KR102174836B1 - 높은 규산 함량을 갖는 티탄 도핑 유리 및 플루오르 도핑 유리로부터 블랭크의 제조 방법 - Google Patents

높은 규산 함량을 갖는 티탄 도핑 유리 및 플루오르 도핑 유리로부터 블랭크의 제조 방법 Download PDF

Info

Publication number
KR102174836B1
KR102174836B1 KR1020167015089A KR20167015089A KR102174836B1 KR 102174836 B1 KR102174836 B1 KR 102174836B1 KR 1020167015089 A KR1020167015089 A KR 1020167015089A KR 20167015089 A KR20167015089 A KR 20167015089A KR 102174836 B1 KR102174836 B1 KR 102174836B1
Authority
KR
South Korea
Prior art keywords
fluorine
sio
tio
soot particles
titanium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020167015089A
Other languages
English (en)
Korean (ko)
Other versions
KR20160083098A (ko
Inventor
슈테판 오크스
클라우스 베커
Original Assignee
헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 filed Critical 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지
Publication of KR20160083098A publication Critical patent/KR20160083098A/ko
Application granted granted Critical
Publication of KR102174836B1 publication Critical patent/KR102174836B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C03B19/1461—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering for doping the shaped article with flourine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1095—Thermal after-treatment of beads, e.g. tempering, crystallisation, annealing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • C03C2203/54—Heat-treatment in a dopant containing atmosphere
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2204/00—Glasses, glazes or enamels with special properties

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Thermal Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
KR1020167015089A 2013-11-12 2014-11-06 높은 규산 함량을 갖는 티탄 도핑 유리 및 플루오르 도핑 유리로부터 블랭크의 제조 방법 Active KR102174836B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102013112396.1A DE102013112396B3 (de) 2013-11-12 2013-11-12 Verfahren zur Herstellung eines Rohlings aus Titan- und Fluor-dotiertem, hochkieselsäurehaltigem Glas
DE102013112396.1 2013-11-12
PCT/EP2014/073921 WO2015071167A1 (de) 2013-11-12 2014-11-06 Verfahren zur herstellung eines rohlings aus titan- und fluor-dotiertem, hochkieselsäurehaltigem glas

Publications (2)

Publication Number Publication Date
KR20160083098A KR20160083098A (ko) 2016-07-11
KR102174836B1 true KR102174836B1 (ko) 2020-11-06

Family

ID=51787789

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167015089A Active KR102174836B1 (ko) 2013-11-12 2014-11-06 높은 규산 함량을 갖는 티탄 도핑 유리 및 플루오르 도핑 유리로부터 블랭크의 제조 방법

Country Status (8)

Country Link
US (1) US20170217814A2 (enExample)
EP (1) EP3068735A1 (enExample)
JP (1) JP6651445B2 (enExample)
KR (1) KR102174836B1 (enExample)
CN (1) CN105683102A (enExample)
DE (1) DE102013112396B3 (enExample)
TW (1) TWI572568B (enExample)
WO (1) WO2015071167A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9611169B2 (en) * 2014-12-12 2017-04-04 Corning Incorporated Doped ultra-low expansion glass and methods for making the same
EP3034476A1 (de) * 2014-12-16 2016-06-22 Heraeus Quarzglas GmbH & Co. KG Verfahren zur herstellung von synthetischem quarzglas unter verwendung einer reinigungsvorrichtung
US9932261B2 (en) * 2015-11-23 2018-04-03 Corning Incorporated Doped ultra-low expansion glass and methods for annealing the same
JP7122997B2 (ja) * 2019-04-05 2022-08-22 信越石英株式会社 紫外線吸収性に優れたチタン含有石英ガラス及びその製造方法
KR102539330B1 (ko) * 2021-06-02 2023-06-01 한국세라믹기술원 플라즈마내식성이 우수한 석영유리 및 그 제조방법
CN113340504B (zh) * 2021-07-13 2022-03-01 中国工程物理研究院激光聚变研究中心 一种从熔石英假想温度分布获取残余应力分布的方法
CN116375315B (zh) * 2022-11-29 2024-11-22 湖北菲利华石英玻璃股份有限公司 一种掺钛合成石英砂的制备方法
CN117865436B (zh) * 2024-02-23 2025-09-23 创昇光电科技(苏州)有限公司 一种超低膨胀系数氟化石英玻璃及其制备方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004203736A (ja) * 2002-12-20 2004-07-22 Corning Inc 高純度溶融シリカの製造方法
US20060179879A1 (en) * 2004-12-29 2006-08-17 Ellison Adam J G Adjusting expansivity in doped silica glasses
JP4957249B2 (ja) * 2004-07-01 2012-06-20 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5756335A (en) * 1980-09-16 1982-04-03 Nippon Telegr & Teleph Corp <Ntt> Manufacture of doped silica glass
DE3328709A1 (de) * 1983-08-09 1985-02-28 Bayer Ag, 5090 Leverkusen Drehrohrofen und dessen verwendung
JP2946536B2 (ja) * 1988-07-06 1999-09-06 東ソー株式会社 均質なフッ素含有シリカガラス塊の製造方法
DE69501459T2 (de) * 1995-04-10 1998-07-02 Heraeus Quarzglas Verfahren zur kontinuierlichen Reinigung von Quarzpulver
JP2888275B2 (ja) * 1995-04-14 1999-05-10 ヘラウス・クワルツグラス・ゲーエムベーハー 石英粉の連続精製方法
US6039894A (en) * 1997-12-05 2000-03-21 Sri International Production of substantially monodisperse phosphor particles
FR2781475B1 (fr) * 1998-07-23 2000-09-08 Alsthom Cge Alcatel Utilisation d'un creuset en graphite poreux pour traiter des granules de silice
DE19921059A1 (de) * 1999-05-07 2000-11-16 Heraeus Quarzglas Verfahren zum Reinigen von Si0¶2¶-Partikeln, Vorrichtung zur Durchführung des Verfahrens, und nach dem Verfahren hergestellte Körnung
JP4453939B2 (ja) * 1999-09-16 2010-04-21 信越石英株式会社 Ｆ２エキシマレーザー透過用光学シリカガラス部材及びその製造方法
US6606883B2 (en) * 2001-04-27 2003-08-19 Corning Incorporated Method for producing fused silica and doped fused silica glass
FR2825357B1 (fr) * 2001-05-31 2004-04-30 Cit Alcatel Procede de dopage de la silice par du fluor
DE102004060600A1 (de) * 2003-12-18 2005-07-14 Schott Ag Mit Fluor dotiertes Silicatglas und Verwendung eines solchen
US20060162382A1 (en) * 2004-12-30 2006-07-27 Hrdina Kenneth E Method and apparatus for producing oxide particles via flame
DE102007029403A1 (de) * 2006-06-28 2008-01-03 Corning Incorporated Glas mit sehr geringer Ausdehnung und Verfahren zu dessen Herstellung
WO2010131662A1 (ja) * 2009-05-13 2010-11-18 旭硝子株式会社 ＴｉＯ２－ＳｉＯ２ガラス体の製造方法及び熱処理方法、ＴｉＯ２－ＳｉＯ２ガラス体、ＥＵＶＬ用光学基材
JP5510308B2 (ja) * 2009-12-25 2014-06-04 旭硝子株式会社 Ｅｕｖｌ光学部材用基材
US8901019B2 (en) * 2012-11-30 2014-12-02 Corning Incorporated Very low CTE slope doped silica-titania glass

