JP2016536252A5 - - Google Patents
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- Publication number
- JP2016536252A5 JP2016536252A5 JP2016530157A JP2016530157A JP2016536252A5 JP 2016536252 A5 JP2016536252 A5 JP 2016536252A5 JP 2016530157 A JP2016530157 A JP 2016530157A JP 2016530157 A JP2016530157 A JP 2016530157A JP 2016536252 A5 JP2016536252 A5 JP 2016536252A5
- Authority
- JP
- Japan
- Prior art keywords
- tio
- fluorine
- sio
- soot particles
- range
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 18
- 229910010413 TiO 2 Inorganic materials 0.000 claims 13
- 239000002245 particle Substances 0.000 claims 12
- 229910004298 SiO 2 Inorganic materials 0.000 claims 11
- 239000004071 soot Substances 0.000 claims 11
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 9
- 229910052731 fluorine Inorganic materials 0.000 claims 9
- 239000011737 fluorine Substances 0.000 claims 9
- 239000003153 chemical reaction reagent Substances 0.000 claims 4
- 239000000843 powder Substances 0.000 claims 4
- 239000007858 starting material Substances 0.000 claims 4
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims 3
- 239000010936 titanium Substances 0.000 claims 3
- 238000004017 vitrification Methods 0.000 claims 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 2
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 238000007711 solidification Methods 0.000 claims 2
- 230000008023 solidification Effects 0.000 claims 2
- 238000003786 synthesis reaction Methods 0.000 claims 2
- 229910052719 titanium Inorganic materials 0.000 claims 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 claims 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 238000007906 compression Methods 0.000 claims 1
- 230000006835 compression Effects 0.000 claims 1
- 230000003750 conditioning effect Effects 0.000 claims 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 claims 1
- 238000005469 granulation Methods 0.000 claims 1
- 230000003179 granulation Effects 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 230000007062 hydrolysis Effects 0.000 claims 1
- 238000006460 hydrolysis reaction Methods 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 238000012805 post-processing Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102013112396.1A DE102013112396B3 (de) | 2013-11-12 | 2013-11-12 | Verfahren zur Herstellung eines Rohlings aus Titan- und Fluor-dotiertem, hochkieselsäurehaltigem Glas |
| DE102013112396.1 | 2013-11-12 | ||
| PCT/EP2014/073921 WO2015071167A1 (de) | 2013-11-12 | 2014-11-06 | Verfahren zur herstellung eines rohlings aus titan- und fluor-dotiertem, hochkieselsäurehaltigem glas |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016536252A JP2016536252A (ja) | 2016-11-24 |
| JP2016536252A5 true JP2016536252A5 (enExample) | 2017-11-24 |
| JP6651445B2 JP6651445B2 (ja) | 2020-02-19 |
Family
ID=51787789
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016530157A Active JP6651445B2 (ja) | 2013-11-12 | 2014-11-06 | チタンおよびフッ素でドープされた、高ケイ酸含量のガラスからなるブランクの製造法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20170217814A2 (enExample) |
| EP (1) | EP3068735A1 (enExample) |
| JP (1) | JP6651445B2 (enExample) |
| KR (1) | KR102174836B1 (enExample) |
| CN (1) | CN105683102A (enExample) |
| DE (1) | DE102013112396B3 (enExample) |
| TW (1) | TWI572568B (enExample) |
| WO (1) | WO2015071167A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9611169B2 (en) * | 2014-12-12 | 2017-04-04 | Corning Incorporated | Doped ultra-low expansion glass and methods for making the same |
| EP3034476A1 (de) * | 2014-12-16 | 2016-06-22 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von synthetischem quarzglas unter verwendung einer reinigungsvorrichtung |
