JP6651445B2 - チタンおよびフッ素でドープされた、高ケイ酸含量のガラスからなるブランクの製造法 - Google Patents

チタンおよびフッ素でドープされた、高ケイ酸含量のガラスからなるブランクの製造法 Download PDF

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JP6651445B2
JP6651445B2 JP2016530157A JP2016530157A JP6651445B2 JP 6651445 B2 JP6651445 B2 JP 6651445B2 JP 2016530157 A JP2016530157 A JP 2016530157A JP 2016530157 A JP2016530157 A JP 2016530157A JP 6651445 B2 JP6651445 B2 JP 6651445B2
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fluorine
tio
sio
soot particles
doped
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JP2016536252A5 (enExample
JP2016536252A (ja
Inventor
オクス シュテファン
オクス シュテファン
ベッカー クラウス
ベッカー クラウス
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Heraeus Quarzglas GmbH and Co KG
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Heraeus Quarzglas GmbH and Co KG
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C03B19/1461—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering for doping the shaped article with flourine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1095—Thermal after-treatment of beads, e.g. tempering, crystallisation, annealing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • C03C2203/54—Heat-treatment in a dopant containing atmosphere
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2204/00—Glasses, glazes or enamels with special properties

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Thermal Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
JP2016530157A 2013-11-12 2014-11-06 チタンおよびフッ素でドープされた、高ケイ酸含量のガラスからなるブランクの製造法 Active JP6651445B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102013112396.1A DE102013112396B3 (de) 2013-11-12 2013-11-12 Verfahren zur Herstellung eines Rohlings aus Titan- und Fluor-dotiertem, hochkieselsäurehaltigem Glas
DE102013112396.1 2013-11-12
PCT/EP2014/073921 WO2015071167A1 (de) 2013-11-12 2014-11-06 Verfahren zur herstellung eines rohlings aus titan- und fluor-dotiertem, hochkieselsäurehaltigem glas

Publications (3)

Publication Number Publication Date
JP2016536252A JP2016536252A (ja) 2016-11-24
JP2016536252A5 JP2016536252A5 (enExample) 2017-11-24
JP6651445B2 true JP6651445B2 (ja) 2020-02-19

Family

ID=51787789

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016530157A Active JP6651445B2 (ja) 2013-11-12 2014-11-06 チタンおよびフッ素でドープされた、高ケイ酸含量のガラスからなるブランクの製造法

Country Status (8)

