DE69501459T2 - Verfahren zur kontinuierlichen Reinigung von Quarzpulver - Google Patents

Verfahren zur kontinuierlichen Reinigung von Quarzpulver

Info

Publication number
DE69501459T2
DE69501459T2 DE69501459T DE69501459T DE69501459T2 DE 69501459 T2 DE69501459 T2 DE 69501459T2 DE 69501459 T DE69501459 T DE 69501459T DE 69501459 T DE69501459 T DE 69501459T DE 69501459 T2 DE69501459 T2 DE 69501459T2
Authority
DE
Germany
Prior art keywords
quartz powder
continuous cleaning
cleaning
continuous
quartz
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69501459T
Other languages
English (en)
Other versions
DE69501459D1 (de
Inventor
Tatsuhiro Sato
Hiroyuki Watanabe
Werner Ponto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Quarzglas GmbH and Co KG
Original Assignee
Heraeus Quarzglas GmbH and Co KG
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Quarzglas GmbH and Co KG, Shin Etsu Quartz Products Co Ltd filed Critical Heraeus Quarzglas GmbH and Co KG
Publication of DE69501459D1 publication Critical patent/DE69501459D1/de
Application granted granted Critical
Publication of DE69501459T2 publication Critical patent/DE69501459T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1095—Thermal after-treatment of beads, e.g. tempering, crystallisation, annealing
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G3/00—Compounds of copper
    • C01G3/006—Compounds containing, besides copper, two or more other elements, with the exception of oxygen or hydrogen
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G51/00—Compounds of cobalt
    • C01G51/006—Compounds containing, besides cobalt, two or more other elements, with the exception of oxygen or hydrogen
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G53/00—Compounds of nickel
    • C01G53/006—Compounds containing, besides nickel, two or more other elements, with the exception of oxygen or hydrogen
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G9/00—Compounds of zinc
    • C01G9/006—Compounds containing, besides zinc, two ore more other elements, with the exception of oxygen or hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/02—Pretreated ingredients
    • C03C1/022—Purification of silica sand or other minerals
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/74—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by peak-intensities or a ratio thereof only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/80—Particles consisting of a mixture of two or more inorganic phases
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/40—Electric properties
DE69501459T 1995-04-10 1995-04-10 Verfahren zur kontinuierlichen Reinigung von Quarzpulver Expired - Lifetime DE69501459T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP95105409A EP0737653B1 (de) 1995-04-10 1995-04-10 Verfahren zur kontinuierlichen Reinigung von Quarzpulver

Publications (2)

Publication Number Publication Date
DE69501459D1 DE69501459D1 (de) 1998-02-19
DE69501459T2 true DE69501459T2 (de) 1998-07-02

Family

ID=8219177

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69501459T Expired - Lifetime DE69501459T2 (de) 1995-04-10 1995-04-10 Verfahren zur kontinuierlichen Reinigung von Quarzpulver

Country Status (4)

