JP2016502495A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2016502495A5 JP2016502495A5 JP2015545421A JP2015545421A JP2016502495A5 JP 2016502495 A5 JP2016502495 A5 JP 2016502495A5 JP 2015545421 A JP2015545421 A JP 2015545421A JP 2015545421 A JP2015545421 A JP 2015545421A JP 2016502495 A5 JP2016502495 A5 JP 2016502495A5
- Authority
- JP
- Japan
- Prior art keywords
- less
- doped silica
- titania glass
- titania
- silica
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 49
- 239000011521 glass Substances 0.000 claims description 45
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 12
- 229910052731 fluorine Inorganic materials 0.000 claims description 12
- 239000011737 fluorine Substances 0.000 claims description 12
- 239000004071 soot Substances 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 239000002243 precursor Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 6
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 5
- 239000002245 particle Substances 0.000 claims description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 5
- 239000002019 doping agent Substances 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims description 2
- 230000007062 hydrolysis Effects 0.000 claims description 2
- 238000006460 hydrolysis reaction Methods 0.000 claims description 2
- 238000005245 sintering Methods 0.000 claims description 2
- 241000338670 Clossiana titania Species 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 238000002485 combustion reaction Methods 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261731621P | 2012-11-30 | 2012-11-30 | |
| US61/731,621 | 2012-11-30 | ||
| US13/835,039 US8901019B2 (en) | 2012-11-30 | 2013-03-15 | Very low CTE slope doped silica-titania glass |
| US13/835,039 | 2013-03-15 | ||
| PCT/US2013/072146 WO2014085529A1 (en) | 2012-11-30 | 2013-11-27 | Very low cte slope doped silica-titania glass |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016502495A JP2016502495A (ja) | 2016-01-28 |
| JP2016502495A5 true JP2016502495A5 (enExample) | 2016-11-24 |
| JP6291505B2 JP6291505B2 (ja) | 2018-03-14 |
Family
ID=50826009
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015545421A Expired - Fee Related JP6291505B2 (ja) | 2012-11-30 | 2013-11-27 | 非常に低いｃｔｅ勾配のドープされたシリカ−チタニアガラス |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8901019B2 (enExample) |
| EP (1) | EP2925686A1 (enExample) |
| JP (1) | JP6291505B2 (enExample) |
| WO (1) | WO2014085529A1 (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9505649B2 (en) | 2013-09-13 | 2016-11-29 | Corning Incorporated | Ultralow expansion glass |
| DE102013112396B3 (de) * | 2013-11-12 | 2014-11-13 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Rohlings aus Titan- und Fluor-dotiertem, hochkieselsäurehaltigem Glas |
| US9382150B2 (en) | 2014-03-14 | 2016-07-05 | Corning Incorporated | Boron-doped titania-silica glass having very low CTE slope |
| EP3000791B1 (de) * | 2014-09-24 | 2017-04-26 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur Herstellung eines Rohlings aus Fluor- und Titan-dotiertem, hochkieselsäurehaltigem Glas für den Einsatz in der EUV-Lithographie und danach hergestellter Rohling |
| US9580350B2 (en) | 2014-11-19 | 2017-02-28 | Corning Incorporated | High hydroxyl TiO2-SiO2 glass |
| EP3224213B1 (en) * | 2014-11-26 | 2022-03-23 | Corning Incorporated | Doped silica-titania glass having low expansivity and methods of making the same |
| EP3224211B1 (en) * | 2014-11-26 | 2021-05-05 | Corning Incorporated | Method for making halogen doped optical element |
| US9611169B2 (en) * | 2014-12-12 | 2017-04-04 | Corning Incorporated | Doped ultra-low expansion glass and methods for making the same |
| US9822030B2 (en) | 2015-02-13 | 2017-11-21 | Corning Incorporated | Ultralow expansion titania-silica glass |
| WO2016154190A1 (en) * | 2015-03-26 | 2016-09-29 | Corning Incorporated | Glass composite for use in extreme ultra-violet lithography |
| US9932261B2 (en) * | 2015-11-23 | 2018-04-03 | Corning Incorporated | Doped ultra-low expansion glass and methods for annealing the same |
| US10464840B2 (en) * | 2016-10-05 | 2019-11-05 | Corning Incorporated | Near infrared shielding and laser-resistant window |
| KR102710639B1 (ko) | 2016-12-21 | 2024-09-27 | 코닝 인코포레이티드 | 소결 시스템 및 소결된 물품 |
