JP2016213456A5 - - Google Patents
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- Publication number
- JP2016213456A5 JP2016213456A5 JP2016092266A JP2016092266A JP2016213456A5 JP 2016213456 A5 JP2016213456 A5 JP 2016213456A5 JP 2016092266 A JP2016092266 A JP 2016092266A JP 2016092266 A JP2016092266 A JP 2016092266A JP 2016213456 A5 JP2016213456 A5 JP 2016213456A5
- Authority
- JP
- Japan
- Prior art keywords
- platen
- semiconductor substrate
- gas pipe
- stem
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000758 substrate Substances 0.000 claims 54
- 239000004065 semiconductor Substances 0.000 claims 36
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims 18
- 239000000919 ceramic Substances 0.000 claims 15
- 238000000034 method Methods 0.000 claims 11
- 229910010293 ceramic material Inorganic materials 0.000 claims 5
- 238000009792 diffusion process Methods 0.000 claims 5
- 238000000231 atomic layer deposition Methods 0.000 claims 4
- 238000004891 communication Methods 0.000 claims 4
- 239000012530 fluid Substances 0.000 claims 4
- 238000005229 chemical vapour deposition Methods 0.000 claims 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 2
- 230000008021 deposition Effects 0.000 claims 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims 2
- 238000007740 vapor deposition Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000010926 purge Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/710,132 | 2015-05-12 | ||
| US14/710,132 US9738975B2 (en) | 2015-05-12 | 2015-05-12 | Substrate pedestal module including backside gas delivery tube and method of making |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020213139A Division JP7168642B2 (ja) | 2015-05-12 | 2020-12-23 | 背面ガス供給管を備えた基板ペデスタルモジュールおよびその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016213456A JP2016213456A (ja) | 2016-12-15 |
| JP2016213456A5 true JP2016213456A5 (enExample) | 2019-08-22 |
| JP6815745B2 JP6815745B2 (ja) | 2021-01-20 |
Family
ID=57276852
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016092266A Active JP6815745B2 (ja) | 2015-05-12 | 2016-05-02 | 背面ガス供給管を備えた基板ペデスタルモジュールおよびその製造方法 |
| JP2020213139A Active JP7168642B2 (ja) | 2015-05-12 | 2020-12-23 | 背面ガス供給管を備えた基板ペデスタルモジュールおよびその製造方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020213139A Active JP7168642B2 (ja) | 2015-05-12 | 2020-12-23 | 背面ガス供給管を備えた基板ペデスタルモジュールおよびその製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (4) | US9738975B2 (enExample) |
| JP (2) | JP6815745B2 (enExample) |
| KR (2) | KR102641003B1 (enExample) |
| CN (2) | CN112063995B (enExample) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10177024B2 (en) * | 2015-05-12 | 2019-01-08 | Lam Research Corporation | High temperature substrate pedestal module and components thereof |
| US9738975B2 (en) | 2015-05-12 | 2017-08-22 | Lam Research Corporation | Substrate pedestal module including backside gas delivery tube and method of making |
| JP2017077528A (ja) * | 2015-10-20 | 2017-04-27 | 信越化学工業株式会社 | フォトマスク関連基板に用いる基板洗浄装置及び基板洗浄方法 |
| US10604841B2 (en) * | 2016-12-14 | 2020-03-31 | Lam Research Corporation | Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition |
| US10147610B1 (en) * | 2017-05-30 | 2018-12-04 | Lam Research Corporation | Substrate pedestal module including metallized ceramic tubes for RF and gas delivery |
| US11289355B2 (en) | 2017-06-02 | 2022-03-29 | Lam Research Corporation | Electrostatic chuck for use in semiconductor processing |
| US11004722B2 (en) * | 2017-07-20 | 2021-05-11 | Applied Materials, Inc. | Lift pin assembly |
| US11469084B2 (en) | 2017-09-05 | 2022-10-11 | Lam Research Corporation | High temperature RF connection with integral thermal choke |
| JP6839789B2 (ja) * | 2017-11-21 | 2021-03-10 | ワトロー エレクトリック マニュファクチュアリング カンパニー | 原子保護層を有するセラミックペデスタル |
| CN111433902A (zh) | 2017-12-08 | 2020-07-17 | 朗姆研究公司 | 向下游室传送自由基和前体气体以实现远程等离子体膜沉积的有改进的孔图案的集成喷头 |
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| FI129040B (fi) | 2019-06-06 | 2021-05-31 | Picosun Oy | Fluidia läpäisevien materiaalien päällystäminen |
| CN113939904B (zh) * | 2020-01-15 | 2025-06-13 | 日本特殊陶业株式会社 | 保持装置 |
| KR20220010074A (ko) | 2020-02-11 | 2022-01-25 | 램 리써치 코포레이션 | 웨이퍼 베벨/에지 상의 증착을 제어하기 위한 캐리어 링 설계들 |
| US11699602B2 (en) * | 2020-07-07 | 2023-07-11 | Applied Materials, Inc. | Substrate support assemblies and components |
| KR102475295B1 (ko) * | 2020-10-08 | 2022-12-08 | 주식회사 메카로 | 비대칭 열선 구조를 가진 페데스탈 히터 블럭 |
| WO2022093273A1 (en) * | 2020-10-30 | 2022-05-05 | Applied Materials, Inc. | Rf delivery and feedthrough assembly to a processing chamber |
| KR20230158610A (ko) * | 2021-03-25 | 2023-11-20 | 램 리써치 코포레이션 | 고온 증착 시퀀스에서 동작하는 저온 페데스탈의 전도성 냉각 |
| WO2023034760A1 (en) * | 2021-09-02 | 2023-03-09 | Lam Research Corporation | Joining techniques for composite ceramic bodies |
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| US12412769B2 (en) * | 2023-05-16 | 2025-09-09 | Applied Materials, Inc. | Electrostatic chucks with hybrid pucks to improve thermal performance and leakage current stability |
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| US9738975B2 (en) | 2015-05-12 | 2017-08-22 | Lam Research Corporation | Substrate pedestal module including backside gas delivery tube and method of making |
| US10177024B2 (en) * | 2015-05-12 | 2019-01-08 | Lam Research Corporation | High temperature substrate pedestal module and components thereof |
| US10147610B1 (en) * | 2017-05-30 | 2018-12-04 | Lam Research Corporation | Substrate pedestal module including metallized ceramic tubes for RF and gas delivery |
-
2015
- 2015-05-12 US US14/710,132 patent/US9738975B2/en active Active
-
2016
- 2016-05-02 JP JP2016092266A patent/JP6815745B2/ja active Active
- 2016-05-11 KR KR1020160057390A patent/KR102641003B1/ko active Active
- 2016-05-12 CN CN202010719108.1A patent/CN112063995B/zh active Active
- 2016-05-12 CN CN201610312750.1A patent/CN106148915B/zh active Active
-
2017
- 2017-07-28 US US15/662,553 patent/US10655225B2/en active Active
-
2020
- 2020-04-30 US US16/863,835 patent/US11634817B2/en active Active
- 2020-12-23 JP JP2020213139A patent/JP7168642B2/ja active Active
-
2023
- 2023-03-17 US US18/123,153 patent/US12398464B2/en active Active
-
2024
- 2024-02-21 KR KR1020240025363A patent/KR20240031982A/ko active Pending
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