Country Link
US (1) US5637284A (de)
EP (1) EP0737653B1 (de)
CN (1) CN1090151C (de)
DE (1) DE69501459T2 (de)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19813971B4 (de) 1998-03-24 2005-12-01 Heraeus Quarzglas Gmbh & Co. Kg Verfahren für die Reinigung von SiO2-Körnung
FR2781475B1 (fr) * 1998-07-23 2000-09-08 Alsthom Cge Alcatel Utilisation d'un creuset en graphite poreux pour traiter des granules de silice
US6182237B1 (en) 1998-08-31 2001-01-30 International Business Machines Corporation System and method for detecting phase errors in asics with multiple clock frequencies
US6277349B1 (en) * 1998-11-14 2001-08-21 C. Eric Westbrook Tridymite-based processing for high purity quartz
DE19855816A1 (de) * 1998-12-03 2000-06-08 Heraeus Quarzglas Verfahren für die Reinigung von Si0¶2¶-Körnung und Vorrichtung zur Durchführung des Verfahrens
DE19921059A1 (de) * 1999-05-07 2000-11-16 Heraeus Quarzglas Verfahren zum Reinigen von Si0¶2¶-Partikeln, Vorrichtung zur Durchführung des Verfahrens, und nach dem Verfahren hergestellte Körnung
DE10037640C1 (de) * 2000-07-31 2002-02-21 Dorfner Analysenzentrum Und An Verfahren und Vorrichtung zum Reinigen von Quarzrohstoff
AUPR054000A0 (en) * 2000-10-04 2000-10-26 Austai Motors Designing Pty Ltd A planetary gear apparatus
US20020083739A1 (en) * 2000-12-29 2002-07-04 Pandelisev Kiril A. Hot substrate deposition fiber optic preforms and preform components process and apparatus
US20020083740A1 (en) * 2000-12-29 2002-07-04 Pandelisev Kiril A. Process and apparatus for production of silica grain having desired properties and their fiber optic and semiconductor application
US7797966B2 (en) * 2000-12-29 2010-09-21 Single Crystal Technologies, Inc. Hot substrate deposition of fused silica
US6510707B2 (en) 2001-03-15 2003-01-28 Heraeus Shin-Etsu America, Inc. Methods for making silica crucibles
US20040258496A1 (en) * 2002-04-08 2004-12-23 Marusich Troy D. High frequency tooth pass cutting device and method
JP4169325B2 (ja) * 2002-07-31 2008-10-22 信越石英株式会社 石英ガラス治具及びその製造方法
US7837955B2 (en) * 2006-03-08 2010-11-23 Unimin Corporation Continuous reactor system for anoxic purification
CN101215074B (zh) * 2008-01-17 2010-12-15 徐传龙 拉制低羟基石英玻璃软管用水晶粉的生产工艺及拉管方法
DE102008049598A1 (de) 2008-09-30 2010-04-01 Heraeus Quarzglas Gmbh & Co. Kg Verfahren und Vorrichtung für die Reinigung von SiO2-Körnung
DE102009059016B4 (de) 2009-12-17 2019-02-21 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Behandlung einer aus Quarzsand oder Quarzglas bestehenden Körnung
US9446377B1 (en) 2011-01-14 2016-09-20 Unimin Corporation Rotary continuous reactor vessel and method for the same
US8713966B2 (en) 2011-11-30 2014-05-06 Corning Incorporated Refractory vessels and methods for forming same
CN103183351B (zh) * 2011-12-29 2015-12-09 庄翔昊 氯化焙烧-浸出法提纯二氧化硅矿石的方法
CN104185613B (zh) * 2012-04-05 2017-05-03 赫罗伊斯石英玻璃股份有限两合公司 用于由电熔化的合成的石英玻璃制造成形体的方法
DE102012006914B4 (de) * 2012-04-05 2018-01-18 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung synthetischer Quarzglaskörnung
DE102012008437B3 (de) * 2012-04-30 2013-03-28 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung synthetischer Quarzglaskörnung
CN102701223B (zh) * 2012-06-05 2014-04-09 田辉明 高温氯化法生产高纯石英砂的方法及氯化装置
CN102923718A (zh) * 2012-09-29 2013-02-13 江苏太平洋石英股份有限公司 石英砂提纯装置的高温气化反应管
DE102013112396B3 (de) * 2013-11-12 2014-11-13 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines Rohlings aus Titan- und Fluor-dotiertem, hochkieselsäurehaltigem Glas
CN103706306B (zh) * 2013-12-27 2016-05-04 浙江永强石英科技发展股份有限公司 高纯石英砂高温气固反应装置及其反应方法
CN105985006A (zh) * 2015-02-09 2016-10-05 宝山钢铁股份有限公司 泡沫玻璃造孔装置
WO2017078859A1 (en) 2015-11-04 2017-05-11 Unimin Corporation Purified quartz powder modified for cladding optic fiber cable
TW201736291A (zh) 2015-12-18 2017-10-16 何瑞斯廓格拉斯公司 石英玻璃製備中矽含量之提升
US10730780B2 (en) 2015-12-18 2020-08-04 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a multi-chamber oven
KR20180095879A (ko) 2015-12-18 2018-08-28 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 상승된 온도에서 탄소-도핑된 실리카 과립을 처리하여 실리카 과립의 알칼리 토금속 함량의 감소
TWI808933B (zh) 2015-12-18 2023-07-21 德商何瑞斯廓格拉斯公司 石英玻璃體、二氧化矽顆粒、光導、施照體、及成型體及其製備方法
JP6940236B2 (ja) 2015-12-18 2021-09-22 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 溶融炉内での露点監視による石英ガラス体の調製
JP2019502633A (ja) 2015-12-18 2019-01-31 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 均質な石英ガラス製のガラス繊維および母材
TWI812586B (zh) 2015-12-18 2023-08-21 德商何瑞斯廓格拉斯公司 石英玻璃體、其製備方法與應用、及用於控制烘箱出口處之露點
JP6981710B2 (ja) 2015-12-18 2021-12-17 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 二酸化ケイ素造粒体からの石英ガラス体の調製
US10618833B2 (en) 2015-12-18 2020-04-14 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a synthetic quartz glass grain
WO2017103121A2 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung eines opaken quarzglaskörpers
CN108439415A (zh) * 2018-04-10 2018-08-24 东海县晶盛源硅微粉有限公司 一种石英砂高温气化反应管
WO2019238808A1 (de) 2018-06-15 2019-12-19 Solar Silicon Gmbh Verfahren zur herstellung von elementarem silizium
WO2020081667A1 (en) * 2018-10-16 2020-04-23 The Quartz Corp Usa Partition plates
EP3739283B1 (de) * 2019-05-17 2022-02-23 Heraeus Quarzglas GmbH & Co. KG Verfahren zur behandlung rieselfähiger anorganischer körnung sowie zur durchführung des verfahrens geeignetes drehrohr
EP3763682A1 (de) 2019-07-12 2021-01-13 Heraeus Quarzglas GmbH & Co. KG Reinigung von quarzpulvern durch entfernung von mikropartikeln aus feuerfesten materialien
US11511250B2 (en) * 2020-11-05 2022-11-29 China Enfi Engineering Corporation Method and apparatus for preparing composite
CN112919798A (zh) * 2021-03-04 2021-06-08 江苏润弛太阳能材料科技有限公司 一种石英砂生产装置
CN117142754B (zh) * 2023-09-05 2024-04-05 连云港福东正佑照明电器有限公司 一种石英管石英砂高温氯化提纯炉

