JP2016536252A - チタンおよびフッ素でドープされた、高ケイ酸含量のガラスからなるブランクの製造法 - Google Patents
チタンおよびフッ素でドープされた、高ケイ酸含量のガラスからなるブランクの製造法 Download PDFInfo
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- JP2016536252A JP2016536252A JP2016530157A JP2016530157A JP2016536252A JP 2016536252 A JP2016536252 A JP 2016536252A JP 2016530157 A JP2016530157 A JP 2016530157A JP 2016530157 A JP2016530157 A JP 2016530157A JP 2016536252 A JP2016536252 A JP 2016536252A
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- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 98
- 239000011737 fluorine Substances 0.000 title claims abstract description 98
- 238000000034 method Methods 0.000 title claims abstract description 80
- 239000010936 titanium Substances 0.000 title claims abstract description 43
- 230000008569 process Effects 0.000 title claims abstract description 32
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 title claims abstract description 28
- 229910052719 titanium Inorganic materials 0.000 title claims abstract description 28
- 239000011521 glass Substances 0.000 title abstract description 31
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 title abstract description 6
- 235000012239 silicon dioxide Nutrition 0.000 title abstract description 6
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 title 1
- 239000004071 soot Substances 0.000 claims abstract description 127
- 239000002245 particle Substances 0.000 claims abstract description 119
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 96
- 239000003153 chemical reaction reagent Substances 0.000 claims abstract description 39
- 239000000843 powder Substances 0.000 claims abstract description 38
- 238000009826 distribution Methods 0.000 claims abstract description 25
- 239000007858 starting material Substances 0.000 claims abstract description 16
- 238000004017 vitrification Methods 0.000 claims abstract description 13
- 238000001900 extreme ultraviolet lithography Methods 0.000 claims abstract description 11
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 8
- 230000007062 hydrolysis Effects 0.000 claims abstract description 8
- 238000006460 hydrolysis reaction Methods 0.000 claims abstract description 8
- 239000010703 silicon Substances 0.000 claims abstract description 8
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 8
- 238000003786 synthesis reaction Methods 0.000 claims abstract description 8
- 238000012805 post-processing Methods 0.000 claims abstract description 7
- 238000007711 solidification Methods 0.000 claims abstract description 7
- 230000008023 solidification Effects 0.000 claims abstract description 7
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 104
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 103
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims description 18
- 238000011282 treatment Methods 0.000 claims description 12
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 claims description 10
- 238000005469 granulation Methods 0.000 claims description 9
- 230000003179 granulation Effects 0.000 claims description 9
- 230000009471 action Effects 0.000 claims description 8
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 claims description 8
- 230000003750 conditioning effect Effects 0.000 claims description 7
- 238000007906 compression Methods 0.000 claims description 5
- 230000006835 compression Effects 0.000 claims description 5
- 230000003647 oxidation Effects 0.000 claims description 5
