ATE528693T1 - Optisches kollektorsystem - Google Patents

Optisches kollektorsystem

Info

Publication number
ATE528693T1
ATE528693T1 AT06425634T AT06425634T ATE528693T1 AT E528693 T1 ATE528693 T1 AT E528693T1 AT 06425634 T AT06425634 T AT 06425634T AT 06425634 T AT06425634 T AT 06425634T AT E528693 T1 ATE528693 T1 AT E528693T1
Authority
AT
Austria
Prior art keywords
imaging
source
euv
radiation
optical system
Prior art date
Application number
AT06425634T
Other languages
German (de)
English (en)
Inventor
Fabio Zocchi
Enrico Benedetti
Pietro Binda
Original Assignee
Media Lario Srl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Media Lario Srl filed Critical Media Lario Srl
Application granted granted Critical
Publication of ATE528693T1 publication Critical patent/ATE528693T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Mathematical Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • X-Ray Techniques (AREA)
AT06425634T 2006-09-15 2006-09-15 Optisches kollektorsystem ATE528693T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP06425634A EP1901126B1 (en) 2006-09-15 2006-09-15 A collector optical system

Publications (1)

Publication Number Publication Date
ATE528693T1 true ATE528693T1 (de) 2011-10-15

Family

ID=37686093

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06425634T ATE528693T1 (de) 2006-09-15 2006-09-15 Optisches kollektorsystem

Country Status (5)

Country Link
US (1) US8390785B2 (enExample)
EP (1) EP1901126B1 (enExample)
JP (1) JP5410283B2 (enExample)
AT (1) ATE528693T1 (enExample)
WO (1) WO2008031514A2 (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2083327B1 (en) * 2008-01-28 2017-11-29 Media Lario s.r.l. Improved grazing incidence collector optical systems for EUV and X-ray applications
EP2083328B1 (en) 2008-01-28 2013-06-19 Media Lario s.r.l. Grazing incidence collector for laser produced plasma sources
US8050380B2 (en) * 2009-05-05 2011-11-01 Media Lario, S.R.L. Zone-optimized mirrors and optical systems using same
RU2404444C1 (ru) * 2009-12-29 2010-11-20 Общество С Ограниченной Ответственностью "Инсмат Технология" Способ фокусировки осесимметричного потока излучения, генерируемого источником волновой природы, и оптическая система для его осуществления
US8330131B2 (en) 2010-01-11 2012-12-11 Media Lario, S.R.L. Source-collector module with GIC mirror and LPP EUV light source
JP5093267B2 (ja) * 2010-03-11 2012-12-12 ウシオ電機株式会社 集光鏡アッセンブリおよびこの集光鏡アッセンブリを用いた極端紫外光光源装置
US8587768B2 (en) 2010-04-05 2013-11-19 Media Lario S.R.L. EUV collector system with enhanced EUV radiation collection
DE102010028655A1 (de) * 2010-05-06 2011-11-10 Carl Zeiss Smt Gmbh EUV-Kollektor
US8686381B2 (en) 2010-06-28 2014-04-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin vapor LPP target system
US20120050707A1 (en) 2010-08-30 2012-03-01 Media Lario S.R.L Source-collector module with GIC mirror and tin wire EUV LPP target system
US8344339B2 (en) 2010-08-30 2013-01-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin rod EUV LPP target system
US8258485B2 (en) 2010-08-30 2012-09-04 Media Lario Srl Source-collector module with GIC mirror and xenon liquid EUV LPP target system
US20120050706A1 (en) 2010-08-30 2012-03-01 Media Lario S.R.L Source-collector module with GIC mirror and xenon ice EUV LPP target system
US8746975B2 (en) 2011-02-17 2014-06-10 Media Lario S.R.L. Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography
US8731139B2 (en) 2011-05-04 2014-05-20 Media Lario S.R.L. Evaporative thermal management of grazing incidence collectors for EUV lithography
NL2010274C2 (en) 2012-02-11 2015-02-26 Media Lario Srl Source-collector modules for euv lithography employing a gic mirror and a lpp source.
DE102013204444A1 (de) * 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Beleuchtungsoptik für ein Maskeninspektionssystem sowie Maskeninspektionssystem mit einer derartigen Beleuchtungsoptik
JP6284073B2 (ja) * 2013-07-12 2018-02-28 国立大学法人 東京大学 回転体ミラーを用いたｘ線集光システムの光学設計方法及びｘ線集光システム
JP2016180591A (ja) * 2013-07-24 2016-10-13 株式会社日立ハイテクノロジーズ 検査装置
CN104570623A (zh) * 2015-02-16 2015-04-29 哈尔滨工业大学 Xe介质毛细管放电检测用极紫外光源的光学收集系统
WO2021162947A1 (en) * 2020-02-10 2021-08-19 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal / hyperbolic surface profiles
CN119045186B (zh) * 2024-04-11 2025-11-21 中国科学院西安光学精密机械研究所 一种锥形结构Wolter-I型X射线聚焦光学系统及其设计方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0810561B2 (ja) * 1988-11-30 1996-01-31 市光工業株式会社 前照灯の光学系
DE10138313A1 (de) * 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
WO2003014833A2 (de) * 2001-08-10 2003-02-20 Carl Zeiss Smt Ag Kollektor mit befestigungseinrichtungen zum befestigen von spiegelschalen
CN1495528B (zh) * 2002-08-15 2011-10-12 Asml荷兰有限公司 光刻投射装置及用于所述装置中的反射器组件
US7034320B2 (en) 2003-03-20 2006-04-25 Intel Corporation Dual hemispherical collectors
EP1658615B1 (de) * 2003-08-27 2009-10-14 Carl Zeiss SMT AG Schiefspiegliges normal-incidence-kollektorsystem für lichtquellen, insbesondere euv-plasmaentladungsquellen
WO2006050891A2 (en) 2004-11-09 2006-05-18 Carl Zeiss Smt Ag A high-precision optical surface prepared by sagging from a masterpiece
EP1980743B1 (en) * 2007-04-10 2015-09-09 Nissan Motor Co., Ltd. Fuel pump driving device

Also Published As

Publication number Publication date
JP5410283B2 (ja) 2014-02-05
US8390785B2 (en) 2013-03-05
WO2008031514A3 (en) 2008-05-02
EP1901126B1 (en) 2011-10-12
JP2010503882A (ja) 2010-02-04
WO2008031514A2 (en) 2008-03-20
US20100096557A1 (en) 2010-04-22
EP1901126A1 (en) 2008-03-19

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