JP2015532534A5 - - Google Patents

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Publication number
JP2015532534A5
JP2015532534A5 JP2015535786A JP2015535786A JP2015532534A5 JP 2015532534 A5 JP2015532534 A5 JP 2015532534A5 JP 2015535786 A JP2015535786 A JP 2015535786A JP 2015535786 A JP2015535786 A JP 2015535786A JP 2015532534 A5 JP2015532534 A5 JP 2015532534A5
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JP
Japan
Prior art keywords
die
fuse
node
ground
esd
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JP2015535786A
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English (en)
Japanese (ja)
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JP5972473B2 (ja
JP2015532534A (ja
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Priority claimed from US13/646,109 external-priority patent/US9184130B2/en
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Publication of JP2015532534A5 publication Critical patent/JP2015532534A5/ja
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Publication of JP5972473B2 publication Critical patent/JP5972473B2/ja
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JP2015535786A 2012-10-05 2013-10-03 スタック型マルチチップ集積回路の静電気保護 Active JP5972473B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/646,109 US9184130B2 (en) 2012-10-05 2012-10-05 Electrostatic protection for stacked multi-chip integrated circuits
US13/646,109 2012-10-05
PCT/US2013/063297 WO2014055777A1 (en) 2012-10-05 2013-10-03 Electrostatic protection for stacked multi-chip integrated circuits

Publications (3)

Publication Number Publication Date
JP2015532534A JP2015532534A (ja) 2015-11-09
JP2015532534A5 true JP2015532534A5 (enExample) 2016-03-03
JP5972473B2 JP5972473B2 (ja) 2016-08-17

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ID=49448293

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015535786A Active JP5972473B2 (ja) 2012-10-05 2013-10-03 スタック型マルチチップ集積回路の静電気保護

Country Status (6)

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US (1) US9184130B2 (enExample)
EP (1) EP2904638B1 (enExample)
JP (1) JP5972473B2 (enExample)
KR (1) KR101671367B1 (enExample)
CN (1) CN104737288B (enExample)
WO (1) WO2014055777A1 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9184130B2 (en) * 2012-10-05 2015-11-10 Qualcomm Incorporated Electrostatic protection for stacked multi-chip integrated circuits
JP5543567B2 (ja) * 2012-10-22 2014-07-09 誠 雫石 半導体素子の製造方法
KR102341750B1 (ko) 2015-06-30 2021-12-23 삼성전자주식회사 반도체 패키지 및 이의 제조 방법
KR102482023B1 (ko) * 2016-01-28 2022-12-28 삼성전자주식회사 적층 메모리 칩 전기적 단락 검출 장치 및 방법
US10147688B2 (en) 2016-02-25 2018-12-04 Allegro Microsystems, Llc Integrated circuit device with overvoltage discharge protection
CN107622999B (zh) * 2016-07-15 2020-06-02 中芯国际集成电路制造(上海)有限公司 静电放电保护电路
US10145904B2 (en) * 2016-08-24 2018-12-04 Allegro Microsystems, Llc Multi-die integrated circuit device with overvoltage protection
US9941224B2 (en) 2016-08-24 2018-04-10 Allegro Microsystems, Llc Multi-die integrated circuit device with capacitive overvoltage protection
CN107799502B (zh) * 2016-09-05 2020-03-10 中芯国际集成电路制造(上海)有限公司 保护电路和集成电路
US10325906B2 (en) * 2016-09-23 2019-06-18 Taiwan Semiconductor Manufacturing Company, Ltd. ESD testing structure, method of using same and method of forming same
JP2018133503A (ja) 2017-02-16 2018-08-23 東芝メモリ株式会社 半導体記憶装置
US10552564B1 (en) * 2018-06-19 2020-02-04 Cadence Design Systems, Inc. Determining worst potential failure instances using full chip ESD analysis
DE102021101251A1 (de) 2020-03-31 2021-09-30 Taiwan Semiconductor Manufacturing Co., Ltd. Schutz vor antenneneffekten und schutz vor elektrostatischen entladungen für dreidimensionale integrierte schaltkreise
US11437708B2 (en) * 2020-03-31 2022-09-06 Taiwan Semiconductor Manufacturing Company, Ltd. Antenna effect protection and electrostatic discharge protection for three-dimensional integrated circuit
FR3109666A1 (fr) * 2020-04-27 2021-10-29 3D Plus Procédé de fabrication d’un module électronique compatible hautes fréquences
CN112349655B (zh) * 2020-10-21 2021-10-19 长江存储科技有限责任公司 一种半导体器件及其安装结构、封装模具和制作方法
US11973057B2 (en) 2020-12-15 2024-04-30 Analog Devices, Inc. Through-silicon transmission lines and other structures enabled by same
FR3120160B1 (fr) * 2021-02-23 2023-11-03 Commissariat Energie Atomique Procédé de protection d’un étage supérieur de composants électroniques d’un circuit intégré contre l’effet d’antenne

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JPS5913354A (ja) 1982-07-13 1984-01-24 Toshiba Corp 半導体装置
JPS59134863A (ja) * 1982-12-28 1984-08-02 Fujitsu Ltd 静電破壊防止回路
JPH02146762A (ja) * 1988-11-28 1990-06-05 Nec Corp 半導体集積回路装置
US5807791A (en) 1995-02-22 1998-09-15 International Business Machines Corporation Methods for fabricating multichip semiconductor structures with consolidated circuitry and programmable ESD protection for input/output nodes
US6141245A (en) * 1999-04-30 2000-10-31 International Business Machines Corporation Impedance control using fuses
US6327125B1 (en) 1999-12-22 2001-12-04 Philips Electronics North America Corporation Integrated circuit with removable ESD protection
US6556409B1 (en) * 2000-08-31 2003-04-29 Agere Systems Inc. Integrated circuit including ESD circuits for a multi-chip module and a method therefor
JP2003324151A (ja) 2002-04-26 2003-11-14 Toshiba Microelectronics Corp 半導体集積回路装置、実装基板装置、及び実装基板装置の配線切断方法
WO2006028231A1 (en) * 2004-09-10 2006-03-16 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
KR100948520B1 (ko) * 2006-08-30 2010-03-23 삼성전자주식회사 정전기 특성을 개선한 증폭기
US7772124B2 (en) * 2008-06-17 2010-08-10 International Business Machines Corporation Method of manufacturing a through-silicon-via on-chip passive MMW bandpass filter
US8698139B2 (en) * 2008-11-25 2014-04-15 Qualcomm Incorporated Die-to-die power consumption optimization
JP2010129958A (ja) * 2008-12-01 2010-06-10 Seiko Epson Corp 半導体装置及び半導体装置の製造方法
US9184130B2 (en) * 2012-10-05 2015-11-10 Qualcomm Incorporated Electrostatic protection for stacked multi-chip integrated circuits

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