JP2007186412A5 - - Google Patents

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Publication number
JP2007186412A5
JP2007186412A5 JP2006344018A JP2006344018A JP2007186412A5 JP 2007186412 A5 JP2007186412 A5 JP 2007186412A5 JP 2006344018 A JP2006344018 A JP 2006344018A JP 2006344018 A JP2006344018 A JP 2006344018A JP 2007186412 A5 JP2007186412 A5 JP 2007186412A5
Authority
JP
Japan
Prior art keywords
glass
silica
titania
omega
range
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006344018A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007186412A (ja
JP5412027B2 (ja
Filing date
Publication date
Priority claimed from US11/445,071 external-priority patent/US20070137253A1/en
Application filed filed Critical
Publication of JP2007186412A publication Critical patent/JP2007186412A/ja
Publication of JP2007186412A5 publication Critical patent/JP2007186412A5/ja
Application granted granted Critical
Publication of JP5412027B2 publication Critical patent/JP5412027B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2006344018A 2005-12-21 2006-12-21 脈理が低減された低膨張率ガラスおよび素子ならびにその製造方法 Expired - Fee Related JP5412027B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US75305805P 2005-12-21 2005-12-21
US60/753,058 2005-12-21
US11/445,071 US20070137253A1 (en) 2005-12-21 2006-05-31 Reduced striae low expansion glass and elements, and a method for making same
US11/445,071 2006-05-31

Publications (3)

Publication Number Publication Date
JP2007186412A JP2007186412A (ja) 2007-07-26
JP2007186412A5 true JP2007186412A5 (enExample) 2012-10-11
JP5412027B2 JP5412027B2 (ja) 2014-02-12

Family

ID=38171829

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006344018A Expired - Fee Related JP5412027B2 (ja) 2005-12-21 2006-12-21 脈理が低減された低膨張率ガラスおよび素子ならびにその製造方法

Country Status (3)

Country Link
US (1) US20070137253A1 (enExample)
JP (1) JP5412027B2 (enExample)
DE (1) DE102006060362B4 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070263281A1 (en) * 2005-12-21 2007-11-15 Maxon John E Reduced striae low expansion glass and elements, and a method for making same
JP2011505318A (ja) * 2007-11-30 2011-02-24 コーニング インコーポレイテッド 低い膨張係数勾配を有する低膨張性ガラス材料
US20100101387A1 (en) * 2008-10-24 2010-04-29 Kedar Prasad Gupta Crystal growing system and method thereof
DE102009047460A1 (de) 2009-02-11 2010-08-12 Carl Zeiss Smt Ag Verfahren zum Ausschneiden eines Rohlings aus einer Boule
US8713969B2 (en) * 2009-08-31 2014-05-06 Corning Incorporated Tuning Tzc by the annealing of ultra low expansion glass
US10483101B2 (en) 2016-06-30 2019-11-19 Corning Incorporated Glass-based article with engineered stress distribution and method of making same

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0850201B1 (en) * 1995-09-12 2003-07-16 Corning Incorporated Containment vessel for producing fused silica glass
DE69634667T2 (de) * 1995-09-12 2006-04-27 Corning Inc. Boule-oszillationsmuster für die herstellung von geschmolzenem quarzglas
EP0850199B1 (en) * 1995-09-12 2005-12-28 Corning Incorporated Method and Furnace for the Production of Silica Glass containing less striae
US5970751A (en) * 1998-09-22 1999-10-26 Corning Incorporated Fused SiO2 -TiO2 glass method
US6769273B1 (en) * 1999-07-05 2004-08-03 Nikon Corporation Method of manufacturing silica glass member and silica glass member obtained by the method
US6997015B2 (en) * 2001-11-27 2006-02-14 Corning Incorporated EUV lithography glass structures formed by extrusion consolidation process
US7053017B2 (en) * 2002-03-05 2006-05-30 Corning Incorporated Reduced striae extreme ultraviolet elements
JP2004131373A (ja) * 2002-09-09 2004-04-30 Corning Inc シリカ・チタニア極端紫外線光学素子の製造方法

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