| US11270724B1 (en) * | 2021-03-04 | 2022-03-08 | Western Digital Technologies, Inc. | Glass substrates for heat assisted magnetic recording (HAMR) and methods and apparatus for use with the glass substrates |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4792706B2 (ja) | 2003-04-03 | 2011-10-12 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびその製造方法 |
| EP1471038A3 (de) | 2003-04-26 | 2005-11-23 | Schott Ag | Verfahren zur Herstellung von Glaskörpern aus dotiertem Quarzglas |
| DE102004060600A1 (de) | 2003-12-18 | 2005-07-14 | Schott Ag | Mit Fluor dotiertes Silicatglas und Verwendung eines solchen |
| US20060179879A1 (en) * | 2004-12-29 | 2006-08-17 | Ellison Adam J G | Adjusting expansivity in doped silica glasses |
| DE102007029403A1 (de) * | 2006-06-28 | 2008-01-03 | Corning Incorporated | Glas mit sehr geringer Ausdehnung und Verfahren zu dessen Herstellung |
| JP5042714B2 (ja) * | 2007-06-06 | 2012-10-03 | 信越化学工業株式会社 | ナノインプリントモールド用チタニアドープ石英ガラス |
| JP2011505318A (ja) | 2007-11-30 | 2011-02-24 | コーニング インコーポレイテッド | 低い膨張係数勾配を有する低膨張性ガラス材料 |
| TW200940472A (en) | 2007-12-27 | 2009-10-01 | Asahi Glass Co Ltd | TiO2-containing silica glass |
| JP5428323B2 (ja) * | 2007-12-27 | 2014-02-26 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラス |
| KR20100118125A (ko) | 2008-02-29 | 2010-11-04 | 아사히 가라스 가부시키가이샤 | ＴｉＯ₂ 함유 실리카 유리 및 이를 사용한 리소그래피용 광학 부재 |
| JP5644058B2 (ja) | 2008-03-21 | 2014-12-24 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラス |
| JP2010135732A (ja) | 2008-08-01 | 2010-06-17 | Asahi Glass Co Ltd | Ｅｕｖマスクブランクス用基板 |
| US8735308B2 (en) | 2009-01-13 | 2014-05-27 | Asahi Glass Company, Limited | Optical member comprising TiO2-containing silica glass |
| WO2010131662A1 (ja) | 2009-05-13 | 2010-11-18 | 旭硝子株式会社 | ＴｉＯ２－ＳｉＯ２ガラス体の製造方法及び熱処理方法、ＴｉＯ２－ＳｉＯ２ガラス体、ＥＵＶＬ用光学基材 |
| JP5572016B2 (ja) | 2009-08-04 | 2014-08-13 | シスメックス株式会社 | 組織液抽出用デバイス、その製造方法、及び該デバイスを用いた組織液の分析方法 |
| US8713969B2 (en) | 2009-08-31 | 2014-05-06 | Corning Incorporated | Tuning Tzc by the annealing of ultra low expansion glass |
| JP5510308B2 (ja) | 2009-12-25 | 2014-06-04 | 旭硝子株式会社 | Ｅｕｖｌ光学部材用基材 |
| US8541325B2 (en) | 2010-02-25 | 2013-09-24 | Corning Incorporated | Low expansivity, high transmission titania doped silica glass |
| US20110207593A1 (en) | 2010-02-25 | 2011-08-25 | Carlos Duran | Expansivity in Low Expansion Silica-Titania Glasses |
| US20130047669A1 (en) | 2011-08-31 | 2013-02-28 | Sezhian Annamalai | Method of making a silica-titania glass having a ternary doped critical zone |
| US9034450B2 (en) | 2011-08-31 | 2015-05-19 | Corning Incorporated | Binary silica-titania glass articles having a ternary doped silica-titania critical zone |
-
2013
- 2013-03-15 US US13/835,039 patent/US8901019B2/en not_active Expired - Fee Related
- 2013-11-27 JP JP2015545421A patent/JP6291505B2/ja not_active Expired - Fee Related
- 2013-11-27 WO PCT/US2013/072146 patent/WO2014085529A1/en not_active Ceased
- 2013-11-27 EP EP13803404.6A patent/EP2925686A1/en not_active Withdrawn
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2016502495A5 (enExample) | ||
| JP6291505B2 (ja) | 非常に低いｃｔｅ勾配のドープされたシリカ−チタニアガラス | |
| JP6282622B2 (ja) | 低損失光ファイバ及びその製造方法 | |
| CN108698907B (zh) | 掺杂溴的氧化硅玻璃光纤及其制备方法 | |
| CN102654602B (zh) | 一种光纤及其制造方法 | |
| JP5342614B2 (ja) | 光ファイバ母材および光ファイバの製造方法 | |
| JP6748644B2 (ja) | ハロゲンをドープした光学要素を製造する方法 | |
| JPS6124348B2 (enExample) | ||
| US20160318792A1 (en) | Production method of optical fiber preform and production method of optical fiber | |
| JP2016536252A5 (enExample) | ||
| TW200940472A (en) | TiO2-containing silica glass | |
| US9776907B2 (en) | Optical fibers and preforms with one step fluorine trench and overclad and methods for making the same | |
| TWI689476B (zh) | 摻雜的超低膨脹玻璃及用於製造其之方法 | |
| CN108137377A (zh) | 防止光纤预成形件中的裂纹的方法以及由此得到的光纤预成形件 | |
| WO2015034991A3 (en) | Method of making updoped cladding by using silicon tertrachloride as the dopant | |
| WO2020033219A1 (en) | Method of making halogen co-doped cores for optical fibers and optical fibers | |
| CN118908559A (zh) | 光纤用预制件的制造方法 | |
| US9593034B2 (en) | Method for producing iron-doped silica glass | |
| JP2016534020A5 (enExample) | ||
| CN102503115B (zh) | 一种低羟基石英玻璃纤维的生产方法 | |
| JP5619397B2 (ja) | 光ファイバ母材の製造方法 | |
| JP2010186868A (ja) | Ｂｆ３を添加した希土類元素ドープファイバおよびその製造方法 | |
| JPS5910938B2 (ja) | 光伝送用ガラスの製造方法 | |
| JP6123453B2 (ja) | 光ファイバ母材の製造方法、光ファイバ母材および光ファイバ | |
| JP2012188314A (ja) | フッ素含有光ファイバ母材の製造方法及びフッ素含有光ファイバ母材 |