WO2014122111A3 - ROHLING AUS TiO2-SiO2-GLAS FÜR EIN SPIEGELSUBSTRAT FÜR DEN EINSATZ IN DER EUV-LITHOGRAPHIE SOWIE VERFAHREN FÜR DESSEN HERSTELLUNG - Google Patents

ROHLING AUS TiO2-SiO2-GLAS FÜR EIN SPIEGELSUBSTRAT FÜR DEN EINSATZ IN DER EUV-LITHOGRAPHIE SOWIE VERFAHREN FÜR DESSEN HERSTELLUNG Download PDF

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Publication number
WO2014122111A3
WO2014122111A3 PCT/EP2014/052106 EP2014052106W WO2014122111A3 WO 2014122111 A3 WO2014122111 A3 WO 2014122111A3 EP 2014052106 W EP2014052106 W EP 2014052106W WO 2014122111 A3 WO2014122111 A3 WO 2014122111A3
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WO
WIPO (PCT)
Prior art keywords
blank
euv lithography
mirror substrate
tio2
production
Prior art date
Application number
PCT/EP2014/052106
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English (en)
French (fr)
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WO2014122111A2 (de
Inventor
Stephan Thomas
Klaus Becker
Stefan Ochs
Original Assignee
Heraeus Quarzglas Gmbh & Co. Kg
Shin-Etsu Quartz Products Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Quarzglas Gmbh & Co. Kg, Shin-Etsu Quartz Products Co., Ltd. filed Critical Heraeus Quarzglas Gmbh & Co. Kg
Priority to CN201480008162.8A priority Critical patent/CN104995557B/zh
Priority to US14/766,276 priority patent/US9522840B2/en
Priority to EP14702598.5A priority patent/EP2954372A2/de
Priority to JP2015556463A priority patent/JP6328665B2/ja
Priority to KR1020157023004A priority patent/KR101922765B1/ko
Publication of WO2014122111A2 publication Critical patent/WO2014122111A2/de
Publication of WO2014122111A3 publication Critical patent/WO2014122111A3/de

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1469—Means for changing or stabilising the shape or form of the shaped article or deposit
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B25/00—Annealing glass products
    • C03B25/02—Annealing glass products in a discontinuous way
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Thermal Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Optics & Photonics (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

Um einen Rohling aus TiO2-SiO2-Glas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie bereitzustellen, bei dem der Anpassungsbedarf zur Optimierung des Verlaufs des thermischen Ausdehnungskoeffizient und damit auch des Verlaufs der Nulldurchgangstemperatur Tzc gering ist, weist das TiO2-SiO2-Glas bei einem Mittelwert der fiktiven Temperatur Tf im Bereich zwischen 920 °C und 970 °C eine Abhängigkeit seiner Nulldurchgangstemperatur Tzc von der fiktiven Temperatur Tf auf, die, ausgedrückt als Differentialquotient dTzc/dTf kleiner als 0,3 ist.
PCT/EP2014/052106 2013-02-11 2014-02-04 ROHLING AUS TiO2-SiO2-GLAS FÜR EIN SPIEGELSUBSTRAT FÜR DEN EINSATZ IN DER EUV-LITHOGRAPHIE SOWIE VERFAHREN FÜR DESSEN HERSTELLUNG WO2014122111A2 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
CN201480008162.8A CN104995557B (zh) 2013-02-11 2014-02-04 用于EUV-光刻中的镜面基材的由TiO2-SiO2玻璃构成的坯料及其制造方法
US14/766,276 US9522840B2 (en) 2013-02-11 2014-02-04 Blank of TiO2-SiO2 glass for a mirror substrate for use in EUV lithography and method for the production thereof
EP14702598.5A EP2954372A2 (de) 2013-02-11 2014-02-04 ROHLING AUS TiO2-SiO2-GLAS FÜR EIN SPIEGELSUBSTRAT FÜR DEN EINSATZ IN DER EUV-LITHOGRAPHIE SOWIE VERFAHREN FÜR DESSEN HERSTELLUNG
JP2015556463A JP6328665B2 (ja) 2013-02-11 2014-02-04 ＥＵＶリソグラフィに使用されるミラー基板用のＴｉＯ２−ＳｉＯ２ガラスのブランクの製造方法
KR1020157023004A KR101922765B1 (ko) 2013-02-11 2014-02-04 EUV 리소그래피에서의 사용을 위한 미러 기판용 TiO2-SiO2 유리의 블랭크 및 그 생산을 위한 방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102013101328.7 2013-02-11
DE102013101328.7A DE102013101328B3 (de) 2013-02-11 2013-02-11 Rohling aus TiO2-SiO2-Glas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie sowie Verfahren für dessen Herstellung