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004203736A (ja) * 2002-12-20 2004-07-22 Corning Inc 高純度溶融シリカの製造方法
JP4957249B2 (ja) * 2004-07-01 2012-06-20 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造方法
US20060179879A1 (en) * 2004-12-29 2006-08-17 Ellison Adam J G Adjusting expansivity in doped silica glasses

Also Published As

Publication number Publication date
US20170217814A2 (en) 2017-08-03
TW201527232A (zh) 2015-07-16
TWI572568B (zh) 2017-03-01
EP3068735A1 (de) 2016-09-21
DE102013112396B3 (de) 2014-11-13
CN105683102A (zh) 2016-06-15
JP6651445B2 (ja) 2020-02-19
KR20160083098A (ko) 2016-07-11
WO2015071167A1 (de) 2015-05-21
US20160264447A1 (en) 2016-09-15
JP2016536252A (ja) 2016-11-24

Similar Documents

Publication Publication Date Title
KR102174836B1 (ko) 높은 규산 함량을 갖는 티탄 도핑 유리 및 플루오르 도핑 유리로부터 블랭크의 제조 방법
JP6984897B2 (ja) 石英ガラス調製時のケイ素含有量の増大
JP5202959B2 (ja) 高屈折率均一性溶融シリカガラスおよびその製造方法
JP6927643B2 (ja) 吊り下げ式焼結坩堝内での石英ガラス体の調製
CN108779015B (zh) 从二氧化硅粉末制备石英玻璃体
JP6129263B2 (ja) ＳｉＯ２造粒体の合成石英ガラスの製造方法及び該製造方法に適したＳｉＯ２造粒体
JP6912098B2 (ja) 二酸化ケイ素造粒体の炭素含有量の低減および石英ガラス体の調製
TWI793065B (zh) 用於熔融烘箱的氣體沖洗及製備石英玻璃之方法
JP6981710B2 (ja) 二酸化ケイ素造粒体からの石英ガラス体の調製
JP6881776B2 (ja) 不透明石英ガラス体の調製
JP6940236B2 (ja) 溶融炉内での露点監視による石英ガラス体の調製
JP6881777B2 (ja) 合成石英ガラス粒の調製
US7506521B2 (en) High transmission synthetic silica glass and method of making same
TWI788278B (zh) 由均質石英玻璃製得之玻璃纖維及預成型品
JP6940235B2 (ja) 高融点金属の溶融坩堝内での石英ガラス体の調製
CN105439441B (zh) 生产氟和钛掺杂玻璃毛坯的方法及由该方法生产的毛坯
CN108698881A (zh) 由热解二氧化硅颗粒所得的均质石英玻璃
TW201731780A (zh) 於懸掛式金屬片坩堝中製備石英玻璃體
JP6800816B2 (ja) 希土類金属ドープされた石英ガラス、およびその製造方法
CN116724006A (zh) 石英玻璃体

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20160607

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20180601

Comment text: Request for Examination of Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20191114

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20200807

PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20201030

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20201102

End annual number: 3

Start annual number: 1

PG1601 Publication of registration
PR1001 Payment of annual fee

Payment date: 20231020

Start annual number: 4

End annual number: 4