- 238000007254 oxidation reaction Methods 0.000 claims description 5
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 31
- 239000005368 silicate glass Substances 0.000 abstract description 8
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 229910003082 TiO2-SiO2 Inorganic materials 0.000 abstract 4
- 239000010410 layer Substances 0.000 description 27
- 239000007789 gas Substances 0.000 description 24
- 238000006243 chemical reaction Methods 0.000 description 18
- 230000000052 comparative effect Effects 0.000 description 13
- 239000000758 substrate Substances 0.000 description 13
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 12
- 238000010438 heat treatment Methods 0.000 description 8
- 230000000875 corresponding effect Effects 0.000 description 6
- 238000009827 uniform distribution Methods 0.000 description 6
- 238000001816 cooling Methods 0.000 description 5
- 239000008187 granular material Substances 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 239000004408 titanium dioxide Substances 0.000 description 5
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 239000008188 pellet Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910003902 SiCl 4 Inorganic materials 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 238000003682 fluorination reaction Methods 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 239000011164 primary particle Substances 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- 229960001730 nitrous oxide Drugs 0.000 description 2
- 235000013842 nitrous oxide Nutrition 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- LZQHZOIDAMYHSS-UHFFFAOYSA-N [F].[Ti] Chemical compound [F].[Ti] LZQHZOIDAMYHSS-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000567 combustion gas Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007907 direct compression Methods 0.000 description 1
- 238000007908 dry granulation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 230000002706 hydrostatic effect Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- 238000009828 non-uniform distribution Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- KUAZQDVKQLNFPE-UHFFFAOYSA-N thiram Chemical compound CN(C)C(=S)SSC(=S)N(C)C KUAZQDVKQLNFPE-UHFFFAOYSA-N 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000003260 vortexing Methods 0.000 description 1
- 238000005550 wet granulation Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
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- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
- C03B19/1461—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering for doping the shaped article with flourine
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- C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
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- C03C4/00—Compositions for glass with special properties
- C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
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- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
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- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
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Abstract
Description
本発明は、フッ素でドープされたTiO2−SiO2スート粒子を製造し、かつ固化およびガラス化により後加工してブランクとする合成プロセスを含む、EUVリソグラフィーで使用するための、所定のフッ素含量を有する、チタンでドープされた高ケイ酸含量のガラスからなるブランクを製造するための方法に関する。