Publications (2)

Publication Number Publication Date
WO2014122111A2 WO2014122111A2 (de) 2014-08-14
WO2014122111A3 true WO2014122111A3 (de) 2014-10-23

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PCT/EP2014/052106 WO2014122111A2 (de) 2013-02-11 2014-02-04 ROHLING AUS TiO2-SiO2-GLAS FÜR EIN SPIEGELSUBSTRAT FÜR DEN EINSATZ IN DER EUV-LITHOGRAPHIE SOWIE VERFAHREN FÜR DESSEN HERSTELLUNG

Country Status (8)

Country Link
US (1) US9522840B2 (de)
EP (1) EP2954372A2 (de)
JP (1) JP6328665B2 (de)
KR (1) KR101922765B1 (de)
CN (1) CN104995557B (de)
DE (1) DE102013101328B3 (de)
TW (1) TWI624435B (de)
WO (1) WO2014122111A2 (de)

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Publication number Priority date Publication date Assignee Title
DE102013219808A1 (de) * 2013-09-30 2015-04-02 Heraeus Quarzglas Gmbh & Co. Kg Spiegelblank für EUV Lithographie ohne Ausdehnung unter EUV-Bestrahlung
EP2960219B1 (de) 2014-06-27 2019-01-16 Heraeus Quarzglas GmbH & Co. KG Rohling aus Titan-dotiertem Kieselglas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie und Verfahren für seine Herstellung
CN107074609B (zh) 2014-09-25 2019-11-22 南通斯密特森光电科技有限公司 轻型大尺寸望远镜镜坯的制造方法及根据该方法制造的镜坯
US20170362115A1 (en) * 2014-11-26 2017-12-21 Corning Incorporated Method of making halogen doped optical element
CN111238461B (zh) * 2020-03-09 2022-05-06 中国建筑材料科学研究总院有限公司 一种谐振子及其制备方法
CN113340504B (zh) * 2021-07-13 2022-03-01 中国工程物理研究院激光聚变研究中心 一种从熔石英假想温度分布获取残余应力分布的方法
CN113737278B (zh) * 2021-07-29 2022-05-03 达高工业技术研究院(广州)有限公司 氧化钛掺杂旋涂玻璃固化装置

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US20090143213A1 (en) * 2007-11-30 2009-06-04 Kenneth Edward Hrdina Low expansion glass material having low expansivity gradient
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DE102011085358B3 (de) * 2011-10-28 2012-07-12 Carl Zeiss Smt Gmbh Optische Anordnung für die EUV-Lithographie und Verfahren zum Konfigurieren einer solchen optischen Anordnung

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US20090143213A1 (en) * 2007-11-30 2009-06-04 Kenneth Edward Hrdina Low expansion glass material having low expansivity gradient
DE102010039924A1 (de) * 2009-08-31 2011-03-03 Corning Inc. Einstellen der Tzc durch Aushärten von Glas mit ultraniedriger Expansion
DE102010009589A1 (de) * 2010-02-26 2011-09-01 Heraeus Quarzglas Gmbh & Co. Kg Rohling aus Titan-dotiertem, hochkieselsäurehaltigem Glas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie und Verfahren für seine Herstellung
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Also Published As

Publication number Publication date
CN104995557B (zh) 2019-03-05
JP2016511211A (ja) 2016-04-14
WO2014122111A2 (de) 2014-08-14
EP2954372A2 (de) 2015-12-16
CN104995557A (zh) 2015-10-21
TW201446670A (zh) 2014-12-16
KR101922765B1 (ko) 2018-11-27
US9522840B2 (en) 2016-12-20
JP6328665B2 (ja) 2018-05-23
TWI624435B (zh) 2018-05-21
DE102013101328B3 (de) 2014-02-13
KR20150117675A (ko) 2015-10-20
US20150376049A1 (en) 2015-12-31

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