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GB325386A (en) * 1929-02-12 1930-02-20 Chance Brothers & Co Ltd Improvements relating to the removal of impurities from sand and like materials
US2070161A (en) * 1935-01-21 1937-02-09 Roland W Flinn Purification of natural deposits
US2233695A (en) * 1939-04-04 1941-03-04 Ayers Mineral Company Method of acid treating granular materials
US3383438A (en) * 1965-12-17 1968-05-14 Engelhard Min & Chem Calcination of clay
DE3836934A1 (de) * 1988-10-29 1990-05-03 Heraeus Schott Quarzschmelze Verfahren zum reinigen von teilchenfoermigem siliziumdioxid
US4983370A (en) * 1990-02-06 1991-01-08 The Feldspar Corporation Purified quartz and process for purifying quartz
JP2800375B2 (ja) * 1990-06-18 1998-09-21 三菱マテリアル株式会社 天然石英粉末の精製方法

Also Published As

Publication number Publication date
EP0737653A1 (de) 1996-10-16
DE69501459D1 (de) 1998-02-19
CN1146429A (zh) 1997-04-02
CN1090151C (zh) 2002-09-04
EP0737653B1 (de) 1998-01-14
US5637284A (en) 1997-06-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: HERAEUS QUARZGLAS GMBH & CO. KG, 63450 HANAU, DE S