| US9932261B2 (en) * | 2015-11-23 | 2018-04-03 | Corning Incorporated | Doped ultra-low expansion glass and methods for annealing the same |
| JP7122997B2 (ja) * | 2019-04-05 | 2022-08-22 | 信越石英株式会社 | 紫外線吸収性に優れたチタン含有石英ガラス及びその製造方法 |
| KR102539330B1 (ko) * | 2021-06-02 | 2023-06-01 | 한국세라믹기술원 | 플라즈마내식성이 우수한 석영유리 및 그 제조방법 |
| CN113340504B (zh) * | 2021-07-13 | 2022-03-01 | 中国工程物理研究院激光聚变研究中心 | 一种从熔石英假想温度分布获取残余应力分布的方法 |
| CN116375315B (zh) * | 2022-11-29 | 2024-11-22 | 湖北菲利华石英玻璃股份有限公司 | 一种掺钛合成石英砂的制备方法 |
| CN117865436B (zh) * | 2024-02-23 | 2025-09-23 | 创昇光电科技(苏州)有限公司 | 一种超低膨胀系数氟化石英玻璃及其制备方法 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5756335A (en) * | 1980-09-16 | 1982-04-03 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of doped silica glass |
| DE3328709A1 (de) * | 1983-08-09 | 1985-02-28 | Bayer Ag, 5090 Leverkusen | Drehrohrofen und dessen verwendung |
| JP2946536B2 (ja) * | 1988-07-06 | 1999-09-06 | 東ソー株式会社 | 均質なフッ素含有シリカガラス塊の製造方法 |
| DE69501459T2 (de) * | 1995-04-10 | 1998-07-02 | Heraeus Quarzglas | Verfahren zur kontinuierlichen Reinigung von Quarzpulver |
| JP2888275B2 (ja) * | 1995-04-14 | 1999-05-10 | ヘラウス・クワルツグラス・ゲーエムベーハー | 石英粉の連続精製方法 |
| US6039894A (en) * | 1997-12-05 | 2000-03-21 | Sri International | Production of substantially monodisperse phosphor particles |
| FR2781475B1 (fr) * | 1998-07-23 | 2000-09-08 | Alsthom Cge Alcatel | Utilisation d'un creuset en graphite poreux pour traiter des granules de silice |
| DE19921059A1 (de) * | 1999-05-07 | 2000-11-16 | Heraeus Quarzglas | Verfahren zum Reinigen von Si0¶2¶-Partikeln, Vorrichtung zur Durchführung des Verfahrens, und nach dem Verfahren hergestellte Körnung |
| JP4453939B2 (ja) * | 1999-09-16 | 2010-04-21 | 信越石英株式会社 | Ｆ２エキシマレーザー透過用光学シリカガラス部材及びその製造方法 |
| US6606883B2 (en) * | 2001-04-27 | 2003-08-19 | Corning Incorporated | Method for producing fused silica and doped fused silica glass |
| FR2825357B1 (fr) * | 2001-05-31 | 2004-04-30 | Cit Alcatel | Procede de dopage de la silice par du fluor |
| US20040118155A1 (en) * | 2002-12-20 | 2004-06-24 | Brown John T | Method of making ultra-dry, Cl-free and F-doped high purity fused silica |
| DE102004060600A1 (de) * | 2003-12-18 | 2005-07-14 | Schott Ag | Mit Fluor dotiertes Silicatglas und Verwendung eines solchen |
| EP1761469B1 (en) * | 2004-07-01 | 2013-05-22 | Asahi Glass Company, Limited | Silica glass containing tio2 and process for its production |
| US20060179879A1 (en) * | 2004-12-29 | 2006-08-17 | Ellison Adam J G | Adjusting expansivity in doped silica glasses |
| US20060162382A1 (en) * | 2004-12-30 | 2006-07-27 | Hrdina Kenneth E | Method and apparatus for producing oxide particles via flame |
| DE102007029403A1 (de) * | 2006-06-28 | 2008-01-03 | Corning Incorporated | Glas mit sehr geringer Ausdehnung und Verfahren zu dessen Herstellung |
| WO2010131662A1 (ja) * | 2009-05-13 | 2010-11-18 | 旭硝子株式会社 | ＴｉＯ２－ＳｉＯ２ガラス体の製造方法及び熱処理方法、ＴｉＯ２－ＳｉＯ２ガラス体、ＥＵＶＬ用光学基材 |
| JP5510308B2 (ja) * | 2009-12-25 | 2014-06-04 | 旭硝子株式会社 | Ｅｕｖｌ光学部材用基材 |
| US8901019B2 (en) * | 2012-11-30 | 2014-12-02 | Corning Incorporated | Very low CTE slope doped silica-titania glass |
-
2013
- 2013-11-12 DE DE102013112396.1A patent/DE102013112396B3/de active Active
-
2014
- 2014-10-22 TW TW103136400A patent/TWI572568B/zh active
- 2014-11-06 CN CN201480061478.3A patent/CN105683102A/zh active Pending
- 2014-11-06 EP EP14793584.5A patent/EP3068735A1/de not_active Withdrawn
- 2014-11-06 US US15/035,776 patent/US20170217814A2/en not_active Abandoned
- 2014-11-06 WO PCT/EP2014/073921 patent/WO2015071167A1/de not_active Ceased
- 2014-11-06 JP JP2016530157A patent/JP6651445B2/ja active Active
- 2014-11-06 KR KR1020167015089A patent/KR102174836B1/ko active Active
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