EUVリソグラフィーの場合には、マイクロリソグラフィー投射装置を用いて50nm未満の線幅を有する高集積化構造が形成される。この場合には、13nmだけの波長を有する、EUV領域(極紫外線光、軟X線とも呼ばれる)からの放射線が使用される。前記投射装置は、高いケイ酸含量の、二酸化チタンでドープされたガラス(以下、“TiO2−SiO2ガラス”または“Tiでドープされたケイ酸ガラス”とも呼ばれる)からなりかつ反射層系を備えているミラー素子が装備されている。前記材料は、極端に低い線形熱膨張係数(略して、“CTE”と呼ばれる;coefficient of thermal expansion)によって傑出しており、この線形熱膨張係数は、チタンの濃度によって調節可能である。通常の二酸化チタン濃度は、6〜9質量%である。
チタンでドープされたケイ酸ガラスブランクにおけるCTEの空間的プロファイルは、幾つかの影響因子に依存する。絶対チタン含量とともに、チタンの分布は、著しく重要であり、ならびにさらなるドーピング元素、例えばフッ素の割合および分布も著しく重要である。
この課題は、冒頭に記載された上位概念の方法から出発して、本発明によれば、合成プロセスがケイ素含有出発物質およびチタン含有出発物質の火炎加水分解により、TiO2−SiO2スート粒子を形成させる方法工程、および前記TiO2−SiO2スート粒子を運動粉末層中でフッ素含有試薬に晒しかつ反応させてフッ素でドープされたTiO2−SiO2スート粒子とする、後続の方法工程を含むことによって解決される。
次に、本発明を図および実施例につき詳説する。
Claims (13)
- ハロゲンでドープされたTiO2−SiO2スート粒子(1’)を製造し、かつ固化およびガラス化により後加工してブランクとする合成プロセスを含む、EUVリソグラフィーで使用するための、所定のフッ素含量を有する、チタンでドープされた、高ケイ酸含量のガラスからなるブランクを製造するための方法において、前記合成プロセスが、ケイ素含有出発物質およびチタン含有出発物質の火炎加水分解により、TiO2−SiO2スート粒子(1)を形成させる方法工程、および前記TiO2−SiO2スート粒子(1)を運動粉末層(10)中でフッ素含有試薬に晒しかつ反応させてフッ素でドープされたTiO2−SiO2スート粒子(1’)とする、後続の方法工程を含むことを特徴とする、前記方法。
- 前記ケイ素含有出発物質としてオクタメチルシクロテトラシロキサン(OMCTS)を使用しかつ前記チタン含有出発物質としてチタンイソプロポキシド[Ti(OPri)4]を使用することを特徴とする、請求項1記載の方法。
- 前記TiO2−SiO2スート粒子(1)は、20nm〜500nmの範囲内の平均粒径および50m2/g〜300m2/gの範囲内のBETによる比表面積を有することを特徴とする、請求項1または2記載の方法。
- 前記のフッ素でドープされたTiO2−SiO2スート粒子(1’)のTiO2含量は、6質量%〜12質量%の範囲内で調節されることを特徴とする、請求項1から3までのいずれか1項に記載の方法。
- 前記のフッ素でドープされたTiO2−SiO2スート粒子(1’)のフッ素含量は、1000質量ppm〜10000質量ppmの範囲内で調節されることを特徴とする、請求項1から4までのいずれか1項に記載の方法。
- フッ素含有試薬として、SiF4、CHF3、CF4、C2F6、C3F8、F2またはSF6が使用されることを特徴とする、請求項1から5までのいずれか1項に記載の方法。
- 前記運動粉末層(10)は、TiO2−SiO2スート粒子(1)のルーズな床として形成されており、このルーズな床は、フッ素含有試薬によって貫流され、かつ運動されることを特徴とする、請求項1から6までのいずれか1項に記載の方法。
- 前記フッ素含有試薬は、少なくとも5分間、TiO2−SiO2スート粒子(1)に作用することを特徴とする、請求項1から7までのいずれか1項に記載の方法。
- 粉末層(10)は、室温〜1100℃の範囲内の温度に加熱されることを特徴とする、請求項1から8までのいずれか1項に記載の方法。
- 粉末層(10)の運動が機械的作用を含むことを特徴とする、請求項1から9までのいずれか1項に記載の方法。
- フッ素でドープされたTiO2−SiO2スート粒子(1’)の固化は、造粒および/または圧縮によって行われることを特徴とする、請求項1から10までのいずれか1項に記載の方法。
- ガラス化の前に、フッ素でドープされたTiO2−SiO2スート粒子(1’)は、窒素酸化物、酸素またはオゾンでの酸化処理を含む状態調節処理に供されることを特徴とする、請求項1から11までのいずれか1項に記載の方法。
- ガラス化の際に、6質量%〜12質量%の範囲内の平均TiO2濃度および最大0.06質量%の平均値からの偏倚、1000質量ppm〜10000質量ppmの範囲内の平均フッ素濃度および最大10%の平均値からの偏倚、0.4〜1.2ppb/K2の微分商dCTE/dTとして表された、20℃〜40℃の温度範囲内の熱膨張係数CTEの上昇および5ppb/K未満の平均値からの偏倚によって特徴付けられた、CTEの局所的分布を有するブランクが得られることを特徴とする、請求項1から12までのいずれか1項に記載の方法。
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DE102013112396.1A DE102013112396B3 (de) | 2013-11-12 | 2013-11-12 | Verfahren zur Herstellung eines Rohlings aus Titan- und Fluor-dotiertem, hochkieselsäurehaltigem Glas |
PCT/EP2014/073921 WO2015071167A1 (de) | 2013-11-12 | 2014-11-06 | Verfahren zur herstellung eines rohlings aus titan- und fluor-dotiertem, hochkieselsäurehaltigem glas |
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US9611169B2 (en) * | 2014-12-12 | 2017-04-04 | Corning Incorporated | Doped ultra-low expansion glass and methods for making the same |
EP3034476A1 (de) * | 2014-12-16 | 2016-06-22 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von synthetischem quarzglas unter verwendung einer reinigungsvorrichtung |
US9932261B2 (en) | 2015-11-23 | 2018-04-03 | Corning Incorporated | Doped ultra-low expansion glass and methods for annealing the same |
JP7122997B2 (ja) * | 2019-04-05 | 2022-08-22 | 信越石英株式会社 | 紫外線吸収性に優れたチタン含有石英ガラス及びその製造方法 |
KR102539330B1 (ko) * | 2021-06-02 | 2023-06-01 | 한국세라믹기술원 | 플라즈마내식성이 우수한 석영유리 및 그 제조방법 |
CN113340504B (zh) * | 2021-07-13 | 2022-03-01 | 中国工程物理研究院激光聚变研究中心 | 一种从熔石英假想温度分布获取残余应力分布的方法 |
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TW201527232A (zh) | 2015-07-16 |
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CN105683102A (zh) | 2016-06-15 |
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