Country Link
US (1) US20170217814A2 (enExample)
EP (1) EP3068735A1 (enExample)
JP (1) JP6651445B2 (enExample)
KR (1) KR102174836B1 (enExample)
CN (1) CN105683102A (enExample)
DE (1) DE102013112396B3 (enExample)
TW (1) TWI572568B (enExample)
WO (1) WO2015071167A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9611169B2 (en) * 2014-12-12 2017-04-04 Corning Incorporated Doped ultra-low expansion glass and methods for making the same
EP3034476A1 (de) * 2014-12-16 2016-06-22 Heraeus Quarzglas GmbH & Co. KG Verfahren zur herstellung von synthetischem quarzglas unter verwendung einer reinigungsvorrichtung
US9932261B2 (en) * 2015-11-23 2018-04-03 Corning Incorporated Doped ultra-low expansion glass and methods for annealing the same
JP7122997B2 (ja) * 2019-04-05 2022-08-22 信越石英株式会社 紫外線吸収性に優れたチタン含有石英ガラス及びその製造方法
KR102539330B1 (ko) * 2021-06-02 2023-06-01 한국세라믹기술원 플라즈마내식성이 우수한 석영유리 및 그 제조방법
CN113340504B (zh) * 2021-07-13 2022-03-01 中国工程物理研究院激光聚变研究中心 一种从熔石英假想温度分布获取残余应力分布的方法
CN116375315B (zh) * 2022-11-29 2024-11-22 湖北菲利华石英玻璃股份有限公司 一种掺钛合成石英砂的制备方法
CN117865436B (zh) * 2024-02-23 2025-09-23 创昇光电科技(苏州)有限公司 一种超低膨胀系数氟化石英玻璃及其制备方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5756335A (en) * 1980-09-16 1982-04-03 Nippon Telegr & Teleph Corp <Ntt> Manufacture of doped silica glass
DE3328709A1 (de) * 1983-08-09 1985-02-28 Bayer Ag, 5090 Leverkusen Drehrohrofen und dessen verwendung
JP2946536B2 (ja) * 1988-07-06 1999-09-06 東ソー株式会社 均質なフッ素含有シリカガラス塊の製造方法
DE69501459T2 (de) * 1995-04-10 1998-07-02 Heraeus Quarzglas Verfahren zur kontinuierlichen Reinigung von Quarzpulver
JP2888275B2 (ja) * 1995-04-14 1999-05-10 ヘラウス・クワルツグラス・ゲーエムベーハー 石英粉の連続精製方法
US6039894A (en) * 1997-12-05 2000-03-21 Sri International Production of substantially monodisperse phosphor particles
FR2781475B1 (fr) * 1998-07-23 2000-09-08 Alsthom Cge Alcatel Utilisation d'un creuset en graphite poreux pour traiter des granules de silice
DE19921059A1 (de) * 1999-05-07 2000-11-16 Heraeus Quarzglas Verfahren zum Reinigen von Si0¶2¶-Partikeln, Vorrichtung zur Durchführung des Verfahrens, und nach dem Verfahren hergestellte Körnung
JP4453939B2 (ja) * 1999-09-16 2010-04-21 信越石英株式会社 Ｆ２エキシマレーザー透過用光学シリカガラス部材及びその製造方法
US6606883B2 (en) * 2001-04-27 2003-08-19 Corning Incorporated Method for producing fused silica and doped fused silica glass
FR2825357B1 (fr) * 2001-05-31 2004-04-30 Cit Alcatel Procede de dopage de la silice par du fluor
US20040118155A1 (en) * 2002-12-20 2004-06-24 Brown John T Method of making ultra-dry, Cl-free and F-doped high purity fused silica
DE102004060600A1 (de) * 2003-12-18 2005-07-14 Schott Ag Mit Fluor dotiertes Silicatglas und Verwendung eines solchen
EP1761469B1 (en) * 2004-07-01 2013-05-22 Asahi Glass Company, Limited Silica glass containing tio2 and process for its production
US20060179879A1 (en) * 2004-12-29 2006-08-17 Ellison Adam J G Adjusting expansivity in doped silica glasses
US20060162382A1 (en) * 2004-12-30 2006-07-27 Hrdina Kenneth E Method and apparatus for producing oxide particles via flame
DE102007029403A1 (de) * 2006-06-28 2008-01-03 Corning Incorporated Glas mit sehr geringer Ausdehnung und Verfahren zu dessen Herstellung
WO2010131662A1 (ja) * 2009-05-13 2010-11-18 旭硝子株式会社 ＴｉＯ２－ＳｉＯ２ガラス体の製造方法及び熱処理方法、ＴｉＯ２－ＳｉＯ２ガラス体、ＥＵＶＬ用光学基材
JP5510308B2 (ja) * 2009-12-25 2014-06-04 旭硝子株式会社 Ｅｕｖｌ光学部材用基材
US8901019B2 (en) * 2012-11-30 2014-12-02 Corning Incorporated Very low CTE slope doped silica-titania glass

Also Published As

Publication number Publication date
US20170217814A2 (en) 2017-08-03
TW201527232A (zh) 2015-07-16
TWI572568B (zh) 2017-03-01
EP3068735A1 (de) 2016-09-21
DE102013112396B3 (de) 2014-11-13
CN105683102A (zh) 2016-06-15
KR20160083098A (ko) 2016-07-11
KR102174836B1 (ko) 2020-11-06
WO2015071167A1 (de) 2015-05-21
US20160264447A1 (en) 2016-09-15
JP2016536252A (ja) 2016-11-24

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