evaporative thermal management of grazing incidence collectors for EUV lithography
NL2010274C2 (en) 2012-02-11 2015-02-26 Media Lario Srl Source-collector modules for euv lithography employing a gic mirror and a lpp source.
DE102013204444A1 (de) * 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Beleuchtungsoptik für ein Maskeninspektionssystem sowie Maskeninspektionssystem mit einer derartigen Beleuchtungsoptik
JP6284073B2 (ja) * 2013-07-12 2018-02-28 国立大学法人 東京大学 回転体ミラーを用いたｘ線集光システムの光学設計方法及びｘ線集光システム
JP2016180591A (ja) * 2013-07-24 2016-10-13 株式会社日立ハイテクノロジーズ 検査装置
CN104570623A (zh) * 2015-02-16 2015-04-29 哈尔滨工业大学 Xe介质毛细管放电检测用极紫外光源的光学收集系统
WO2021162947A1 (en) * 2020-02-10 2021-08-19 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal / hyperbolic surface profiles
CN119045186B (zh) * 2024-04-11 2025-11-21 中国科学院西安光学精密机械研究所 一种锥形结构Wolter-I型X射线聚焦光学系统及其设计方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0810561B2 (ja) * 1988-11-30 1996-01-31 市光工業株式会社 前照灯の光学系
DE10138313A1 (de) * 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
WO2003014833A2 (de) * 2001-08-10 2003-02-20 Carl Zeiss Smt Ag Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen
CN1495528B (zh) * 2002-08-15 2011-10-12 Asml荷兰有限公司 光刻投射装置及用于所述装置中的反射器组件
US7034320B2 (en) 2003-03-20 2006-04-25 Intel Corporation Dual hemispherical collectors
EP1658615B1 (de) * 2003-08-27 2009-10-14 Carl Zeiss SMT AG Schiefspiegliges normal-incidence-kollektorsystem für lichtquellen, insbesondere euv-plasmaentladungsquellen
WO2006050891A2 (en) 2004-11-09 2006-05-18 Carl Zeiss Smt Ag A high-precision optical surface prepared by sagging from a masterpiece
EP1980743B1 (en) * 2007-04-10 2015-09-09 Nissan Motor Co., Ltd. Fuel pump driving device

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